Carl Almgren

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Fort Collins, CA, US

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Patents Grantslast 30 patents

Information Patent Grant
High frequency filter for improved RF bias signal stability
- Patent number 9,673,069
- Issue date Jun 6, 2017
- Applied Materials, Inc.
- Yuri Trachuk
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Sensor array for measuring plasma characteristics in plasma process...
- Patent number 8,545,669
- Issue date Oct 1, 2013
- KLA-Tencor Corporation
- Leonard J. Mahoney
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Sensor array for measuring plasma characteristics in plasma process...
- Patent number 6,902,646
- Issue date Jun 7, 2005
- Advanced Energy Industries, Inc.
- Leonard J. Mahoney
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electrode assembly for plasma reactor
- Patent number 5,976,309
- Issue date Nov 2, 1999
- LSI Logic Corporation
- Carl W. Almgren
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
HOMOGENOUS PLASMA CHEMICAL REACTION DEVICE
- Publication number 20140224643
- Publication date Aug 14, 2014
- Colorado State University Research Foundation
- GEORGE J. COLLINS
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HIGH FREQUENCY FILTER FOR IMPROVED RF BIAS SIGNAL STABILITY
- Publication number 20140162462
- Publication date Jun 12, 2014
- Applied Materials Inc.
- Yuri Trachuck
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Sensor array for measuring plasma characteristics in plasma process...
- Publication number 20050151544
- Publication date Jul 14, 2005
- Advanced Energy Industries, Inc.
- Leonard J. Mahoney
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Sensor array for measuring plasma characteristics in plasma process...
- Publication number 20050034811
- Publication date Feb 17, 2005
- Leonard J. Mahoney
- H01 - BASIC ELECTRIC ELEMENTS