Che-Hao Tu

Person

Hsinchu City, TW

People

Patents Grantslast 30 patents

Information Patent Grant
Electrical cleaning tool for wafer polishing tool system
- Patent number 12,128,455
- Issue date Oct 29, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chih-Wen Liu
- B08 - CLEANING
Information Patent Grant
Forming gate line-end of semiconductor structures with improved met...
- Patent number 12,068,196
- Issue date Aug 20, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Che-Liang Chung
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Zone-based CMP target control
- Patent number 11,951,587
- Issue date Apr 9, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Che-Liang Chung
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Hard mask removal method
- Patent number 11,854,821
- Issue date Dec 26, 2023
- Taiwan Semiconductor Manufacturing Company Limited
- Che-Hao Tu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Hard mask removal method
- Patent number 10,971,370
- Issue date Apr 6, 2021
- Taiwan Semiconductor Manufacturing Company Limited
- Che-Hao Tu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Forming gate line-end of semiconductor structures
- Patent number 10,943,822
- Issue date Mar 9, 2021
- Taiwan Semiconductor Manufacturing Co., Ltd
- Che-Liang Chung
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System and method of chemical mechanical polishing
- Patent number 10,800,004
- Issue date Oct 13, 2020
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chih-Wen Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Hard mask removal method
- Patent number 10,510,552
- Issue date Dec 17, 2019
- TAIWAN SEMICONDUCTOR MANFACTURING COMPANY, LTD.
- Che-Hao Tu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Hard mask removal method
- Patent number 9,960,050
- Issue date May 1, 2018
- Taiwan Semiconductor Manufacturing Company Limited
- Che-Hao Tu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Surface treatment in a chemical mechanical process
- Patent number 9,941,109
- Issue date Apr 10, 2018
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chih-Wen Liu
- B24 - GRINDING POLISHING
Information Patent Grant
Asymmetric application of pressure to a wafer during a CMP process
- Patent number 9,922,837
- Issue date Mar 20, 2018
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chih-Wen Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Mechanisms for forming oxide layer over exposed polysilicon during...
- Patent number 9,711,374
- Issue date Jul 18, 2017
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Che-Hao Tu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Composite structure for gate level inter-layer dielectric
- Patent number 9,595,450
- Issue date Mar 14, 2017
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Che-Hao Tu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Planarization process for semiconductor device fabrication
- Patent number 8,975,179
- Issue date Mar 10, 2015
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Che-Hao Tu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Gate height loss improvement for a transistor
- Patent number 8,598,028
- Issue date Dec 3, 2013
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Che-Hao Tu
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
PROCESSING TOOL AND METHOD
- Publication number 20240395537
- Publication date Nov 28, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chi-hsiang Shen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTRICAL CLEANING TOOL FOR WAFER POLISHING TOOL SYSTEM
- Publication number 20240367202
- Publication date Nov 7, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chih-Wen Liu
- B24 - GRINDING POLISHING
Information Patent Application
ZONE-BASED CMP TARGET CONTROL
- Publication number 20240217052
- Publication date Jul 4, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Che-Liang CHUNG
- B24 - GRINDING POLISHING
Information Patent Application
Hard Mask Removal Method
- Publication number 20240105460
- Publication date Mar 28, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Che-Hao Tu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTRICAL CLEANING TOOL FOR WAFER POLISHING TOOL SYSTEM
- Publication number 20240050995
- Publication date Feb 15, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chih-Wen Liu
- B08 - CLEANING
Information Patent Application
Hard Mask Removal Method
- Publication number 20210225657
- Publication date Jul 22, 2021
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Che-Hao Tu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FORMING GATE LINE-END OF SEMICONDUCTOR STRUCTURES
- Publication number 20210166972
- Publication date Jun 3, 2021
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Che-Liang CHUNG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
System and Method of Chemical Mechanical Polishing
- Publication number 20210023678
- Publication date Jan 28, 2021
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chih-Wen Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Hard Mask Removal Method
- Publication number 20200118827
- Publication date Apr 16, 2020
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Che-Hao Tu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEM AND METHOD OF CHEMICAL MECHANICAL POLISHING
- Publication number 20200101582
- Publication date Apr 2, 2020
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chih-Wen Liu
- B24 - GRINDING POLISHING
Information Patent Application
ZONE-BASED CMP TARGET CONTROL
- Publication number 20200094369
- Publication date Mar 26, 2020
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Che-Liang Chung
- B24 - GRINDING POLISHING
Information Patent Application
FORMING GATE LINE-END OF SEMICONDUCTOR STRUCTURES
- Publication number 20190287852
- Publication date Sep 19, 2019
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Che-Liang Chung
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Hard Mask Removal Method
- Publication number 20180240679
- Publication date Aug 23, 2018
- Taiwan Semiconductor Manufacturing Company Limited
- CHE-HAO TU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Surface Treatment in a Chemical Mechanical Process
- Publication number 20180005840
- Publication date Jan 4, 2018
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chih-Wen Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Asymmetric Application of Pressure to a Wafer During a CMP Process
- Publication number 20170256414
- Publication date Sep 7, 2017
- Taiwan Semiconductor Manufacturing Co., LTD
- Chih-Wen Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Composite Structure for Gate Level Inter-Layer Dielectric
- Publication number 20150187594
- Publication date Jul 2, 2015
- Taiwan Semiconductor Manufacturing Co., LTD
- Che-Hao Tu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HARD MASK REMOVAL METHOD
- Publication number 20150037978
- Publication date Feb 5, 2015
- Taiwan Semiconductor Manufacturing Company Limited
- CHE-HAO TU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MECHANISMS FOR FORMING OXIDE LAYER OVER EXPOSED POLYSILICON DURING...
- Publication number 20140370696
- Publication date Dec 18, 2014
- Che-Hao TU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
GATE HEIGHT LOSS IMPROVEMENT FOR A TRANSISTOR
- Publication number 20130164930
- Publication date Jun 27, 2013
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Che-Hao Tu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLANARIZATION PROCESS FOR SEMICONDUCTOR DEVICE FABRICATION
- Publication number 20130095644
- Publication date Apr 18, 2013
- Taiwan Semiconductor Manufacturing Company, Ltd., ("TSMC")
- Che-Hao Tu
- H01 - BASIC ELECTRIC ELEMENTS

Person

Patents Grantslast 30 patents

Electrical cleaning tool for wafer polishing tool system

Forming gate line-end of semiconductor structures with improved met...

Zone-based CMP target control

Hard mask removal method

Hard mask removal method

Forming gate line-end of semiconductor structures

System and method of chemical mechanical polishing

Hard mask removal method

Hard mask removal method

Surface treatment in a chemical mechanical process

Asymmetric application of pressure to a wafer during a CMP process

Mechanisms for forming oxide layer over exposed polysilicon during...

Composite structure for gate level inter-layer dielectric

Planarization process for semiconductor device fabrication

Gate height loss improvement for a transistor

Patents Applicationslast 30 patents

PROCESSING TOOL AND METHOD

ELECTRICAL CLEANING TOOL FOR WAFER POLISHING TOOL SYSTEM

ZONE-BASED CMP TARGET CONTROL

Hard Mask Removal Method

ELECTRICAL CLEANING TOOL FOR WAFER POLISHING TOOL SYSTEM

Hard Mask Removal Method

FORMING GATE LINE-END OF SEMICONDUCTOR STRUCTURES

System and Method of Chemical Mechanical Polishing

Hard Mask Removal Method

SYSTEM AND METHOD OF CHEMICAL MECHANICAL POLISHING

ZONE-BASED CMP TARGET CONTROL

FORMING GATE LINE-END OF SEMICONDUCTOR STRUCTURES

Hard Mask Removal Method

Surface Treatment in a Chemical Mechanical Process

Asymmetric Application of Pressure to a Wafer During a CMP Process

Composite Structure for Gate Level Inter-Layer Dielectric

HARD MASK REMOVAL METHOD

MECHANISMS FOR FORMING OXIDE LAYER OVER EXPOSED POLYSILICON DURING...

GATE HEIGHT LOSS IMPROVEMENT FOR A TRANSISTOR

PLANARIZATION PROCESS FOR SEMICONDUCTOR DEVICE FABRICATION