Chelsea DuBose

Person

Austin, TX, US

People

Patents Grantslast 30 patents

Information Patent Grant
Process control enabled VDC sensor for plasma process
- Patent number 12,272,520
- Issue date Apr 8, 2025
- Tokyo Electron Limited
- Merritt Funk
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Radio frequency (RF) system with embedded RF signal pickups
- Patent number 12,224,164
- Issue date Feb 11, 2025
- Tokyo Electron Limited
- Chelsea Dubose
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
RF voltage and current (V-I) sensors and measurement methods
- Patent number 12,176,183
- Issue date Dec 24, 2024
- Tokyo Electron Limited
- Barton Lane
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Parallel resonance antenna for radial plasma control
- Patent number 12,074,390
- Issue date Aug 27, 2024
- Tokyo Electron Limited
- Chelsea DuBose
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
RF voltage and current (V-I) sensors and measurement methods
- Patent number 11,817,296
- Issue date Nov 14, 2023
- Tokyo Electron Limited
- Barton Lane
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Power generation systems and methods for plasma stability and control
- Patent number 11,721,524
- Issue date Aug 8, 2023
- Tokyo Electron Limited
- Merritt Funk
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
RF voltage and current (V-I) sensors and measurement methods
- Patent number 11,600,474
- Issue date Mar 7, 2023
- Tokyo Electron Limited
- Barton Lane
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
RF measurement system and method
- Patent number 11,410,832
- Issue date Aug 9, 2022
- Tokyo Electron Limited
- Merritt Funk
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and systems for focus ring thickness determinations and fee...
- Patent number 11,393,663
- Issue date Jul 19, 2022
- Tokyo Electron Limited
- Merritt Funk
- G05 - CONTROLLING REGULATING
Information Patent Grant
Power generation systems and methods for plasma stability and control
- Patent number 11,094,507
- Issue date Aug 17, 2021
- Tokyo Electron Limited
- Merritt Funk
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Modules, multi-stage systems, and related methods for radio frequen...
- Patent number 11,050,394
- Issue date Jun 29, 2021
- Tokyo Electron Limited
- Chelsea DuBose
- H03 - BASIC ELECTRONIC CIRCUITRY
Information Patent Grant
Methods and systems for controlling plasma performance
- Patent number 10,510,512
- Issue date Dec 17, 2019
- Tokyo Electron Limited
- Merritt Funk
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
METHOD FOR PLASMA PROCESSING
- Publication number 20250069852
- Publication date Feb 27, 2025
- TOKYO ELECTRON LIMITED
- Justin Moses
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Parallel Resonance Antenna for Radial Plasma Control
- Publication number 20240380114
- Publication date Nov 14, 2024
- TOKYO ELECTRON LIMITED
- Chelsea DuBose
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Antenna Plane Magnets for Improved Performance
- Publication number 20240258074
- Publication date Aug 1, 2024
- TOKYO ELECTRON LIMITED
- Chelsea DuBose
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Parallel Resonance Antenna for Radial Plasma Control
- Publication number 20240162619
- Publication date May 16, 2024
- TOKYO ELECTRON LIMITED
- Chelsea DuBose
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RF Voltage and Current (V-I) Sensors and Measurement Methods
- Publication number 20240038496
- Publication date Feb 1, 2024
- TOKYO ELECTRON LIMITED
- Barton Lane
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RADIO FREQUENCY (RF) SYSTEM WITH EMBEDDED RF SIGNAL PICKUPS
- Publication number 20230132660
- Publication date May 4, 2023
- TOKYO ELECTRON LIMITED
- Chelsea Dubose
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RF Voltage and Current (V-I) Sensors and Measurement Methods
- Publication number 20210407775
- Publication date Dec 30, 2021
- TOKYO ELECTRON LIMITED
- Justin Moses
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RF Voltage and Current (V-I) Sensors and Measurement Methods
- Publication number 20210407770
- Publication date Dec 30, 2021
- TOKYO ELECTRON LIMITED
- Justin Moses
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RF Measurement System and Method
- Publication number 20210407771
- Publication date Dec 30, 2021
- TOKYO ELECTRON LIMITED
- Merritt Funk
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Power Generation Systems and Methods for Plasma Stability and Control
- Publication number 20210343504
- Publication date Nov 4, 2021
- TOKYO ELECTRON LIMITED
- Merritt Funk
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
POWER GENERATION SYSTEMS AND METHODS FOR PLASMA STABILITY AND CONTROL
- Publication number 20210027992
- Publication date Jan 28, 2021
- TOKYO ELECTRON LIMITED
- Merritt Funk
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROCESS CONTROL ENABLED VDC SENSOR FOR PLASMA PROCESS
- Publication number 20210013005
- Publication date Jan 14, 2021
- TOKYO ELECTRON LIMITED
- Merritt Funk
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
MODULES, MULTI-STAGE SYSTEMS, AND RELATED METHODS FOR RADIO FREQUEN...
- Publication number 20200395901
- Publication date Dec 17, 2020
- TOKYO ELECTRON LIMITED
- Chelsea DuBose
- H03 - BASIC ELECTRONIC CIRCUITRY
Information Patent Application
METHODS AND SYSTEMS FOR FOCUS RING THICKNESS DETERMINATIONS AND FEE...
- Publication number 20200273678
- Publication date Aug 27, 2020
- TOKYO ELECTRON LIMITED
- Merritt Funk
- G05 - CONTROLLING REGULATING
Information Patent Application
METHODS AND SYSTEMS FOR CONTROLLING PLASMA PERFORMANCE
- Publication number 20190228950
- Publication date Jul 25, 2019
- TOKYO ELECTRON LIMITED
- Merritt Funk
- H01 - BASIC ELECTRIC ELEMENTS

Chelsea DuBose

Person

Patents Grantslast 30 patents

Process control enabled VDC sensor for plasma process

Radio frequency (RF) system with embedded RF signal pickups

RF voltage and current (V-I) sensors and measurement methods

Parallel resonance antenna for radial plasma control

RF voltage and current (V-I) sensors and measurement methods

Power generation systems and methods for plasma stability and control

RF voltage and current (V-I) sensors and measurement methods

RF measurement system and method

Methods and systems for focus ring thickness determinations and fee...

Power generation systems and methods for plasma stability and control

Modules, multi-stage systems, and related methods for radio frequen...

Methods and systems for controlling plasma performance

Patents Applicationslast 30 patents

METHOD FOR PLASMA PROCESSING

Parallel Resonance Antenna for Radial Plasma Control

Antenna Plane Magnets for Improved Performance

Parallel Resonance Antenna for Radial Plasma Control

RF Voltage and Current (V-I) Sensors and Measurement Methods

RADIO FREQUENCY (RF) SYSTEM WITH EMBEDDED RF SIGNAL PICKUPS

RF Voltage and Current (V-I) Sensors and Measurement Methods

RF Voltage and Current (V-I) Sensors and Measurement Methods

RF Measurement System and Method

Power Generation Systems and Methods for Plasma Stability and Control

POWER GENERATION SYSTEMS AND METHODS FOR PLASMA STABILITY AND CONTROL

PROCESS CONTROL ENABLED VDC SENSOR FOR PLASMA PROCESS

MODULES, MULTI-STAGE SYSTEMS, AND RELATED METHODS FOR RADIO FREQUEN...

METHODS AND SYSTEMS FOR FOCUS RING THICKNESS DETERMINATIONS AND FEE...

METHODS AND SYSTEMS FOR CONTROLLING PLASMA PERFORMANCE