Chieh-Yi Shen

Person

Taipei City, TW

People

Patents Grantslast 30 patents

Information Patent Grant
Selective deposition of metal barrier in damascene processes
- Patent number 12,068,194
- Issue date Aug 20, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chia-Pang Kuo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Wet etching chemistry and method of forming semiconductor device us...
- Patent number 12,046,476
- Issue date Jul 23, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Meng-Hsien Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Selective deposition of metal barrier in damascene processes and th...
- Patent number 11,837,500
- Issue date Dec 5, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chia-Pang Kuo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Selective deposition of metal barrier in damascene processes
- Patent number 11,398,406
- Issue date Jul 26, 2022
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chia-Pang Kuo
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
METHOD OF FORMING SEMICONDUCTOR DEVICE USING WET ETCHING CHEMISTRY
- Publication number 20240339327
- Publication date Oct 10, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Meng-Hsien Li
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Selective Deposition of Metal Barrier in Damascene Processes
- Publication number 20240006234
- Publication date Jan 4, 2024
- Taiwan Semiconductor Manufacturing Co, LTD.
- Chia-Pang Kuo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
WET ETCHING CHEMISTRY AND METHOD OF FORMING SEMICONDUCTOR DEVICE US...
- Publication number 20230307240
- Publication date Sep 28, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Meng-Hsien Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR MEMORY STRUCTURE AND METHOD FOR FORMING THE SAME
- Publication number 20230024339
- Publication date Jan 26, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chih-Hsuan Cheng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Selective Deposition of Metal Barrier in Damascene Processes
- Publication number 20220328347
- Publication date Oct 13, 2022
- Taiwan Semiconductor Manufacturing CO.,LTD.
- Chia-Pang Kuo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Selective Deposition of Metal Barrier in Damascene Processes
- Publication number 20200105592
- Publication date Apr 2, 2020
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chia-Pang Kuo
- H01 - BASIC ELECTRIC ELEMENTS

Chieh-Yi Shen

Person

Patents Grantslast 30 patents

Selective deposition of metal barrier in damascene processes

Wet etching chemistry and method of forming semiconductor device us...

Selective deposition of metal barrier in damascene processes and th...

Selective deposition of metal barrier in damascene processes

Patents Applicationslast 30 patents

METHOD OF FORMING SEMICONDUCTOR DEVICE USING WET ETCHING CHEMISTRY

Selective Deposition of Metal Barrier in Damascene Processes

WET ETCHING CHEMISTRY AND METHOD OF FORMING SEMICONDUCTOR DEVICE US...

SEMICONDUCTOR MEMORY STRUCTURE AND METHOD FOR FORMING THE SAME

Selective Deposition of Metal Barrier in Damascene Processes

Selective Deposition of Metal Barrier in Damascene Processes