Chie Kato

Follow

Person

Nirasaki-shi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Substrate processing method and substrate processing apparatus
- Patent number 8,383,517
- Issue date Feb 26, 2013
- Tokyo Electron Limited
- Eiichi Nishimura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing method and substrate processing apparatus
- Patent number 8,034,720
- Issue date Oct 11, 2011
- Tokyo Electron Limited
- Eiichi Nishimura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma etching method
- Patent number 7,811,939
- Issue date Oct 12, 2010
- Tokyo Electron Limited
- Masato Kushibiki
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20080182421
- Publication date Jul 31, 2008
- TOKYO ELECTRON LIMITED
- Eiichi NISHIMURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20080179292
- Publication date Jul 31, 2008
- TOKYO ELECTRON LIMITED
- Eiichi Nishimura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA ETCHING METHOD
- Publication number 20070224828
- Publication date Sep 27, 2007
- TOKYO ELECTRON LIMITED
- Masato KUSHIBIKI
- H01 - BASIC ELECTRIC ELEMENTS