Chang-Ching Kin

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Hsin-chu Hsien, TW

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Patents Grantslast 30 patents

Information Patent Grant
Method for removal of photoresist residue after dry metal etch
- Patent number 5,770,523
- Issue date Jun 23, 1998
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Ming-Yeon Hung
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY