Chengchang Wei

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Shanghai, CN

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Patents Grantslast 30 patents

Information Patent Grant
Method for avoiding damage to overlay metrology mark
- Patent number 12,276,920
- Issue date Apr 15, 2025
- Shanghai Huali Integrated Circuit Corporation
- Chengchang Wei
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
Method for Avoiding Damage to Overlay Metrology Mark
- Publication number 20230161268
- Publication date May 25, 2023
- Shanghai Huali Integrated Circuit Corporation
- Chengchang Wei
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HIGH DIELECTRIC CONSTANT METAL GATE MOS TRANSISTOR
- Publication number 20220231141
- Publication date Jul 21, 2022
- Shanghai Huali Integrated Circuit Corporation
- Chengchang Wei
- H01 - BASIC ELECTRIC ELEMENTS