Camelia Rusu

Person

Pleasanton, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Fabrication of a silicon structure and deep silicon etch with profi...
- Patent number 9,865,472
- Issue date Jan 9, 2018
- Lam Research Corporation
- Robert Chebi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Patterning of a hard mask material
- Patent number 9,514,955
- Issue date Dec 6, 2016
- Lam Research Corporation
- Joydeep Guha
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Fabrication of a silicon structure and deep silicon etch with profi...
- Patent number 9,330,926
- Issue date May 3, 2016
- Lam Research Corporation
- Robert Chebi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Pressure control valve assembly of plasma processing chamber and ra...
- Patent number 9,267,605
- Issue date Feb 23, 2016
- Lam Research Corporation
- Mirzafer Abatchev
- F16 - ENGINEERING ELEMENTS AND UNITS GENERAL MEASURES FOR PRODUCING AND MAINT...
Information Patent Grant
Method for achieving smooth side walls after Bosch etch process
- Patent number 8,871,105
- Issue date Oct 28, 2014
- Lam Research Corporation
- Jaroslaw W. Winniczek
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Controlled gas mixing for smooth sidewall rapid alternating etch pr...
- Patent number 8,691,698
- Issue date Apr 8, 2014
- Lam Research Corporation
- Qing Xu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for providing high etch rate
- Patent number 8,609,548
- Issue date Dec 17, 2013
- Lam Research Corporation
- Qing Xu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Inorganic rapid alternating process for silicon etch
- Patent number 8,574,447
- Issue date Nov 5, 2013
- Lam Research Corporation
- Tsuyoshi Aso
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Use of spectrum to synchronize RF switching with gas switching duri...
- Patent number 8,440,473
- Issue date May 14, 2013
- Lam Research Corporation
- Qing Xu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for providing mask in semiconductor processing
- Patent number 7,785,753
- Issue date Aug 31, 2010
- Lam Research Corporation
- Yoojin Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High aspect ratio etch using modulation of RF powers of various fre...
- Patent number 7,749,353
- Issue date Jul 6, 2010
- Lam Research Corporation
- Camelia Rusu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Etch profile control
- Patent number 7,645,707
- Issue date Jan 12, 2010
- Lam Research Corporation
- Camelia Rusu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multiple frequency plasma processor method and apparatus
- Patent number 7,405,521
- Issue date Jul 29, 2008
- Lam Research Corporation
- Raj Dhindsa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Mask profile control for controlling feature profile
- Patent number 7,341,953
- Issue date Mar 11, 2008
- Lam Research Corporation
- Camelia Rusu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High aspect ratio etch using modulation of RF powers of various fre...
- Patent number 7,144,521
- Issue date Dec 5, 2006
- Lam Research Corporation
- Camelia Rusu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods of reducing photoresist distortion while etching in a plasm...
- Patent number 6,942,816
- Issue date Sep 13, 2005
- Lam Research Corporation
- Camelia Rusu
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
BIOASSAY SUBSTRATE HAVING FIDUCIAL DOMAINS AND METHODS OF MANUFACTU...
- Publication number 20230149931
- Publication date May 18, 2023
- NANOSTRING TECHNOLOGIES, INC.
- Camelia RUSU
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Application
FABRICATION OF A SILICON STRUCTURE AND DEEP SILICON ETCH WITH PROFI...
- Publication number 20160233102
- Publication date Aug 11, 2016
- LAM RESEARCH CORPORATION
- Robert CHEBI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PATTERNING OF A HARD MASK MATERIAL
- Publication number 20150364337
- Publication date Dec 17, 2015
- LAM RESEARCH CORPORATION
- Joydeep Guha
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR ACHIEVING SMOOTH SIDE WALLS AFTER BOSCH ETCH PROCESS
- Publication number 20130237062
- Publication date Sep 12, 2013
- Jaroslaw W. Winniczek
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Application
CONTROLLED GAS MIXING FOR SMOOTH SIDEWALL RAPID ALTERNATING ETCH PR...
- Publication number 20130203256
- Publication date Aug 8, 2013
- LAM RESEARCH CORPORATION
- Qing Xu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PRESSURE CONTROL VALVE ASSEMBLY OF PLASMA PROCESSING CHAMBER AND RA...
- Publication number 20130115776
- Publication date May 9, 2013
- LAM RESEARCH CORPORATION
- Mirzafer Abatchev
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR PROVIDING HIGH ETCH RATE
- Publication number 20120309194
- Publication date Dec 6, 2012
- LAM RESEARCH CORPORATION
- Qing Xu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
USE OF SPECTRUM TO SYNCHRONIZE RF SWITCHING WITH GAS SWITCHING DURI...
- Publication number 20120309198
- Publication date Dec 6, 2012
- LAM RESEARCH CORPORATION
- Qing Xu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INORGANIC RAPID ALTERNATING PROCESS FOR SILICON ETCH
- Publication number 20110244686
- Publication date Oct 6, 2011
- LAM RESEARCH CORPORATION
- Tsuyoshi Aso
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HARDMASK OPEN AND ETCH PROFILE CONTROL WITH HARDMASK OPEN
- Publication number 20100327413
- Publication date Dec 30, 2010
- LAM RESEARCH CORPORATION
- Jong Pil Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FABRICATION OF A SILICON STRUCTURE AND DEEP SILICON ETCH WITH PROFI...
- Publication number 20090184089
- Publication date Jul 23, 2009
- LAM RESEARCH CORPORATION
- Robert CHEBI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND APPARATUS FOR PROVIDING MASK IN SEMICONDUCTOR PROCESSING
- Publication number 20070269721
- Publication date Nov 22, 2007
- LAM RESEARCH CORPORATION
- Yoojin Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Mask profile control for controlling feature profile
- Publication number 20070243712
- Publication date Oct 18, 2007
- Lam Research Corporation
- Camelia Rusu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
High aspect ratio etch using modulation of RF powers of various fre...
- Publication number 20070012659
- Publication date Jan 18, 2007
- Lam Research Corporation
- Camelia Rusu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Etch profile control
- Publication number 20060226120
- Publication date Oct 12, 2006
- Lam Research Corporation
- Camelia Rusu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
High aspect ratio etch using modulation of RF powers of various fre...
- Publication number 20060118518
- Publication date Jun 8, 2006
- Lam Research Corporation
- Camelia Rusu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Multiple frequency plasma etch reactor
- Publication number 20050039682
- Publication date Feb 24, 2005
- Raj Dhindsa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Methods of reducing photoresist distortion while etching in a plasm...
- Publication number 20040155012
- Publication date Aug 12, 2004
- Lam Research Corporation
- Camelia Rusu
- H01 - BASIC ELECTRIC ELEMENTS

Camelia Rusu

Person

Patents Grantslast 30 patents

Fabrication of a silicon structure and deep silicon etch with profi...

Patterning of a hard mask material

Fabrication of a silicon structure and deep silicon etch with profi...

Pressure control valve assembly of plasma processing chamber and ra...

Method for achieving smooth side walls after Bosch etch process

Controlled gas mixing for smooth sidewall rapid alternating etch pr...

Method for providing high etch rate

Inorganic rapid alternating process for silicon etch

Use of spectrum to synchronize RF switching with gas switching duri...

Method and apparatus for providing mask in semiconductor processing

High aspect ratio etch using modulation of RF powers of various fre...

Etch profile control

Multiple frequency plasma processor method and apparatus

Mask profile control for controlling feature profile

High aspect ratio etch using modulation of RF powers of various fre...

Methods of reducing photoresist distortion while etching in a plasm...

Patents Applicationslast 30 patents

BIOASSAY SUBSTRATE HAVING FIDUCIAL DOMAINS AND METHODS OF MANUFACTU...

FABRICATION OF A SILICON STRUCTURE AND DEEP SILICON ETCH WITH PROFI...

PATTERNING OF A HARD MASK MATERIAL

METHOD FOR ACHIEVING SMOOTH SIDE WALLS AFTER BOSCH ETCH PROCESS

CONTROLLED GAS MIXING FOR SMOOTH SIDEWALL RAPID ALTERNATING ETCH PR...

PRESSURE CONTROL VALVE ASSEMBLY OF PLASMA PROCESSING CHAMBER AND RA...

METHOD FOR PROVIDING HIGH ETCH RATE

USE OF SPECTRUM TO SYNCHRONIZE RF SWITCHING WITH GAS SWITCHING DURI...

INORGANIC RAPID ALTERNATING PROCESS FOR SILICON ETCH

HARDMASK OPEN AND ETCH PROFILE CONTROL WITH HARDMASK OPEN

FABRICATION OF A SILICON STRUCTURE AND DEEP SILICON ETCH WITH PROFI...

METHOD AND APPARATUS FOR PROVIDING MASK IN SEMICONDUCTOR PROCESSING

Mask profile control for controlling feature profile

High aspect ratio etch using modulation of RF powers of various fre...

Etch profile control

High aspect ratio etch using modulation of RF powers of various fre...

Multiple frequency plasma etch reactor

Methods of reducing photoresist distortion while etching in a plasm...