Chia-Lin Hsueh

Person

Zhubei City, TW

People

Patents Grantslast 30 patents

Information Patent Grant
Sputter target magnet
- Patent number 12,020,917
- Issue date Jun 25, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Ming-Jie He
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
System for cleaning wafer in CMP process of semiconductor manufactu...
- Patent number 11,446,712
- Issue date Sep 20, 2022
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chia-Ying Tien
- B08 - CLEANING
Information Patent Grant
Sputter target magnet
- Patent number 11,322,338
- Issue date May 3, 2022
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Ming-Jie He
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
System for cleaning wafer in CMP process of semiconductor manufactu...
- Patent number 10,864,557
- Issue date Dec 15, 2020
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chia-Ying Tien
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and system for cleansing wafer in CMP process of semiconduct...
- Patent number 9,610,615
- Issue date Apr 4, 2017
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chia-Ying Tien
- B08 - CLEANING

Patents Applicationslast 30 patents

Information Patent Application
CHEMICAL MECHANICAL POLISHING APPARATUS AND METHOD
- Publication number 20230381918
- Publication date Nov 30, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chun-Hsi HUANG
- B24 - GRINDING POLISHING
Information Patent Application
SPUTTER TARGET MAGNET
- Publication number 20220223391
- Publication date Jul 14, 2022
- Taiwan Semiconductor Manufacturing Co., LTD
- Ming-Jie HE
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SYSTEM FOR CLEANING WAFER IN CMP PROCESS OF SEMICONDUCTOR MANUFACTU...
- Publication number 20210060624
- Publication date Mar 4, 2021
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chia-Ying TIEN
- B08 - CLEANING
Information Patent Application
CHEMICAL MECHANICAL POLISHING APPARATUS AND METHOD
- Publication number 20200130136
- Publication date Apr 30, 2020
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chun-Hsi HUANG
- B24 - GRINDING POLISHING
Information Patent Application
SPUTTER TARGET MAGNET
- Publication number 20190066988
- Publication date Feb 28, 2019
- Taiwan Semiconductor Manufacturing Co., LTD
- Ming-Jie HE
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SYSTEM FOR CLEANING WAFER IN CMP PROCESS OF SEMICONDUCTOR MANUFACTU...
- Publication number 20170189944
- Publication date Jul 6, 2017
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chia-Ying TIEN
- B08 - CLEANING
Information Patent Application
METHOD AND SYSTEM FOR CLEANSING WAFER IN CMP PROCESS OF SEMICONDUCT...
- Publication number 20160293402
- Publication date Oct 6, 2016
- Taiwan Semiconductor Manufacturing Co., LTD
- Chia-Ying TIEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Groove Design for Retaining Ring
- Publication number 20140224766
- Publication date Aug 14, 2014
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Yi-Min Chou
- H01 - BASIC ELECTRIC ELEMENTS

Chia-Lin Hsueh

Person

Patents Grantslast 30 patents

Sputter target magnet

System for cleaning wafer in CMP process of semiconductor manufactu...

Sputter target magnet

System for cleaning wafer in CMP process of semiconductor manufactu...

Method and system for cleansing wafer in CMP process of semiconduct...

Patents Applicationslast 30 patents

CHEMICAL MECHANICAL POLISHING APPARATUS AND METHOD

SPUTTER TARGET MAGNET

SYSTEM FOR CLEANING WAFER IN CMP PROCESS OF SEMICONDUCTOR MANUFACTU...

CHEMICAL MECHANICAL POLISHING APPARATUS AND METHOD

SPUTTER TARGET MAGNET

SYSTEM FOR CLEANING WAFER IN CMP PROCESS OF SEMICONDUCTOR MANUFACTU...

METHOD AND SYSTEM FOR CLEANSING WAFER IN CMP PROCESS OF SEMICONDUCT...

Groove Design for Retaining Ring