Carlos A. FONSECA

Person

Austin, TX, US

People

Patents Grantslast 30 patents

Information Patent Grant
Virtual metrology for wafer result prediction
- Patent number 12,112,107
- Issue date Oct 8, 2024
- Tokyo Electron Limited
- Jun Shinagawa
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Enhancement of yield of functional microelectronic devices
- Patent number 11,435,393
- Issue date Sep 6, 2022
- Tokyo Electron Limited
- Carlos A. Fonseca
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Enhancement of yield of functional microelectronic devices
- Patent number 11,346,882
- Issue date May 31, 2022
- Tokyo Electron Limited
- Carlos A. Fonseca
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Systems and methods for manufacturing microelectronic devices
- Patent number 11,244,873
- Issue date Feb 8, 2022
- Tokyo Electron Limited
- Carlos A. Fonseca
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Grant
Photo-sensitized chemically amplified resist (PS-CAR) model calibra...
- Patent number 10,048,594
- Issue date Aug 14, 2018
- Tokyo Electron Limited
- Michael Carcasi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus for substrate rinsing and drying
- Patent number 9,786,523
- Issue date Oct 10, 2017
- Tokyo Electron Limited
- Carlos A Fonseca
- B08 - CLEANING
Information Patent Grant
Substrate backside texturing
- Patent number 9,711,419
- Issue date Jul 18, 2017
- Tokyo Electron Limited
- Carlos A. Fonseca
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Substrate backside texturing
- Patent number 9,281,251
- Issue date Mar 8, 2016
- Tokyo Electron Limited
- Carlos A Fonseca
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Dual tone development with a photo-activated acid enhancement compo...
- Patent number 8,574,810
- Issue date Nov 5, 2013
- Tokyo Electron Limited
- Carlos A. Fonseca
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Flood exposure process for dual tone development in lithographic ap...
- Patent number 8,568,964
- Issue date Oct 29, 2013
- Tokyo Electron Limited
- Carlos A. Fonseca
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for creating gray-scale features for dual tone development p...
- Patent number 8,283,111
- Issue date Oct 9, 2012
- Tokyo Electron Limited
- Carlos A. Fonseca
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of process optimization for dual tone development
- Patent number 8,257,911
- Issue date Sep 4, 2012
- Tokyo Electron Limited
- Roel Gronheid
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Dual tone development processes
- Patent number 8,197,996
- Issue date Jun 12, 2012
- Tokyo Electron Limited
- Carlos A. Fonseca
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Variable resist protecting groups
- Patent number 8,129,080
- Issue date Mar 6, 2012
- Tokyo Electron Limited
- Carlos A. Fonseca
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Dual tone development with plural photo-acid generators in lithogra...
- Patent number 7,829,269
- Issue date Nov 9, 2010
- Tokyo Electron Limited
- Carlos A. Fonseca
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
VIRTUAL METROLOGY FOR WAFER RESULT PREDICTION
- Publication number 20220092242
- Publication date Mar 24, 2022
- TOKYO ELECTRON LIMITED
- Jun SHINAGAWA
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Systems and Methods For Manufacturing Microelectronic Devices
- Publication number 20200135592
- Publication date Apr 30, 2020
- TOKYO ELECTRON LIMITED
- Carlos A. Fonseca
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Application
ENHANCEMENT OF YIELD OF FUNCTIONAL MICROELECTRONIC DEVICES
- Publication number 20190137565
- Publication date May 9, 2019
- TOKYO ELECTRON LIMITED
- Carlos A. Fonseca
- G01 - MEASURING TESTING
Information Patent Application
ENHANCEMENT OF YIELD OF FUNCTIONAL MICROELECTRONIC DEVICES
- Publication number 20190139798
- Publication date May 9, 2019
- TOKYO ELECTRON LIMITED
- Carlos A. Fonseca
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Photo-sensitized Chemically Amplified Resist (PS-CAR) model calibra...
- Publication number 20170242344
- Publication date Aug 24, 2017
- TOKYO ELECTRON LIMITED
- Michael Carcasi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SUBSTRATE BACKSIDE TEXTURING
- Publication number 20160141169
- Publication date May 19, 2016
- TOKYO ELECTRON LIMITED
- Carlos A. Fonseca
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE BACKSIDE TEXTURING
- Publication number 20160043007
- Publication date Feb 11, 2016
- TOKYO ELECTRON LIMITED
- Carlos A. Fonseca
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE BACKSIDE TEXTURING
- Publication number 20150044785
- Publication date Feb 12, 2015
- TOKYO ELECTRON LIMITED
- Carlos A. FONSECA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND APPARATUS FOR SUBSTRATE RINSING AND DRYING
- Publication number 20140261569
- Publication date Sep 18, 2014
- TOKYO ELECTRON LIMITED
- Carlos A. FONSECA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Dual tone development with a photo-activated acid enhancement compo...
- Publication number 20100273107
- Publication date Oct 28, 2010
- TOKYO ELECTRON LIMITED
- Carlos A. FONSECA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Dual tone development with plural photo-acid generators in lithogra...
- Publication number 20100273111
- Publication date Oct 28, 2010
- TOKYO ELECTRON LIMITED
- Carlos A. FONSECA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Flood exposure process for dual tone development in lithographic ap...
- Publication number 20100273099
- Publication date Oct 28, 2010
- TOKYO ELECTRON LIMITED
- Carlos A. Fonseca
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Dual Tone Development Processes
- Publication number 20100119960
- Publication date May 13, 2010
- TOKYO ELECTRON LIMITED
- Carlos A. Fonseca
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Variable Resist Protecting Groups
- Publication number 20100075238
- Publication date Mar 25, 2010
- TOKYO ELECTRON LIMITED
- Carlos A. Fonseca
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR CREATING GRAY-SCALE FEATURES FOR DUAL TONE DEVELOPMENT P...
- Publication number 20100068654
- Publication date Mar 18, 2010
- TOKYO ELECTRON LIMITED
- Carlos A. Fonseca
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF PATTERNING A SUBSTRATE USING DUAL TONE DEVELOPMENT
- Publication number 20100055624
- Publication date Mar 4, 2010
- TOKYO ELECTRON LIMITED
- Roel Gronheid
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF PROCESS OPTIMIZATION FOR DUAL TONE DEVELOPMENT
- Publication number 20100055625
- Publication date Mar 4, 2010
- TOKYO ELECTRON LIMITED
- Roel Gronheid
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Carlos A. FONSECA

Person

Patents Grantslast 30 patents

Virtual metrology for wafer result prediction

Enhancement of yield of functional microelectronic devices

Enhancement of yield of functional microelectronic devices

Systems and methods for manufacturing microelectronic devices

Photo-sensitized chemically amplified resist (PS-CAR) model calibra...

Method and apparatus for substrate rinsing and drying

Substrate backside texturing

Substrate backside texturing

Dual tone development with a photo-activated acid enhancement compo...

Flood exposure process for dual tone development in lithographic ap...

Method for creating gray-scale features for dual tone development p...

Method of process optimization for dual tone development

Dual tone development processes

Variable resist protecting groups

Dual tone development with plural photo-acid generators in lithogra...

Patents Applicationslast 30 patents

VIRTUAL METROLOGY FOR WAFER RESULT PREDICTION

Systems and Methods For Manufacturing Microelectronic Devices

ENHANCEMENT OF YIELD OF FUNCTIONAL MICROELECTRONIC DEVICES

ENHANCEMENT OF YIELD OF FUNCTIONAL MICROELECTRONIC DEVICES

Photo-sensitized Chemically Amplified Resist (PS-CAR) model calibra...

SUBSTRATE BACKSIDE TEXTURING

SUBSTRATE BACKSIDE TEXTURING

SUBSTRATE BACKSIDE TEXTURING

METHOD AND APPARATUS FOR SUBSTRATE RINSING AND DRYING

Dual tone development with a photo-activated acid enhancement compo...

Dual tone development with plural photo-acid generators in lithogra...

Flood exposure process for dual tone development in lithographic ap...

Dual Tone Development Processes

Variable Resist Protecting Groups

METHOD FOR CREATING GRAY-SCALE FEATURES FOR DUAL TONE DEVELOPMENT P...

METHOD OF PATTERNING A SUBSTRATE USING DUAL TONE DEVELOPMENT

METHOD OF PROCESS OPTIMIZATION FOR DUAL TONE DEVELOPMENT