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Chantal J. Arena-Foster
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Mesa, AZ, US
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Patents Grants
last 30 patents
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Patent Grant
Developing photoresist with supercritical fluid and developer
Patent number
7,044,662
Issue date
May 16, 2006
Tokyo Electron Limited
Chantal J. Arena-Foster
B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information
Patent Grant
Drying resist with a solvent bath and supercritical CO2
Patent number
6,928,746
Issue date
Aug 16, 2005
Tokyo Electron Limited
Chantal J. Arena-Foster
B81 - MICRO-STRUCTURAL TECHNOLOGY
Information
Patent Grant
Developing photoresist with supercritical fluid and developer
Patent number
6,924,086
Issue date
Aug 2, 2005
Tokyo Electron Limited
Chantal J. Arena-Foster
B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Patents Applications
last 30 patents
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Patent Application
Developing photoresist with supercritical fluid and developer
Publication number
20050008980
Publication date
Jan 13, 2005
Chantal J. Arena-Foster
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
Removal of contaminants using supercritical processing
Publication number
20040072706
Publication date
Apr 15, 2004
Chantal J. Arena-Foster
B08 - CLEANING
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Patent Application
Drying resist with a solvent bath and supercritical CO2
Publication number
20040035021
Publication date
Feb 26, 2004
Chantal J. Arena-Foster
B81 - MICRO-STRUCTURAL TECHNOLOGY