C. Richard Guarnieri

Person

Somers, NY, US

People

Patents Grantslast 30 patents

Information Patent Grant
Attenuated embedded phase shift photomask blanks
- Patent number 6,858,357
- Issue date Feb 22, 2005
- International Business Machines Corporation
- Marie Angelopoulos
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Polymers and use thereof
- Patent number 6,689,540
- Issue date Feb 10, 2004
- International Business Machines Corporation
- Ari Aviram
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Attenuated embedded phase shift photomask blanks
- Patent number 6,653,027
- Issue date Nov 25, 2003
- International Business Machines Corporation
- Marie Angelopoulos
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Antireflective silicon-containing compositions as hardmask layer
- Patent number 6,503,692
- Issue date Jan 7, 2003
- International Business Machines Corporation
- Marie Angelopoulos
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Organometallic polymers and use thereof
- Patent number 6,458,907
- Issue date Oct 1, 2002
- International Business Machines Corporation
- Marie Angelopoulos
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Plasma resistant composition and use thereof
- Patent number 6,436,605
- Issue date Aug 20, 2002
- International Business Machines Corporation
- Marie Angelopoulos
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Antireflective silicon-containing compositions as hardmask layer
- Patent number 6,420,088
- Issue date Jul 16, 2002
- International Business Machines Corporation
- Marie Angelopoulos
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Mask-making using resist having SIO bond-containing polymer
- Patent number 6,420,084
- Issue date Jul 16, 2002
- International Business Machines Corporation
- Marie Angelopoulos
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Polymers and use thereof
- Patent number 6,346,362
- Issue date Feb 12, 2002
- International Business Machines Corporation
- Ari Aviram
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Static resistant reticle
- Patent number 6,180,291
- Issue date Jan 30, 2001
- International Business Machines Corporation
- Andrew Bessy
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Organometallic polymers and use thereof
- Patent number 6,171,757
- Issue date Jan 9, 2001
- International Business Machines Corporation
- Marie Angelopoulos
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus for tuning field for plasma processing using c...
- Patent number 5,716,486
- Issue date Feb 10, 1998
- Gary S. Selwyn
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for enhanced inductive coupling to plasmas with reduced sput...
- Patent number 5,622,635
- Issue date Apr 22, 1997
- International Business Machines Corporation
- Jerome J. Cuomo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus for enhanced inductive coupling to plasmas with reduced s...
- Patent number 5,433,812
- Issue date Jul 18, 1995
- International Business Machines Corporation
- Jerome J. Cuomo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Selective deposition process for physical vapor deposition
- Patent number 5,064,681
- Issue date Nov 12, 1991
- International Business Machines Corporation
- Christopher J. Berry
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Process for fabricating high density disc storage device
- Patent number 4,925,700
- Issue date May 15, 1990
- International Business Machines Corporation
- Blasius Brezoczky
- G11 - INFORMATION STORAGE
Information Patent Grant
Combined finger touch and stylus detection system for use on the vi...
- Patent number 4,686,332
- Issue date Aug 11, 1987
- International Business Machines Corporation
- Evon C. Greanias
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Radiant energy collector having plasma-textured polyimide exposed s...
- Patent number 4,521,442
- Issue date Jun 4, 1985
- International Business Machines Corporation
- C. Richard Guarnieri
- F24 - HEATING RANGES VENTILATING
Information Patent Grant
Radiant energy collector having plasma-textured polyimide exposed s...
- Patent number 4,478,209
- Issue date Oct 23, 1984
- C. Richard Guarnieri
- F24 - HEATING RANGES VENTILATING

Patents Applicationslast 30 patents

Information Patent Application
Attenuated embedded phase shift photomask blanks
- Publication number 20040053026
- Publication date Mar 18, 2004
- Marie Angelopoulos
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Antireflective silicon-containing compositions as hardmask layer
- Publication number 20020187422
- Publication date Dec 12, 2002
- International Business Machines Corporation
- Marie Angelopoulos
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Attenuated embedded phase shift photomask blanks
- Publication number 20020119378
- Publication date Aug 29, 2002
- Marie Angelopoulos
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Polymers and use thereof
- Publication number 20020090574
- Publication date Jul 11, 2002
- Ari Aviram
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...

C. Richard Guarnieri

Person

Patents Grantslast 30 patents

Attenuated embedded phase shift photomask blanks

Polymers and use thereof

Attenuated embedded phase shift photomask blanks

Antireflective silicon-containing compositions as hardmask layer

Organometallic polymers and use thereof

Plasma resistant composition and use thereof

Antireflective silicon-containing compositions as hardmask layer

Mask-making using resist having SIO bond-containing polymer

Polymers and use thereof

Static resistant reticle

Organometallic polymers and use thereof

Method and apparatus for tuning field for plasma processing using c...

Method for enhanced inductive coupling to plasmas with reduced sput...

Apparatus for enhanced inductive coupling to plasmas with reduced s...

Selective deposition process for physical vapor deposition

Process for fabricating high density disc storage device

Combined finger touch and stylus detection system for use on the vi...

Radiant energy collector having plasma-textured polyimide exposed s...

Radiant energy collector having plasma-textured polyimide exposed s...

Patents Applicationslast 30 patents

Attenuated embedded phase shift photomask blanks

Antireflective silicon-containing compositions as hardmask layer

Attenuated embedded phase shift photomask blanks

Polymers and use thereof