Cha Won Koh

Person

Seoul, KR

People

Patents Grantslast 30 patents

Information Patent Grant
Process for forming a fine pattern using a top-coating composition...
- Patent number 7,329,477
- Issue date Feb 12, 2008
- Hynix Semiconductor Inc.
- Jae Chang Jung
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Top-coating composition for photoresist and process for forming fin...
- Patent number 6,984,482
- Issue date Jan 10, 2006
- Hynix Semiconductor Inc.
- Jae Chang Jung
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Maleimide-photoresist monomers containing halogen, polymers thereof...
- Patent number 6,858,371
- Issue date Feb 22, 2005
- Hynix Semiconductor Inc.
- Geun Su Lee
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Method for forming fine patterns in semiconductor device
- Patent number 6,833,326
- Issue date Dec 21, 2004
- Hynix Semiconductor Inc.
- Cha Won Koh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Photoresist polymer for top-surface imaging process by silylation a...
- Patent number 6,770,415
- Issue date Aug 3, 2004
- Hynix Semiconductor Inc.
- Geun Su Lee
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Over-coating composition for photoresist, and processes for forming...
- Patent number 6,764,806
- Issue date Jul 20, 2004
- Hyundai Electronics Industries Co., Ltd.
- Jae Chang Jung
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Process for forming a photoresist pattern comprising alkaline treat...
- Patent number 6,699,644
- Issue date Mar 2, 2004
- Hyundai Electronics Industries Co., Ltd.
- Geun Su Lee
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Process for forming photoresist pattern by using gas phase amine tr...
- Patent number 6,664,031
- Issue date Dec 16, 2003
- Hynix Semiconductor Inc.
- Jae Chang Jung
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photoresist composition for top-surface imaging processes by silyla...
- Patent number 6,630,281
- Issue date Oct 7, 2003
- Hynix Semiconductor Inc.
- Cha Won Koh
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Photoresist composition for top-surface imaging process by silylation
- Patent number 6,627,378
- Issue date Sep 30, 2003
- Hyundai Electronics Industries Co., Ltd.
- Cha Won Koh
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for forming micro-pattern of semiconductor device
- Patent number 6,610,616
- Issue date Aug 26, 2003
- Hynix Semiconductor Inc.
- Cha-won Koh
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and forming fine patterns of semiconductor devices using pas...
- Patent number 6,599,844
- Issue date Jul 29, 2003
- Hyundai Electronics Industries, Co., Ltd.
- Cha-Won Koh
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photoresist monomer having hydroxy group and carboxy group, copolym...
- Patent number 6,586,619
- Issue date Jul 1, 2003
- Hyundai Electronics Industries Co., Ltd.
- Geun Su Lee
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Photoresist monomer having hydroxy group and carboxy group, copolym...
- Patent number 6,410,670
- Issue date Jun 25, 2002
- Hyundai Electronics Industries Co., Ltd.
- Geun Su Lee
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Phenylenediamine derivative-type additive useful for a chemically a...
- Patent number 6,399,272
- Issue date Jun 4, 2002
- Hyundai Electronics Industries Co., Ltd.
- Geun Su Lee
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photoresist polymers and photoresist compositions containing the same
- Patent number 6,387,589
- Issue date May 14, 2002
- Hyundai Electronics Industries Co., Ltd.
- Cha Won Koh
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Photoresist polymers and photoresist compositions containing the same
- Patent number 6,368,771
- Issue date Apr 9, 2002
- Hyundai Electronics Industries Co., Ltd.
- Cha Won Koh
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Copolymer resin, preparation thereof, and photoresist using the same
- Patent number 6,348,296
- Issue date Feb 19, 2002
- Hyundai Electronics Industries Co., Ltd.
- Min Ho Jung
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Photoresist monomers, polymers thereof, and photoresist composition...
- Patent number 6,235,447
- Issue date May 22, 2001
- Hyundai Electronics Industries Co., Ltd.
- Geun Su Lee
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Photoresist cross-linking monomers, photoresist polymers and photor...
- Patent number 6,200,731
- Issue date Mar 13, 2001
- Hyundai Electronics Industries Co., Ltd.
- Geun Su Lee
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Photoresist film for deep ultra violet and method for forming photo...
- Patent number 6,087,065
- Issue date Jul 11, 2000
- Hyundai Electronics Industries Co., Ltd.
- Cha Won Koh
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Photoresist composition comprising a copolymer resin
- Patent number 6,017,676
- Issue date Jan 25, 2000
- Hyundai Electronics Industries Co., Ltd.
- Jae Chang Jung
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photoresist film for deep ultra violet and method for forming photo...
- Patent number 5,888,698
- Issue date Mar 30, 1999
- Hyundai Electronics Industries Co., Ltd.
- Cha Won Koh
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...

Patents Applicationslast 30 patents

Information Patent Application
Process for forming a fine pattern using a top-coating composition...
- Publication number 20050069816
- Publication date Mar 31, 2005
- Hynix Semiconductor Inc.
- Jae Chang Jung
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method for forming fine patterns in semiconductor device
- Publication number 20030186547
- Publication date Oct 2, 2003
- Cha Won Koh
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Top-coating composition for photoresist and process for forming fin...
- Publication number 20030108815
- Publication date Jun 12, 2003
- Hynix Semiconductor Inc.
- Jae Chang Jung
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Maleimide-photoresist monomers containing halogen, polymers thereof...
- Publication number 20030013037
- Publication date Jan 16, 2003
- Geun Su Lee
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Application
Novel photoresist monomer having hydroxy group and carboxy group, c...
- Publication number 20020091216
- Publication date Jul 11, 2002
- HYUNDAI ELECTRONICS INDUSTRIES CO., LTD.
- Geun Su Lee
- C07 - ORGANIC CHEMISTRY
Information Patent Application
Method for forming micro-pattern of semiconductor device
- Publication number 20020090832
- Publication date Jul 11, 2002
- Cha-Won Koh
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Photoresist polymer for top-surface imaging process by silylation a...
- Publication number 20020061461
- Publication date May 23, 2002
- Geun Su Lee
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Photoresist composition for top-surface imaging processes by silyla...
- Publication number 20020031721
- Publication date Mar 14, 2002
- Cha Won Koh
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Application
Method and forming fine patterns of semiconductor devices using pas...
- Publication number 20020006585
- Publication date Jan 17, 2002
- Cha-Won Koh
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Process for forming photoresist pattern by using gas phase amine tr...
- Publication number 20010053590
- Publication date Dec 20, 2001
- Jae Chang Jung
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Over-coating composition for photoresist, and processes for forming...
- Publication number 20010003030
- Publication date Jun 7, 2001
- Jae Chang Jung
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC

Cha Won Koh

Person

Patents Grantslast 30 patents

Process for forming a fine pattern using a top-coating composition...

Top-coating composition for photoresist and process for forming fin...

Maleimide-photoresist monomers containing halogen, polymers thereof...

Method for forming fine patterns in semiconductor device

Photoresist polymer for top-surface imaging process by silylation a...

Over-coating composition for photoresist, and processes for forming...

Process for forming a photoresist pattern comprising alkaline treat...

Process for forming photoresist pattern by using gas phase amine tr...

Photoresist composition for top-surface imaging processes by silyla...

Photoresist composition for top-surface imaging process by silylation

Method for forming micro-pattern of semiconductor device

Method and forming fine patterns of semiconductor devices using pas...

Photoresist monomer having hydroxy group and carboxy group, copolym...

Photoresist monomer having hydroxy group and carboxy group, copolym...

Phenylenediamine derivative-type additive useful for a chemically a...

Photoresist polymers and photoresist compositions containing the same

Photoresist polymers and photoresist compositions containing the same

Copolymer resin, preparation thereof, and photoresist using the same

Photoresist monomers, polymers thereof, and photoresist composition...

Photoresist cross-linking monomers, photoresist polymers and photor...

Photoresist film for deep ultra violet and method for forming photo...

Photoresist composition comprising a copolymer resin

Photoresist film for deep ultra violet and method for forming photo...

Patents Applicationslast 30 patents

Process for forming a fine pattern using a top-coating composition...

Method for forming fine patterns in semiconductor device

Top-coating composition for photoresist and process for forming fin...

Maleimide-photoresist monomers containing halogen, polymers thereof...

Novel photoresist monomer having hydroxy group and carboxy group, c...

Method for forming micro-pattern of semiconductor device

Photoresist polymer for top-surface imaging process by silylation a...

Photoresist composition for top-surface imaging processes by silyla...

Method and forming fine patterns of semiconductor devices using pas...

Process for forming photoresist pattern by using gas phase amine tr...

Over-coating composition for photoresist, and processes for forming...