Bwo-Ning Chen

Person

Keelung City, TW

People

Patents Grantslast 30 patents

Information Patent Grant
Stress-inducing silicon liner in semiconductor devices
- Patent number 12,113,118
- Issue date Oct 8, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Bwo-Ning Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of forming a gate structure
- Patent number 12,027,425
- Issue date Jul 2, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Shih-Hao Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of forming a FinFET device
- Patent number 11,991,936
- Issue date May 21, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chang-Miao Liu
Information Patent Grant
Multi-gate device and related methods
- Patent number 11,949,016
- Issue date Apr 2, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Shih-Hao Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device structure and method for forming the same
- Patent number 11,935,954
- Issue date Mar 19, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Bwo-Ning Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device with corner isolation protection and methods o...
- Patent number 11,916,105
- Issue date Feb 27, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Bwo-Ning Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Stress-inducing silicon liner in semiconductor devices
- Patent number 11,728,405
- Issue date Aug 15, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd
- Bwo-Ning Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and method for manufacturing the same
- Patent number 11,688,647
- Issue date Jun 27, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd
- Bwo-Ning Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of forming a FinFET device
- Patent number 11,594,680
- Issue date Feb 28, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chang-Miao Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of forming a gate structure
- Patent number 11,482,610
- Issue date Oct 25, 2022
- Taiwan Semiconductor Manufacturing Co.
- Shih-Hao Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods of forming a FinFET device
- Patent number 11,139,432
- Issue date Oct 5, 2021
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chang-Miao Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi-layer fin structure
- Patent number 11,133,386
- Issue date Sep 28, 2021
- Taiwan Semiconductor Manufacturing Co., Ltd
- Bwo-Ning Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and method for manufacturing the same
- Patent number 11,081,401
- Issue date Aug 3, 2021
- Taiwan Semiconductor Manufacturing Co., Ltd
- Bwo-Ning Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Strained-channel semiconductor device fabrication
- Patent number RE47562
- Issue date Aug 6, 2019
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chun-Fai Cheng
Information Patent Grant
Strained-channel semiconductor device fabrication
- Patent number 8,872,228
- Issue date Oct 28, 2014
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chun-Fai Cheng
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
STRESS-INDUCING SILICON LINER IN SEMICONDUCTOR DEVICES
- Publication number 20240379817
- Publication date Nov 14, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Bwo-Ning Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF FORMING A GATE STRUCTURE
- Publication number 20240332089
- Publication date Oct 3, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Shih-Hao Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Multi-Gate Devices With Reduced Contact Resistance And Methods Of F...
- Publication number 20240079465
- Publication date Mar 7, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chun-Fai Cheng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE WITH CORNER ISOLATION PROTECTION AND METHODS O...
- Publication number 20230387199
- Publication date Nov 30, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Bwo-Ning Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI-GATE DEVICE AND RELATED METHODS
- Publication number 20230378365
- Publication date Nov 23, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Shih-Hao LIN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of Forming a FinFET Device
- Publication number 20230200264
- Publication date Jun 22, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chang-Miao Liu
Information Patent Application
Enlarged Backside Contact
- Publication number 20230060786
- Publication date Mar 2, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Bwo-Ning Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE STRUCTURE AND METHOD FOR FORMING THE SAME
- Publication number 20230035791
- Publication date Feb 2, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Bwo-Ning CHEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of Forming a Gate Structure
- Publication number 20220384618
- Publication date Dec 1, 2022
- Taiwan Semiconductor Manufacturing Co., LTD
- Shih-Hao Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI-GATE DEVICE AND RELATED METHODS
- Publication number 20220367726
- Publication date Nov 17, 2022
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Shih-Hao LIN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
STRESS-INDUCING SILICON LINER IN SEMICONDUCTOR DEVICES
- Publication number 20220367677
- Publication date Nov 17, 2022
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Bwo-Ning Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor Device with Corner Isolation Protection and Methods o...
- Publication number 20220310783
- Publication date Sep 29, 2022
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Bwo-Ning Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of Forming a FinFET Device
- Publication number 20210399221
- Publication date Dec 23, 2021
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chang-Miao Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME
- Publication number 20210358814
- Publication date Nov 18, 2021
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Bwo-Ning CHEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS OF FORMING A FINFET DEVICE
- Publication number 20210313514
- Publication date Oct 7, 2021
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chang-Miao Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME
- Publication number 20210166978
- Publication date Jun 3, 2021
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Bwo-Ning CHEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of Forming A Gate Structure
- Publication number 20210098604
- Publication date Apr 1, 2021
- Taiwan Semiconductor Manufacturing Co., LTD
- Shih-Hao Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Stress-Inducing Silicon Liner in Semiconductor Devices
- Publication number 20210098603
- Publication date Apr 1, 2021
- Taiwan Semiconductor Manufacturing Co., LTD
- Bwo-Ning Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Multi-Layer Fin Structure
- Publication number 20210066457
- Publication date Mar 4, 2021
- Taiwan Semiconductor Manufacturing Co., LTD
- Bwo-Ning Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
STRAINED-CHANNEL SEMICONDUCTOR DEVICE FABRICATION
- Publication number 20130299910
- Publication date Nov 14, 2013
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chun-Fai Cheng
- H01 - BASIC ELECTRIC ELEMENTS

Bwo-Ning Chen

Person

Patents Grantslast 30 patents

Stress-inducing silicon liner in semiconductor devices

Method of forming a gate structure

Method of forming a FinFET device

Multi-gate device and related methods

Semiconductor device structure and method for forming the same

Semiconductor device with corner isolation protection and methods o...

Stress-inducing silicon liner in semiconductor devices

Semiconductor device and method for manufacturing the same

Method of forming a FinFET device

Method of forming a gate structure

Methods of forming a FinFET device

Multi-layer fin structure

Semiconductor device and method for manufacturing the same

Strained-channel semiconductor device fabrication

Strained-channel semiconductor device fabrication

Patents Applicationslast 30 patents

STRESS-INDUCING SILICON LINER IN SEMICONDUCTOR DEVICES

METHOD OF FORMING A GATE STRUCTURE

Multi-Gate Devices With Reduced Contact Resistance And Methods Of F...

SEMICONDUCTOR DEVICE WITH CORNER ISOLATION PROTECTION AND METHODS O...

MULTI-GATE DEVICE AND RELATED METHODS

Method of Forming a FinFET Device

Enlarged Backside Contact

SEMICONDUCTOR DEVICE STRUCTURE AND METHOD FOR FORMING THE SAME

Method of Forming a Gate Structure

MULTI-GATE DEVICE AND RELATED METHODS

STRESS-INDUCING SILICON LINER IN SEMICONDUCTOR DEVICES

Semiconductor Device with Corner Isolation Protection and Methods o...

Method of Forming a FinFET Device

SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME

METHODS OF FORMING A FINFET DEVICE

SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME

Method of Forming A Gate Structure

Stress-Inducing Silicon Liner in Semiconductor Devices

Multi-Layer Fin Structure

STRAINED-CHANNEL SEMICONDUCTOR DEVICE FABRICATION