Chaung Lin

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Hsinchu, TW

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Patents Grantslast 30 patents

Information Patent Grant
Process for fabricating plasma with feedback control on plasma density
- Patent number 6,383,554
- Issue date May 7, 2002
- National Science Council
- Cheng-Hung Chang
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
Inductively-coupled plasma etch apparatus and feedback control meth...
- Publication number 20060226786
- Publication date Oct 12, 2006
- Chaung Lin
- H01 - BASIC ELECTRIC ELEMENTS