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Chen Wang
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New Haven, CT, US
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last 30 patents
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Patent Grant
Techniques for manipulation of two-qubit quantum states and related...
Patent number
11,184,006
Issue date
Nov 23, 2021
Yale University
Chen Wang
B82 - NANO-TECHNOLOGY
Information
Patent Grant
Copper filling of through silicon vias
Patent number
10,221,496
Issue date
Mar 5, 2019
MacDermid Enthone Inc.
Thomas B. Richardson
C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information
Patent Grant
Process for filling vias in the microelectronics
Patent number
10,103,029
Issue date
Oct 16, 2018
MacDermid Enthone Inc.
Thomas B. Richardson
C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information
Patent Grant
Copper metallization of through silicon via
Patent number
7,670,950
Issue date
Mar 2, 2010
Enthone Inc.
Thomas B. Richardson
H01 - BASIC ELECTRIC ELEMENTS
Patents Applications
last 30 patents
Information
Patent Application
TECHNIQUES FOR MANIPULATION OF TWO-QUBIT QUANTUM STATES AND RELATED...
Publication number
20190020346
Publication date
Jan 17, 2019
Yale University
Chen WANG
B82 - NANO-TECHNOLOGY
Information
Patent Application
COPPER FILLING OF THROUGH SILICON VIAS
Publication number
20190003068
Publication date
Jan 3, 2019
Enthone Inc.
Thomas B. Richardson
C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information
Patent Application
Process for Filling Vias in the Microelectronics
Publication number
20160254156
Publication date
Sep 1, 2016
Enthone Inc.
Thomas B. Richardson
C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information
Patent Application
PROCESS FOR FILLING VIAS IN THE MICROELECTRONICS
Publication number
20140120722
Publication date
May 1, 2014
Enthone Inc.
Thomas B. Richardson
C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information
Patent Application
COPPER FILLING OF THROUGH SILICON VIAS
Publication number
20130199935
Publication date
Aug 8, 2013
Enthone Inc.
Thomas B. Richardson
C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information
Patent Application
COPPER METALLIZATION OF THROUGH SILICON VIA
Publication number
20090035940
Publication date
Feb 5, 2009
Enthone Inc.
Thomas B. Richardson
C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR