Chester J. Sobodacha

Person

Coventry, RI, US

People

Patents Grantslast 30 patents

Information Patent Grant
Novolak resin blends for photoresist applications
- Patent number 5,646,218
- Issue date Jul 8, 1997
- Hoechst Celanese Corp.
- Thomas J. Lynch
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Novolak resin blends for photoresist applications
- Patent number 5,374,693
- Issue date Dec 20, 1994
- Hoechst Celanese Corporation
- Thomas J. Lynch
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Method for producing positive photoresist image utilizing diazo est...
- Patent number 5,348,842
- Issue date Sep 20, 1994
- Hoechst Celanese Corporation
- Dinesh N. Khanna
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Polyphosphazene binder resins for photoresists comprising as photos...
- Patent number 5,248,585
- Issue date Sep 28, 1993
- Hoechst Celanese Corporation
- Thomas J. Lynch
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Diazo ester of a benzolactone ring compound and positive photoresis...
- Patent number 5,221,592
- Issue date Jun 22, 1993
- Hoechst Celanese Corporation
- Dinesh N. Khanna
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Process for the preparation of photosensitive compositions containi...
- Patent number 5,162,510
- Issue date Nov 10, 1992
- Hoechst Celanese Corporation
- Robert E. Potvin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photosensitive article having phenolic photosensitizers containing...
- Patent number 5,035,976
- Issue date Jul 30, 1991
- Hoechst Celanese Corporation
- Robert E. Potvin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Phenolic photosensitizers containing quinone diazide and acidic hal...
- Patent number 4,902,785
- Issue date Feb 20, 1990
- Hoechst Celanese Corporation
- Robert E. Potvin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mixed ester O-quinone diazide photosensitizers and process of prepa...
- Patent number 4,892,801
- Issue date Jan 9, 1990
- Hoechst Celanese Corporation
- Robert E. Potvin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Novel mixed ester O-quinone photosensitizers
- Patent number 4,732,837
- Issue date Mar 22, 1988
- Hoechst Celanese Corporation
- Robert E. Potvin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Novel mixed ester O-quinone photosensitizers
- Patent number 4,732,836
- Issue date Mar 22, 1988
- Hoechst Celanese Corporation
- Robert E. Potvin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Chester J. Sobodacha

Person

Patents Grantslast 30 patents

Novolak resin blends for photoresist applications

Novolak resin blends for photoresist applications

Method for producing positive photoresist image utilizing diazo est...

Polyphosphazene binder resins for photoresists comprising as photos...

Diazo ester of a benzolactone ring compound and positive photoresis...

Process for the preparation of photosensitive compositions containi...

Photosensitive article having phenolic photosensitizers containing...

Phenolic photosensitizers containing quinone diazide and acidic hal...

Mixed ester O-quinone diazide photosensitizers and process of prepa...

Novel mixed ester O-quinone photosensitizers

Novel mixed ester O-quinone photosensitizers