BYEONG CHAN LEE

Person

PLEASANTON, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Gate all around I/O engineering
- Patent number 11,923,441
- Issue date Mar 5, 2024
- Applied Materials, Inc.
- Steven C. H. Hung
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Gate all around I/O engineering
- Patent number 11,450,759
- Issue date Sep 20, 2022
- Applied Materials, Inc.
- Steven C. H. Hung
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Formation of bottom isolation
- Patent number 11,348,803
- Issue date May 31, 2022
- Applied Materials, Inc.
- Byeong Chan Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of forming a bottom isolation dielectric by directional sput...
- Patent number 11,189,710
- Issue date Nov 30, 2021
- Applied Materials, Inc.
- Byeong Chan Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and apparatus for patterning substrates using asymmetric ph...
- Patent number 10,927,451
- Issue date Feb 23, 2021
- Applied Materials, Inc.
- Bencherki Mebarki
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
ISOLATION MODULE FORMATION FOR BACKSIDE POWER DELIVERY APPLICATION
- Publication number 20240379438
- Publication date Nov 14, 2024
- Applied Materials, Inc.
- Veeraraghavan S. Basker
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS OF REDUCING BACKSIDE CONTACT RESISTANCE
- Publication number 20240332388
- Publication date Oct 3, 2024
- Applied Materials, Inc.
- Byeong Chan Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SELECTIVE OXIDATION PROCESSES FOR GATE-ALL-AROUND TRANSISTORS
- Publication number 20240321584
- Publication date Sep 26, 2024
- Applied Materials, Inc.
- Byeong Chan Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INNER SPACER LINER FOR GATE-ALL-AROUND DEVICE
- Publication number 20240234544
- Publication date Jul 11, 2024
- Applied Materials, Inc.
- Sai Hooi Yeong
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SACRIFICIAL SOURCE/DRAIN FOR METALLIC SOURCE/DRAIN HORIZONTAL GATE...
- Publication number 20240128355
- Publication date Apr 18, 2024
- Applied Materials, Inc.
- Nicolas Breil
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LOW TEMPERATURE N-TYPE CONTACT EPI FORMATION
- Publication number 20230307506
- Publication date Sep 28, 2023
- Applied Materials, Inc.
- Nicolas Breil
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Gate All Around I/O Engineering
- Publication number 20220399457
- Publication date Dec 15, 2022
- Applied Materials, Inc.
- Steven C.H. Hung
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
VOID-FREE CONTACT TRENCH FILL IN GATE-ALL-AROUND FET ARCHTECTURE
- Publication number 20220384258
- Publication date Dec 1, 2022
- Applied Materials, Inc.
- Nicolas Louis BREIL
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEM AND METHODS FOR DRAM CONTACT FORMATION
- Publication number 20220336469
- Publication date Oct 20, 2022
- Applied Materials, Inc.
- Nicolas Louis BREIL
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FORMATION OF BOTTOM ISOLATION
- Publication number 20220254647
- Publication date Aug 11, 2022
- Applied Materials, Inc.
- Byeong Chan Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Gate All Around I/O Engineering
- Publication number 20210104617
- Publication date Apr 8, 2021
- Applied Materials, Inc.
- Steven C.H. Hung
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FORMATION OF BOTTOM ISOLATION
- Publication number 20200373168
- Publication date Nov 26, 2020
- Applied Materials, Inc.
- Byeong Chan Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
BOTTOM ISOLATION BY SELECTIVE TOP DEPOSITION IN GAA TRANSISTORS
- Publication number 20200373411
- Publication date Nov 26, 2020
- Applied Materials, Inc.
- Byeong Chan Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS AND APPARATUS FOR PATTERNING SUBSTRATES USING ASYMMETRIC PH...
- Publication number 20200255937
- Publication date Aug 13, 2020
- Applied Materials, Inc.
- BENCHERKI MEBARKI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

BYEONG CHAN LEE

Person

Patents Grantslast 30 patents

Gate all around I/O engineering

Gate all around I/O engineering

Formation of bottom isolation

Method of forming a bottom isolation dielectric by directional sput...

Methods and apparatus for patterning substrates using asymmetric ph...

Patents Applicationslast 30 patents

ISOLATION MODULE FORMATION FOR BACKSIDE POWER DELIVERY APPLICATION

METHODS OF REDUCING BACKSIDE CONTACT RESISTANCE

SELECTIVE OXIDATION PROCESSES FOR GATE-ALL-AROUND TRANSISTORS

INNER SPACER LINER FOR GATE-ALL-AROUND DEVICE

SACRIFICIAL SOURCE/DRAIN FOR METALLIC SOURCE/DRAIN HORIZONTAL GATE...

LOW TEMPERATURE N-TYPE CONTACT EPI FORMATION

Gate All Around I/O Engineering

VOID-FREE CONTACT TRENCH FILL IN GATE-ALL-AROUND FET ARCHTECTURE

SYSTEM AND METHODS FOR DRAM CONTACT FORMATION

FORMATION OF BOTTOM ISOLATION

Gate All Around I/O Engineering

FORMATION OF BOTTOM ISOLATION

BOTTOM ISOLATION BY SELECTIVE TOP DEPOSITION IN GAA TRANSISTORS

METHODS AND APPARATUS FOR PATTERNING SUBSTRATES USING ASYMMETRIC PH...