Cha-Won KOH

Person

Yongin-si, KR

People

Patents Grantslast 30 patents

Information Patent Grant
Semiconductor device and method of manufacturing the same
- Patent number 10,797,056
- Issue date Oct 6, 2020
- Samsung Electronics Co., Ltd.
- Jin-A Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Filter structure for chemical solution used in manufacturing integr...
- Patent number 10,688,437
- Issue date Jun 23, 2020
- Samsung Electronics Co., Ltd.
- Cha-won Koh
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Grant
Semiconductor device and method of manufacturing the same
- Patent number 10,586,798
- Issue date Mar 10, 2020
- Samsung Electronics Co., Ltd.
- Jin-A Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of forming photoresist pattern and method of fabricating sem...
- Patent number 10,438,810
- Issue date Oct 8, 2019
- Samsung Electronics Co., Ltd.
- Cha-Won Koh
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Grant
Photoresist polymers, photoresist compositions, methods of forming...
- Patent number 10,345,701
- Issue date Jul 9, 2019
- Samsung Electronics Co., Ltd.
- Jin Park
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Methods of forming patterns using photoresist polymers and methods...
- Patent number 9,842,852
- Issue date Dec 12, 2017
- Samsung Electronics Co., Ltd.
- Jin Park
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Methods of forming patterns using photoresists
- Patent number 9,772,555
- Issue date Sep 26, 2017
- Samsung Electronics Co., Ltd.
- Cheol-Hong Park
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Methods of forming a pattern of a semiconductor device
- Patent number 9,520,289
- Issue date Dec 13, 2016
- Samsung Electronics Co., Ltd.
- Jin Park
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithography apparatus having effective thermal electron enhancement...
- Patent number 9,482,953
- Issue date Nov 1, 2016
- Samsung Electronics Co., Ltd.
- Cha-Won Koh
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Methods of manufacturing semiconductor device
- Patent number 9,412,604
- Issue date Aug 9, 2016
- Samsung Electronics Co., Ltd.
- Cha-won Koh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods of fabricating semiconductor devices
- Patent number 9,147,687
- Issue date Sep 29, 2015
- Samsung Electronics Co., Ltd.
- Cha-Won Koh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of forming fine patterns of semiconductor device
- Patent number 8,999,840
- Issue date Apr 7, 2015
- Samsung Electronics Co., Ltd.
- Cha-won Koh
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Methods of forming fine patterns and methods of fabricating semicon...
- Patent number 8,557,131
- Issue date Oct 15, 2013
- Samsung Electronics Co., Ltd.
- Cha-won Koh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of forming a hard mask and method of forming a fine pattern...
- Patent number 8,278,221
- Issue date Oct 2, 2012
- Samsung Electronics Co., Ltd.
- Cha-won Koh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of forming a hard mask and method of forming a fine pattern...
- Patent number 8,003,543
- Issue date Aug 23, 2011
- Samsung Electronics Co., Ltd.
- Cha-won Koh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for forming hard mask patterns having a fine pitch and metho...
- Patent number 7,998,874
- Issue date Aug 16, 2011
- Samsung Electronics Co., Ltd.
- Hak-sun Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for forming fine patterns of a semiconductor device using a...
- Patent number 7,892,982
- Issue date Feb 22, 2011
- Samsung Electronics Co., Ltd.
- Doo-youl Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for forming patterns of semiconductor device
- Patent number 7,862,988
- Issue date Jan 4, 2011
- Samsung Electronics Co., Ltd.
- Cha-Won Koh
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of forming pattern
- Patent number 7,842,451
- Issue date Nov 30, 2010
- Samsung Electronics Co., Ltd.
- Cha-Won Koh
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Flash memory device using double patterning technology and method o...
- Patent number 7,787,301
- Issue date Aug 31, 2010
- Samsung Electronics Co., Ltd.
- Doo-youl Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of forming a hard mask and method of forming a fine pattern...
- Patent number 7,732,341
- Issue date Jun 8, 2010
- Samsung Electronics Co., Ltd.
- Cha-won Koh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
E-beam lithography system for synchronously irradiating a plurality...
- Patent number 7,723,702
- Issue date May 25, 2010
- Samsung Electronics Co., Ltd.
- Je-bum Yoon
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of forming fine metal patterns for a semiconductor device us...
- Patent number 7,687,369
- Issue date Mar 30, 2010
- Samsung Electronics Co., Ltd.
- Cha-won Koh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Nonvolatile memory device and method of manufacturing the same
- Patent number 7,678,650
- Issue date Mar 16, 2010
- Samsung Electronics Co., Ltd.
- Cha-Won Koh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device having overlay measurement mark and method of...
- Patent number 7,582,899
- Issue date Sep 1, 2009
- Samsung Electronics Co., Ltd.
- Cha-Won Koh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of forming pattern
- Patent number 7,575,855
- Issue date Aug 18, 2009
- Samsung Electronics Co., Ltd.
- Cha-Won Koh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Nonvolatile memory device and method of manufacturing the same
- Patent number 7,560,768
- Issue date Jul 14, 2009
- Samsung Electronics Co., Ltd.
- Cha-Won Koh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods of fabricating a semiconductor device
- Patent number 7,540,970
- Issue date Jun 2, 2009
- Samsung Electronics Co., Ltd.
- Cha-Won Koh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of forming a mask structure and method of forming a minute p...
- Patent number 7,452,825
- Issue date Nov 18, 2008
- Samsung Electronics Co., Ltd.
- Doo-Youl Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of forming pattern for semiconductor device
- Patent number 7,387,869
- Issue date Jun 17, 2008
- Samsung Electronics Co., Ltd.
- Cha-Won Koh
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
PHOTORESIST COMPOSITIONS AND METHODS FOR FABRICATING SEMICONDUCTOR...
- Publication number 20230130025
- Publication date Apr 27, 2023
- Samsung SDI Co., Ltd.
- Cha Won KOH
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME
- Publication number 20200161308
- Publication date May 21, 2020
- SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME
- Jin-A KIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FILTER STRUCTURE FOR CHEMICAL SOLUTION USED IN MANUFACTURING INTEGR...
- Publication number 20190232227
- Publication date Aug 1, 2019
- Samsung Electronics Co., Ltd.
- Cha-won Koh
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME
- Publication number 20190206872
- Publication date Jul 4, 2019
- Samsung Electronics Co., Ltd.
- Jin-A KIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PHOTORESIST POLYMERS, PHOTORESIST COMPOSITIONS, METHODS OF FORMING...
- Publication number 20180069020
- Publication date Mar 8, 2018
- Jin PARK
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF FORMING PHOTORESIST PATTERN AND METHOD OF FABRICATING SEM...
- Publication number 20170125257
- Publication date May 4, 2017
- Samsung Electronics Co., Ltd.
- Cha-Won KOH
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS OF FORMING PATTERNS USING PHOTORESISTS
- Publication number 20160358778
- Publication date Dec 8, 2016
- Samsung Electronics Co., Ltd.
- Cheol-Hong PARK
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Methods of forming patterns using photoresist polymers and methods...
- Publication number 20160170304
- Publication date Jun 16, 2016
- Jin PARK
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Methods of Manufacturing Semiconductor Device
- Publication number 20160049306
- Publication date Feb 18, 2016
- Samsung Electronics Co., Ltd.
- Cha-won Koh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS OF FORMING A PATTERN OF A SEMICONDUCTOR DEVICE
- Publication number 20150243520
- Publication date Aug 27, 2015
- Samsung Electronics Co., Ltd.
- Jin PARK
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Methods of Fabricating Semiconductor Devices
- Publication number 20150093897
- Publication date Apr 2, 2015
- Cha-Won Koh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF FORMING FINE PATTERNS OF SEMICONDUCTOR DEVICE
- Publication number 20150017808
- Publication date Jan 15, 2015
- Samsung Electronics Co., Ltd.
- Cha-won KOH
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LITHOGRAPHY APPARATUS HAVING EFFECTIVE THERMAL ELECTRON ENHANCEMENT...
- Publication number 20140327894
- Publication date Nov 6, 2014
- Cha-Won KOH
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHODS OF FORMING FINE PATTERNS AND METHODS OF FABRICATING SEMICON...
- Publication number 20120115331
- Publication date May 10, 2012
- Samsung Electronics Co., Ltd.
- Cha-won Koh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF FORMING A HARD MASK AND METHOD OF FORMING A FINE PATTERN...
- Publication number 20110269294
- Publication date Nov 3, 2011
- Samsung Electronics Co., Ltd.
- Cha-won Koh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Flash Memory Device Using Double Patterning Technology and Method o...
- Publication number 20100290285
- Publication date Nov 18, 2010
- Doo-youl Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF FORMING A HARD MASK AND METHOD OF FORMING A FINE PATTERN...
- Publication number 20100197139
- Publication date Aug 5, 2010
- Samsung Electronics Co., Ltd.
- Cha-won Koh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF FORMING PATTERN
- Publication number 20090291561
- Publication date Nov 26, 2009
- Cha-Won Koh
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Nonvolatile memory device and method of manufacturing the same
- Publication number 20090258473
- Publication date Oct 15, 2009
- Cha-Won Koh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of forming fine metal patterns for a semiconductor device us...
- Publication number 20080200026
- Publication date Aug 21, 2008
- Cha-won Koh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for forming hard mask patterns having a fine pitch and metho...
- Publication number 20080131793
- Publication date Jun 5, 2008
- SAMSUNG ELECTRONICS CO., LTD.
- Hak-sun Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for forming fine patterns of a semiconductor device using a...
- Publication number 20080124931
- Publication date May 29, 2008
- SAMSUNG ELECTRONICS CO., LTD.
- Doo-youl Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of forming a hard mask and method of forming a fine pattern...
- Publication number 20080090419
- Publication date Apr 17, 2008
- Cha-won Koh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Methods of Forming Fine Patterns In Integrated Circuits Using Atomi...
- Publication number 20080076070
- Publication date Mar 27, 2008
- SAMSUNG ELECTRONICS CO., LTD.
- Cha-won Koh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Flash memory device using double patterning technology and method o...
- Publication number 20080067550
- Publication date Mar 20, 2008
- SAMSUNG ELECTRONICS CO., LTD.
- Doo-youl Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of forming a mask structure and method of forming a minute p...
- Publication number 20080057610
- Publication date Mar 6, 2008
- SAMSUNG ELECTRONICS CO., LTD.
- Doo-Youl Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of fabricating semiconductor device
- Publication number 20070197014
- Publication date Aug 23, 2007
- Samsung Electronics Co., Ltd.
- Jin-ho Jeon
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
E-beam lithography system for synchronously irradiating a plurality...
- Publication number 20070181828
- Publication date Aug 9, 2007
- SAMSUNG ELECTRONICS CO., LTD.
- Je-bum Yoon
- B82 - NANO-TECHNOLOGY
Information Patent Application
Mask having balance pattern and method of patterning photoresist us...
- Publication number 20070178391
- Publication date Aug 2, 2007
- SAMSUNG ELECTRONICS CO., LTD.
- Tae-Young Kim
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Nonvolatile memory device and method of manufacturing the same
- Publication number 20070111441
- Publication date May 17, 2007
- SAMSUNG ELECTRONICS CO., LTD.
- Cha-Won Koh
- H01 - BASIC ELECTRIC ELEMENTS

Cha-Won KOH

Person

Patents Grantslast 30 patents

Semiconductor device and method of manufacturing the same

Filter structure for chemical solution used in manufacturing integr...

Semiconductor device and method of manufacturing the same

Method of forming photoresist pattern and method of fabricating sem...

Photoresist polymers, photoresist compositions, methods of forming...

Methods of forming patterns using photoresist polymers and methods...

Methods of forming patterns using photoresists

Methods of forming a pattern of a semiconductor device

Lithography apparatus having effective thermal electron enhancement...

Methods of manufacturing semiconductor device

Methods of fabricating semiconductor devices

Method of forming fine patterns of semiconductor device

Methods of forming fine patterns and methods of fabricating semicon...

Method of forming a hard mask and method of forming a fine pattern...

Method of forming a hard mask and method of forming a fine pattern...

Method for forming hard mask patterns having a fine pitch and metho...

Method for forming fine patterns of a semiconductor device using a...

Method for forming patterns of semiconductor device

Method of forming pattern

Flash memory device using double patterning technology and method o...

Method of forming a hard mask and method of forming a fine pattern...

E-beam lithography system for synchronously irradiating a plurality...

Method of forming fine metal patterns for a semiconductor device us...

Nonvolatile memory device and method of manufacturing the same

Semiconductor device having overlay measurement mark and method of...

Method of forming pattern

Nonvolatile memory device and method of manufacturing the same

Methods of fabricating a semiconductor device

Method of forming a mask structure and method of forming a minute p...

Method of forming pattern for semiconductor device

Patents Applicationslast 30 patents

PHOTORESIST COMPOSITIONS AND METHODS FOR FABRICATING SEMICONDUCTOR...

SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME

FILTER STRUCTURE FOR CHEMICAL SOLUTION USED IN MANUFACTURING INTEGR...

SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME

PHOTORESIST POLYMERS, PHOTORESIST COMPOSITIONS, METHODS OF FORMING...

METHOD OF FORMING PHOTORESIST PATTERN AND METHOD OF FABRICATING SEM...

METHODS OF FORMING PATTERNS USING PHOTORESISTS

Methods of forming patterns using photoresist polymers and methods...

Methods of Manufacturing Semiconductor Device

METHODS OF FORMING A PATTERN OF A SEMICONDUCTOR DEVICE

Methods of Fabricating Semiconductor Devices

METHOD OF FORMING FINE PATTERNS OF SEMICONDUCTOR DEVICE

LITHOGRAPHY APPARATUS HAVING EFFECTIVE THERMAL ELECTRON ENHANCEMENT...

METHODS OF FORMING FINE PATTERNS AND METHODS OF FABRICATING SEMICON...

METHOD OF FORMING A HARD MASK AND METHOD OF FORMING A FINE PATTERN...

Flash Memory Device Using Double Patterning Technology and Method o...

METHOD OF FORMING A HARD MASK AND METHOD OF FORMING A FINE PATTERN...

METHOD OF FORMING PATTERN

Nonvolatile memory device and method of manufacturing the same

Method of forming fine metal patterns for a semiconductor device us...

Method for forming hard mask patterns having a fine pitch and metho...

Method for forming fine patterns of a semiconductor device using a...

Method of forming a hard mask and method of forming a fine pattern...

Methods of Forming Fine Patterns In Integrated Circuits Using Atomi...

Flash memory device using double patterning technology and method o...

Method of forming a mask structure and method of forming a minute p...

Method of fabricating semiconductor device

E-beam lithography system for synchronously irradiating a plurality...

Mask having balance pattern and method of patterning photoresist us...

Nonvolatile memory device and method of manufacturing the same