Chiang-Jen Peng

Person

Hsin chu, TW

People

Patents Grantslast 30 patents

Information Patent Grant
Plasma treatment method to reduce silicon erosion over HDI silicon...
- Patent number 7,018,928
- Issue date Mar 28, 2006
- Taiwan Semiconductor Manufacturing Co., Ltd
- Li Te Hsu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
In-situ photoresist removal by an attachable chamber with light source
- Patent number 6,929,713
- Issue date Aug 16, 2005
- Taiwan Semiconductor Manufacturing Company
- Chiang Jen Peng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Wafer transfer robot having wafer blades equipped with sensors
- Patent number 6,808,589
- Issue date Oct 26, 2004
- Taiwan Semiconductor Manufacturing Co. Ltd
- Yu-Sheng Su
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Photoexposure method for facilitating photoresist stripping
- Patent number 6,664,194
- Issue date Dec 16, 2003
- Taiwan Semiconductor Manufacturing Company
- Dian-Hau Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for monitoring contaminating particles in a chamber
- Patent number 6,660,528
- Issue date Dec 9, 2003
- Taiwan Semiconductor Manufacturing Co., Ltd
- Horng-Wen Chen
- G01 - MEASURING TESTING
Information Patent Grant
Method for testing for blind hole formed in wafer layer
- Patent number 6,642,150
- Issue date Nov 4, 2003
- Taiwan Semiconductor Manufacturing Company
- Chuan-Chieh Huang
- G01 - MEASURING TESTING
Information Patent Grant
Microelectronic fabrication method providing alignment mark and iso...
- Patent number 6,500,725
- Issue date Dec 31, 2002
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chien-Chuan Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
In-situ photoresist removal by an attachable chamber with light source
- Patent number 6,429,142
- Issue date Aug 6, 2002
- Taiwan Semiconductor Manufacturing Company
- Chiang Jen Peng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus with heat treatment for stripping photoresist...
- Patent number 6,251,794
- Issue date Jun 26, 2001
- Taiwan Semiconductor Manufacturing Company
- Chiang-Jen Peng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Process for etching a silicon nitride hardmask mask with zero etch...
- Patent number 6,103,596
- Issue date Aug 15, 2000
- Taiwan Semiconductor Manufacturing Company
- Chiang-Jen Peng
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
In-situ bake step in plasma ash process to prevent corrosion
- Patent number 5,840,203
- Issue date Nov 24, 1998
- Taiwan Semiconductor Manufacturing Company Ltd.
- Chiang Jen Peng
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
Plasma treatment method to reduce silicon erosion over HDI silicon...
- Publication number 20050054209
- Publication date Mar 10, 2005
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Li Te Hsu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Wafer transfer robot having wafer blades equipped with sensors
- Publication number 20030230384
- Publication date Dec 18, 2003
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Yu-Sheng Su
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
In-situ photoresist removal by an attachable chamber with light source
- Publication number 20020164878
- Publication date Nov 7, 2002
- TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY
- Chiang Jen Peng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Pre-heat step (or chamber) implemented in pr dry ash machines to ef...
- Publication number 20010019894
- Publication date Sep 6, 2001
- TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY
- Chiang-Jen Peng
- H01 - BASIC ELECTRIC ELEMENTS

Chiang-Jen Peng

Person

Patents Grantslast 30 patents

Plasma treatment method to reduce silicon erosion over HDI silicon...

In-situ photoresist removal by an attachable chamber with light source

Wafer transfer robot having wafer blades equipped with sensors

Photoexposure method for facilitating photoresist stripping

Method for monitoring contaminating particles in a chamber

Method for testing for blind hole formed in wafer layer

Microelectronic fabrication method providing alignment mark and iso...

In-situ photoresist removal by an attachable chamber with light source

Method and apparatus with heat treatment for stripping photoresist...

Process for etching a silicon nitride hardmask mask with zero etch...

In-situ bake step in plasma ash process to prevent corrosion

Patents Applicationslast 30 patents

Plasma treatment method to reduce silicon erosion over HDI silicon...

Wafer transfer robot having wafer blades equipped with sensors

In-situ photoresist removal by an attachable chamber with light source

Pre-heat step (or chamber) implemented in pr dry ash machines to ef...