Chia-Hsien Yao

Person

Hsinchu, TW

People

Patents Grantslast 30 patents

Information Patent Grant
Semiconductor device with backside spacer and methods of forming th...
- Patent number 12,266,606
- Issue date Apr 1, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Po-Yu Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Dielectric structures for semiconductor device structures
- Patent number 12,266,703
- Issue date Apr 1, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Shih-Che Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Source/drain contact structure
- Patent number 12,166,088
- Issue date Dec 10, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Ting Fang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Contact formation method and related structure
- Patent number 12,074,063
- Issue date Aug 27, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Shih-Che Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device with backside spacer and methods of forming th...
- Patent number 11,721,626
- Issue date Aug 8, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd
- Po-Yu Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Source/drain contact structure
- Patent number 11,387,331
- Issue date Jul 12, 2022
- Taiwan Semiconductor Manufacturing Co., Ltd
- Ting Fang
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
Source/Drain Contact Structure
- Publication number 20250107196
- Publication date Mar 27, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Ting Fang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Disposable Hard Mask for Interconnect Formation
- Publication number 20240387660
- Publication date Nov 21, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Shih-Che Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
OVERHANGING SOURCE/DRAIN CONTACT
- Publication number 20240379860
- Publication date Nov 14, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chung-Hao Cai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CONTACT FORMATION METHOD AND RELATED STRUCTURE
- Publication number 20240379432
- Publication date Nov 14, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Shih-Che LIN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR STRUCTURE WITH SELF-ALIGNED CONDUCTIVE FEATURES
- Publication number 20240038855
- Publication date Feb 1, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chung-Hao CAI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CONTACT STRUCTURE AND MANUFACTURING METHOD THEREOF
- Publication number 20240038593
- Publication date Feb 1, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chung-Hao Cai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE WITH BACKSIDE SPACER AND METHODS OF FORMING TH...
- Publication number 20230369223
- Publication date Nov 16, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Po-Yu Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CONTACT FORMATION METHOD AND RELATED STRUCTURE
- Publication number 20230065045
- Publication date Mar 2, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Shih-Che LIN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Disposable Hard Mask for Interconnect Formation
- Publication number 20220352328
- Publication date Nov 3, 2022
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Shih-Che Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor Structures With Densly Spaced Contact Features
- Publication number 20220344214
- Publication date Oct 27, 2022
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chung-Hao Cai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Source/Drain Contact Structure
- Publication number 20220336592
- Publication date Oct 20, 2022
- Taiwan Semiconductor Manufacturing Co., LTD
- Ting Fang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
OVERHANGING SOURCE/DRAIN CONTACT
- Publication number 20220223743
- Publication date Jul 14, 2022
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chung-Hao Cai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE WITH BACKSIDE SPACER AND METHODS OF FORMING TH...
- Publication number 20220199530
- Publication date Jun 23, 2022
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Po-Yu Huang
- H01 - BASIC ELECTRIC ELEMENTS

Chia-Hsien Yao

Person

Patents Grantslast 30 patents

Semiconductor device with backside spacer and methods of forming th...

Dielectric structures for semiconductor device structures

Source/drain contact structure

Contact formation method and related structure

Semiconductor device with backside spacer and methods of forming th...

Source/drain contact structure

Patents Applicationslast 30 patents

Source/Drain Contact Structure

Disposable Hard Mask for Interconnect Formation

OVERHANGING SOURCE/DRAIN CONTACT

CONTACT FORMATION METHOD AND RELATED STRUCTURE

SEMICONDUCTOR STRUCTURE WITH SELF-ALIGNED CONDUCTIVE FEATURES

CONTACT STRUCTURE AND MANUFACTURING METHOD THEREOF

SEMICONDUCTOR DEVICE WITH BACKSIDE SPACER AND METHODS OF FORMING TH...

CONTACT FORMATION METHOD AND RELATED STRUCTURE

Disposable Hard Mask for Interconnect Formation

Semiconductor Structures With Densly Spaced Contact Features

Source/Drain Contact Structure

OVERHANGING SOURCE/DRAIN CONTACT

SEMICONDUCTOR DEVICE WITH BACKSIDE SPACER AND METHODS OF FORMING TH...