Cheng-Po CHAU

Person

Tainan City, TW

People

Patents Grantslast 30 patents

Information Patent Grant
Device and method for high pressure anneal
- Patent number 12,183,573
- Issue date Dec 31, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Szu-Ying Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of forming a semiconductor device by driving hydrogen into a...
- Patent number 12,183,581
- Issue date Dec 31, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Hongfa Luan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for forming semiconductor device having isolation structures...
- Patent number 11,923,235
- Issue date Mar 5, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Cheng-Ta Wu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacturing a semiconductor device and a semiconductor...
- Patent number 11,901,442
- Issue date Feb 13, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Ya-Wen Chiu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Device and method for high pressure anneal
- Patent number 11,854,800
- Issue date Dec 26, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd
- Szu-Ying Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of forming semiconductor device by driving hydrogen into a d...
- Patent number 11,776,814
- Issue date Oct 3, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd
- Hongfa Luan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and method
- Patent number 11,728,406
- Issue date Aug 15, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd
- De-Wei Yu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacturing a semiconductor device and a semiconductor...
- Patent number 11,677,015
- Issue date Jun 13, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd
- Ya-Wen Chiu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for forming semiconductor device having isolation structures...
- Patent number 11,450,555
- Issue date Sep 20, 2022
- Taiwan Semiconductor Manufacturing Co., Ltd
- Cheng-Ta Wu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device structure with salicide layer and method for f...
- Patent number 11,444,173
- Issue date Sep 13, 2022
- Taiwan Semiconductor Manufacturing Co., Ltd
- Hsiang-Ku Shen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and method
- Patent number 11,211,470
- Issue date Dec 28, 2021
- Taiwan Semiconductor Manufacturing Company, Ltd
- Meng-Ku Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and method
- Patent number 11,087,987
- Issue date Aug 10, 2021
- Taiwan Semiconductor Manufacturing Company, Ltd
- Ta-Chun Ma
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Device and method for high pressure anneal
- Patent number 11,037,781
- Issue date Jun 15, 2021
- Taiwan Semiconductor Manufacturing Company, Ltd
- Szu-Ying Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device having hydrogen in a dielectric layer
- Patent number 10,950,447
- Issue date Mar 16, 2021
- Taiwan Semiconductor Manufacturing Co., Ltd
- Hongfa Luan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device having isolation structures with different thi...
- Patent number 10,950,490
- Issue date Mar 16, 2021
- Taiwan Semiconductor Manufacturing Co., Ltd
- Cheng-Ta Wu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Thermal treatment for gate dielectrics
- Patent number 10,879,371
- Issue date Dec 29, 2020
- Taiwan Semiconductor Manufacturing Company, Ltd
- Yi-Yun Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and method
- Patent number 10,868,137
- Issue date Dec 15, 2020
- Taiwan Semiconductor Manufacturing Company, Ltd
- De-Wei Yu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device having hydrogen in a dielectric layer
- Patent number 10,714,348
- Issue date Jul 14, 2020
- Taiwan Semiconductor Manufacturing Co., Ltd
- Hongfa Luan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of forming a semiconductor device by high-pressure anneal an...
- Patent number 10,504,735
- Issue date Dec 10, 2019
- Taiwan Semiconductor Manufacturing Co., Ltd
- Hongfa Luan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device having isolation structures with different thi...
- Patent number 10,157,770
- Issue date Dec 18, 2018
- Taiwan Semiconductor Manufacturing Co., Ltd
- Cheng-Ta Wu
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE AND A SEMICONDUCTOR...
- Publication number 20240145581
- Publication date May 2, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Ya-Wen CHIU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of Forming a Semiconductor Device by Driving Hydrogen into a...
- Publication number 20230386847
- Publication date Nov 30, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Hongfa LUAN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DEVICE AND METHOD FOR HIGH PRESSURE ANNEAL
- Publication number 20230386832
- Publication date Nov 30, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Szu-Ying Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor Device and Method
- Publication number 20230352563
- Publication date Nov 2, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd.
- De-Wei Yu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE STRUCTURE
- Publication number 20220376079
- Publication date Nov 24, 2022
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Hsiang-Ku SHEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE AND A SEMICONDUCTOR...
- Publication number 20220376091
- Publication date Nov 24, 2022
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Ya-Wen CHIU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR FORMING SEMICONDUCTOR DEVICE HAVING ISOLATION STRUCTURES...
- Publication number 20220367248
- Publication date Nov 17, 2022
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Cheng-Ta WU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor Device and Method
- Publication number 20210366715
- Publication date Nov 25, 2021
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Ta-Chun Ma
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE AND A SEMICONDUCTOR...
- Publication number 20210359111
- Publication date Nov 18, 2021
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Ya-Wen CHIU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Device and Method for High Pressure Anneal
- Publication number 20210280414
- Publication date Sep 9, 2021
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Szu-Ying Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor Device Having Hydrogen in a Dielectric Layer
- Publication number 20210202255
- Publication date Jul 1, 2021
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Hongfa LUAN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR FORMING SEMICONDUCTOR DEVICE HAVING ISOLATION STRUCTURES...
- Publication number 20210202301
- Publication date Jul 1, 2021
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Cheng-Ta WU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor Device and Method
- Publication number 20210134984
- Publication date May 6, 2021
- Taiwan Semiconductor Manufacturing Co., Ltd.
- De-Wei Yu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor Device and Method
- Publication number 20210119013
- Publication date Apr 22, 2021
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Meng-Ku Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor Device Having Hydrogen in a Dielectric Layer
- Publication number 20200321216
- Publication date Oct 8, 2020
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Hongfa LUAN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor Device and Method
- Publication number 20200135467
- Publication date Apr 30, 2020
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Ta-Chun Ma
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE AND METHOD
- Publication number 20200044048
- Publication date Feb 6, 2020
- Taiwan Semiconductor Manufacturing Company, Ltd.
- De-Wei Yu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of Forming a Semiconductor Device by High-Pressure Anneal an...
- Publication number 20200013623
- Publication date Jan 9, 2020
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Hongfa LUAN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Device and Method for High Pressure Anneal
- Publication number 20200006063
- Publication date Jan 2, 2020
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Szu-Ying Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Thermal Treatment for Gate Dielectrics
- Publication number 20190378913
- Publication date Dec 12, 2019
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Yi-Yun Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE HAVING ISOLATION STRUCTURES WITH DIFFERENT THI...
- Publication number 20190139814
- Publication date May 9, 2019
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Cheng-Ta WU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE STRUCTURE WITH SALICIDE LAYER AND METHOD FOR F...
- Publication number 20190131421
- Publication date May 2, 2019
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Hsiang-Ku SHEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor Device Performance Improvement
- Publication number 20190103277
- Publication date Apr 4, 2019
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Hongfa LUAN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE HAVING ISOLATION STRUCTURE AND METHOD OF FORMI...
- Publication number 20180151414
- Publication date May 31, 2018
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Cheng-Ta WU
- H01 - BASIC ELECTRIC ELEMENTS

Cheng-Po CHAU

Person

Patents Grantslast 30 patents

Device and method for high pressure anneal

Method of forming a semiconductor device by driving hydrogen into a...

Method for forming semiconductor device having isolation structures...

Method of manufacturing a semiconductor device and a semiconductor...

Device and method for high pressure anneal

Method of forming semiconductor device by driving hydrogen into a d...

Semiconductor device and method

Method of manufacturing a semiconductor device and a semiconductor...

Method for forming semiconductor device having isolation structures...

Semiconductor device structure with salicide layer and method for f...

Semiconductor device and method

Semiconductor device and method

Device and method for high pressure anneal

Semiconductor device having hydrogen in a dielectric layer

Semiconductor device having isolation structures with different thi...

Thermal treatment for gate dielectrics

Semiconductor device and method

Semiconductor device having hydrogen in a dielectric layer

Method of forming a semiconductor device by high-pressure anneal an...

Semiconductor device having isolation structures with different thi...

Patents Applicationslast 30 patents

METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE AND A SEMICONDUCTOR...

Method of Forming a Semiconductor Device by Driving Hydrogen into a...

DEVICE AND METHOD FOR HIGH PRESSURE ANNEAL

Semiconductor Device and Method

SEMICONDUCTOR DEVICE STRUCTURE

METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE AND A SEMICONDUCTOR...

METHOD FOR FORMING SEMICONDUCTOR DEVICE HAVING ISOLATION STRUCTURES...

Semiconductor Device and Method

METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE AND A SEMICONDUCTOR...

Device and Method for High Pressure Anneal

Semiconductor Device Having Hydrogen in a Dielectric Layer

METHOD FOR FORMING SEMICONDUCTOR DEVICE HAVING ISOLATION STRUCTURES...

Semiconductor Device and Method

Semiconductor Device and Method

Semiconductor Device Having Hydrogen in a Dielectric Layer

Semiconductor Device and Method

SEMICONDUCTOR DEVICE AND METHOD

Method of Forming a Semiconductor Device by High-Pressure Anneal an...

Device and Method for High Pressure Anneal

Thermal Treatment for Gate Dielectrics

SEMICONDUCTOR DEVICE HAVING ISOLATION STRUCTURES WITH DIFFERENT THI...

SEMICONDUCTOR DEVICE STRUCTURE WITH SALICIDE LAYER AND METHOD FOR F...

Semiconductor Device Performance Improvement

SEMICONDUCTOR DEVICE HAVING ISOLATION STRUCTURE AND METHOD OF FORMI...