Carl J. Galewski

Person

Aromas, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Apparatus and method to achieve continuous interface and ultrathin...
- Patent number 6,897,119
- Issue date May 24, 2005
- Genus, Inc.
- Ofer Sneh
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Processing chamber for atomic layer deposition processes
- Patent number 6,818,067
- Issue date Nov 16, 2004
- Genus, Inc.
- Kenneth Doering
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Apparatus and method to achieve continuous interface and ultrathin...
- Patent number 6,638,859
- Issue date Oct 28, 2003
- Genus, Inc.
- Ofer Sneh
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
PECVD and CVD processes for WNx deposition
- Patent number 6,635,570
- Issue date Oct 21, 2003
- Carl J. Galewski
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Apparatus and concept for minimizing parasitic chemical vapor depos...
- Patent number 6,540,838
- Issue date Apr 1, 2003
- Genus, Inc.
- Ofer Sneh
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of copper interconnect formation using atomic layer copper d...
- Patent number 6,538,327
- Issue date Mar 25, 2003
- Advanced Micro Devices, Inc.
- Sergey D. Lopatin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and method to achieve continuous interface and ultrathin...
- Patent number 6,503,330
- Issue date Jan 7, 2003
- Genus, Inc.
- Ofer Sneh
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Semiconductor catalytic layer and atomic layer deposition thereof
- Patent number 6,479,902
- Issue date Nov 12, 2002
- Advanced Micro Devices, Inc.
- Sergey D. Lopatin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and concept for minimizing parasitic chemical vapor depos...
- Patent number 6,451,119
- Issue date Sep 17, 2002
- Genus, Inc.
- Ofer Sneh
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Processing chamber for atomic layer deposition processes
- Patent number 6,387,185
- Issue date May 14, 2002
- Genus, Inc.
- Kenneth Doering
- C30 - CRYSTAL GROWTH
Information Patent Grant
Method of copper interconnect formation using atomic layer copper d...
- Patent number 6,368,954
- Issue date Apr 9, 2002
- Advanced Micro Devices, Inc.
- Sergey D. Lopatin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and concept for minimizing parasitic chemical vapor depos...
- Patent number 6,305,314
- Issue date Oct 23, 2001
- Genvs, Inc.
- Ofer Sneh
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Processing chamber for atomic layer deposition processes
- Patent number 6,174,377
- Issue date Jan 16, 2001
- Genus, Inc.
- Kenneth Doering
- C30 - CRYSTAL GROWTH
Information Patent Grant
Multipurpose processing chamber for chemical vapor deposition proce...
- Patent number 5,855,675
- Issue date Jan 5, 1999
- Genus, Inc.
- Kenneth Doering
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
Apparatus and concept for minimizing parasitic chemical vapor depos...
- Publication number 20030183171
- Publication date Oct 2, 2003
- Ofer Sneh
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Apparatus and method to achieve continuous interface and ultrathin...
- Publication number 20030027431
- Publication date Feb 6, 2003
- Ofer Sneh
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Apparatus and concept for minimizing parasitic chemical vapor depos...
- Publication number 20020162506
- Publication date Nov 7, 2002
- Ofer Sneh
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Processing chamber for atomic layer deposition processes
- Publication number 20020108714
- Publication date Aug 15, 2002
- Kenneth Doering
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Processing chamber for atomic layer deposition processes
- Publication number 20010011526
- Publication date Aug 9, 2001
- Kenneth Doering
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Apparatus and concept for minimizing parasitic chemical vapor depos...
- Publication number 20010000866
- Publication date May 10, 2001
- Ofer Sneh
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Carl J. Galewski

Person

Patents Grantslast 30 patents

Apparatus and method to achieve continuous interface and ultrathin...

Processing chamber for atomic layer deposition processes

Apparatus and method to achieve continuous interface and ultrathin...

PECVD and CVD processes for WNx deposition

Apparatus and concept for minimizing parasitic chemical vapor depos...

Method of copper interconnect formation using atomic layer copper d...

Apparatus and method to achieve continuous interface and ultrathin...

Semiconductor catalytic layer and atomic layer deposition thereof

Apparatus and concept for minimizing parasitic chemical vapor depos...

Processing chamber for atomic layer deposition processes

Method of copper interconnect formation using atomic layer copper d...

Apparatus and concept for minimizing parasitic chemical vapor depos...

Processing chamber for atomic layer deposition processes

Multipurpose processing chamber for chemical vapor deposition proce...

Patents Applicationslast 30 patents

Apparatus and concept for minimizing parasitic chemical vapor depos...

Apparatus and method to achieve continuous interface and ultrathin...

Apparatus and concept for minimizing parasitic chemical vapor depos...

Processing chamber for atomic layer deposition processes

Processing chamber for atomic layer deposition processes

Apparatus and concept for minimizing parasitic chemical vapor depos...