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Cai Wang
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Milford, CT, US
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Patents Grants
last 30 patents
Information
Patent Grant
Process for filling vias in the microelectronics
Patent number
10,541,140
Issue date
Jan 21, 2020
MacDermid Enthone Inc.
Thomas B. Richardson
C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information
Patent Grant
Copper filling of through silicon vias
Patent number
10,221,496
Issue date
Mar 5, 2019
MacDermid Enthone Inc.
Thomas B. Richardson
C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information
Patent Grant
Process for filling vias in the microelectronics
Patent number
10,103,029
Issue date
Oct 16, 2018
MacDermid Enthone Inc.
Thomas B. Richardson
C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information
Patent Grant
Immersion tin silver plating in electronics manufacture
Patent number
9,175,400
Issue date
Nov 3, 2015
Enthone Inc.
Yung-Herng Yau
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Grant
Metallic surface enhancement
Patent number
8,741,390
Issue date
Jun 3, 2014
Enthone Inc.
Joseph A. Abys
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Grant
Copper metallization of through silicon via
Patent number
7,670,950
Issue date
Mar 2, 2010
Enthone Inc.
Thomas B. Richardson
H01 - BASIC ELECTRIC ELEMENTS
Patents Applications
last 30 patents
Information
Patent Application
COPPER FILLING OF THROUGH SILICON VIAS
Publication number
20190003068
Publication date
Jan 3, 2019
Enthone Inc.
Thomas B. Richardson
C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information
Patent Application
Process for Filling Vias in the Microelectronics
Publication number
20160254156
Publication date
Sep 1, 2016
Enthone Inc.
Thomas B. Richardson
C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information
Patent Application
PROCESS FOR FILLING VIAS IN THE MICROELECTRONICS
Publication number
20140120722
Publication date
May 1, 2014
Enthone Inc.
Thomas B. Richardson
C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information
Patent Application
COPPER FILLING OF THROUGH SILICON VIAS
Publication number
20130199935
Publication date
Aug 8, 2013
Enthone Inc.
Thomas B. Richardson
C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information
Patent Application
IMMERSION TIN SILVER PLATING IN ELECTRONICS MANUFACTURE
Publication number
20110097597
Publication date
Apr 28, 2011
Enthone Inc.
Yung-Herng Yau
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Application
METALLIC SURFACE ENHANCEMENT
Publication number
20100151263
Publication date
Jun 17, 2010
Enthone Inc.
Joseph A. Abys
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Application
COPPER METALLIZATION OF THROUGH SILICON VIA
Publication number
20090035940
Publication date
Feb 5, 2009
Enthone Inc.
Thomas B. Richardson
C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR