Chi-Hsiang FAN

Person

San Jose, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Method for determining an etch profile of a layer of a wafer for a...
- Patent number 11,568,123
- Issue date Jan 31, 2023
- ASML Netherlands B.V.
- Chi-Hsiang Fan
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method of determining a position of a feature
- Patent number 11,392,044
- Issue date Jul 19, 2022
- ASML Netherlands B.V.
- Ralph Timotheus Huijgen
- G01 - MEASURING TESTING
Information Patent Grant
Metrology method and apparatus, substrate, lithographic method and...
- Patent number 10,802,409
- Issue date Oct 13, 2020
- ASML Netherlands B.V.
- Chi-Hsiang Fan
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Automatic selection of metrology target measurement recipes
- Patent number 10,782,616
- Issue date Sep 22, 2020
- ASML Netherlands B.V.
- Daimian Wang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of determining a position of a feature
- Patent number 10,578,980
- Issue date Mar 3, 2020
- ASML Netherlands B.V.
- Ralph Timotheus Huijgen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
METHOD FOR DETERMINING AN ETCH PROFILE OF A LAYER OF A WAFER FOR A...
- Publication number 20230144584
- Publication date May 11, 2023
- ASML NETHERLANDS B.V.
- Chi-Hsiang Fan
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHOD FOR DETERMINING STACK CONFIGURATION OF SUBSTRATE
- Publication number 20210247701
- Publication date Aug 12, 2021
- ASMI NETHERLANDS B.V.
- Danying LI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR DETERMINING AN ETCH PROFILE OF A LAYER OF A WAFER FOR A...
- Publication number 20210150116
- Publication date May 20, 2021
- ASML NETHERLANDS B.V.
- Chi-Hsiang Fan
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHOD OF DETERMINING A POSITION OF A FEATURE
- Publication number 20200150547
- Publication date May 14, 2020
- ASML NETHERLANDS B.V.
- Ralph Timotheus HUIJGEN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF DETERMINING A POSITION OF A FEATURE
- Publication number 20190339211
- Publication date Nov 7, 2019
- Ralph Timotheus HUIJGEN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
AUTOMATIC SELECTION OF METROLOGY TARGET MEASUREMENT RECIPES
- Publication number 20190204750
- Publication date Jul 4, 2019
- ASML NETHERLANDS B.V.
- Daimian WANG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
APPARATUS AND METHOD FOR INFERRING PARAMETERS OF A MODEL OF A MEASU...
- Publication number 20180239851
- Publication date Aug 23, 2018
- ASML NETHERLANDS B.V.
- Alexander YPMA
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METROLOGY METHOD AND APPARATUS, SUBSTRATE, LITHOGRAPHIC METHOD AND...
- Publication number 20180238737
- Publication date Aug 23, 2018
- ASML NETHERLANDS B.V.
- Chi-Hsiang FAN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Chi-Hsiang FAN

Person

Patents Grantslast 30 patents

Method for determining an etch profile of a layer of a wafer for a...

Method of determining a position of a feature

Metrology method and apparatus, substrate, lithographic method and...

Automatic selection of metrology target measurement recipes

Method of determining a position of a feature

Patents Applicationslast 30 patents

METHOD FOR DETERMINING AN ETCH PROFILE OF A LAYER OF A WAFER FOR A...

METHOD FOR DETERMINING STACK CONFIGURATION OF SUBSTRATE

METHOD FOR DETERMINING AN ETCH PROFILE OF A LAYER OF A WAFER FOR A...

METHOD OF DETERMINING A POSITION OF A FEATURE

METHOD OF DETERMINING A POSITION OF A FEATURE

AUTOMATIC SELECTION OF METROLOGY TARGET MEASUREMENT RECIPES

APPARATUS AND METHOD FOR INFERRING PARAMETERS OF A MODEL OF A MEASU...

METROLOGY METHOD AND APPARATUS, SUBSTRATE, LITHOGRAPHIC METHOD AND...