Chien-Teh Kao

Person

Sunnyvale, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Film stress control for plasma enhanced chemical vapor deposition
- Patent number 11,854,771
- Issue date Dec 26, 2023
- Applied Materials, Inc.
- Chien-Teh Kao
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
ALD process and hardware with improved purge efficiency
- Patent number 11,664,216
- Issue date May 30, 2023
- Applied Materials, Inc.
- Chien-Teh Kao
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods and apparatus for ALD processes
- Patent number 11,306,393
- Issue date Apr 19, 2022
- Applied Materials, Inc.
- Jeffrey A. Kho
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Apparatus and method for providing uniform flow of gas
- Patent number RE48994
- Issue date Mar 29, 2022
- Applied Materials, Inc.
- Joseph Yudovsky
Information Patent Grant
Film stress control for plasma enhanced chemical vapor deposition
- Patent number 11,094,508
- Issue date Aug 17, 2021
- Applied Materials, Inc.
- Chien-Teh Kao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
ALD process and hardware with improved purge efficiency
- Patent number 10,964,533
- Issue date Mar 30, 2021
- Applied Materials, Inc.
- Chien-Teh Kao
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
High temperature process chamber lid
- Patent number 10,879,090
- Issue date Dec 29, 2020
- Applied Materials, Inc.
- Ilker Durukan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Remote plasma source cleaning nozzle for cleaning a gas distributio...
- Patent number 10,751,765
- Issue date Aug 25, 2020
- Applied Materials, Inc.
- Tae Kyung Won
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Gas flow guide design for uniform flow distribution and efficient p...
- Patent number 10,697,062
- Issue date Jun 30, 2020
- Applied Materials, Inc.
- Chien-Teh Kao
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Support assembly
- Patent number 10,593,539
- Issue date Mar 17, 2020
- Applied Materials, Inc.
- Chien-Teh Kao
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Dual-direction chemical delivery system for ALD/CVD chambers
- Patent number 10,400,335
- Issue date Sep 3, 2019
- Applied Materials, Inc.
- Zhenbin Ge
- B08 - CLEANING
Information Patent Grant
Apparatus and method for providing uniform flow of gas
- Patent number RE47440
- Issue date Jun 18, 2019
- Applied Materials, Inc.
- Joseph Yudovsky
Information Patent Grant
CVD thin film stress control method for display application
- Patent number 10,312,475
- Issue date Jun 4, 2019
- Applied Materials, Inc.
- Tae Kyung Won
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus for providing plasma to a process chamber
- Patent number 9,982,343
- Issue date May 29, 2018
- Applied Materials, Inc.
- Chien-Teh Kao
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Deposition methods for uniform and conformal hybrid titanium oxide...
- Patent number 9,881,787
- Issue date Jan 30, 2018
- Applied Materials, Inc.
- Chien-Teh Kao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High temperature process chamber lid
- Patent number 9,831,109
- Issue date Nov 28, 2017
- Applied Materials, Inc.
- Ilker Durukan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Dual-direction chemical delivery system for ALD/CVD chambers
- Patent number 9,765,432
- Issue date Sep 19, 2017
- Applied Materials, Inc.
- Zhenbin Ge
- B08 - CLEANING
Information Patent Grant
Methods and apparatus for in-situ cleaning of a process chamber
- Patent number 9,627,185
- Issue date Apr 18, 2017
- Applied Materials, Inc.
- Joel M. Huston
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
In-situ corrosion resistant substrate support coating
- Patent number 9,551,070
- Issue date Jan 24, 2017
- Applied Materials, Inc.
- Mei Chang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Dual-direction chemical delivery system for ALD/CVD chambers
- Patent number 9,353,440
- Issue date May 31, 2016
- Applied Materials, Inc.
- Zhenbin Ge
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Contact clean by remote plasma and repair of silicide surface
- Patent number 9,147,578
- Issue date Sep 29, 2015
- Applied Materials, Inc.
- Xinliang Lu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and method for providing uniform flow of gas
- Patent number 9,109,754
- Issue date Aug 18, 2015
- Applied Materials, Inc.
- Joseph Yudovsky
- F17 - STORING OF DISTRIBUTING GASES OR LIQUIDS
Information Patent Grant
Process chamber lid design with built-in plasma source for short li...
- Patent number 9,004,006
- Issue date Apr 14, 2015
- Applied Materials, Inc.
- Chien-Teh Kao
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for removing oxides
- Patent number 8,846,163
- Issue date Sep 30, 2014
- Applied Materials, Inc.
- Chien-Teh Kao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma treatment method for preventing defects in doped silicon oxi...
- Patent number 8,318,605
- Issue date Nov 27, 2012
- Applied Materials, Inc.
- Chien-Teh Kao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for trench and via profile modification
- Patent number 8,268,684
- Issue date Sep 18, 2012
- Applied Materials, Inc.
- Mei Chang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Selective etching of silicon nitride
- Patent number 8,252,696
- Issue date Aug 28, 2012
- Applied Materials, Inc.
- Xinliang Lu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Integration sequences with top surface profile modification
- Patent number 8,043,933
- Issue date Oct 25, 2011
- Applied Materials, Inc.
- Chien-Teh Kao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for trench and via profile modification
- Patent number 7,994,002
- Issue date Aug 9, 2011
- Applied Materials, Inc.
- Mei Chang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Thermal annealing method for preventing defects in doped silicon ox...
- Patent number 7,977,246
- Issue date Jul 12, 2011
- Applied Materials, Inc.
- Haichun Yang
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
FILM STRESS CONTROL FOR PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION
- Publication number 20240105427
- Publication date Mar 28, 2024
- Applied Materials, Inc.
- Chien-Teh KAO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
MULTI-ANTENNA UNIT FOR LARGE AREA INDUCTIVELY COUPLED PLASMA PROCES...
- Publication number 20230162948
- Publication date May 25, 2023
- Applied Materials, Inc.
- Shouqian SHAO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FILM STRESS CONTROL FOR PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION
- Publication number 20210280392
- Publication date Sep 9, 2021
- Applied Materials, Inc.
- Chien-Teh KAO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUPPORT ASSEMBLY
- Publication number 20210225640
- Publication date Jul 22, 2021
- Applied Materials, Inc.
- Chien-Teh Kao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ALD PROCESS AND HARDWARE WITH IMPROVED PURGE EFFICIENCY
- Publication number 20210202234
- Publication date Jul 1, 2021
- Applied Materials, Inc.
- Chien-Teh KAO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ALD PROCESS AND HARDWARE WITH IMPROVED PURGE EFFICIENCY
- Publication number 20200203147
- Publication date Jun 25, 2020
- Applied Materials, Inc.
- Chien-Teh KAO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
FILM STRESS CONTROL FOR PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION
- Publication number 20200194233
- Publication date Jun 18, 2020
- Applied Materials, Inc.
- Chien-Teh KAO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
REMOTE PLASMA SOURCE CLEANING NOZZLE FOR PLASMA ENHANCED CVD CHAMBERS
- Publication number 20200047222
- Publication date Feb 13, 2020
- Applied Materials, Inc.
- Tae Kyung WON
- B08 - CLEANING
Information Patent Application
METHODS AND APPARATUS FOR ALD PROCESSES
- Publication number 20200040455
- Publication date Feb 6, 2020
- Applied Materials, Inc.
- Jeffrey A. KHO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
GAS FLOW GUIDE DESIGN FOR UNIFORM FLOW DISTRIBUTION AND EFFICIENT P...
- Publication number 20200017971
- Publication date Jan 16, 2020
- Applied Materials, Inc.
- Chien-Teh KAO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SUPPORT ASSEMBLY
- Publication number 20200006054
- Publication date Jan 2, 2020
- Applied Materials, Inc.
- Chien-Teh KAO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CVD THIN FILM STRESS CONTROL METHOD FOR DISPLAY APPLICATION
- Publication number 20180331328
- Publication date Nov 15, 2018
- Applied Materials, Inc.
- Tae Kyung WON
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
High Temperature Process Chamber Lid
- Publication number 20180053667
- Publication date Feb 22, 2018
- Applied Materials, Inc.
- Ilker Durukan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Dual-Direction Chemical Delivery System For ALD/CVD Chambers
- Publication number 20170362710
- Publication date Dec 21, 2017
- Applied Materials, Inc.
- Zhenbin Ge
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
High Temperature Thermal ALD Silicon Nitride Films
- Publication number 20170053792
- Publication date Feb 23, 2017
- Applied Materials, Inc.
- Xinliang Lu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Deposition Methods For Uniform And Conformal Hybrid Titanium Oxide...
- Publication number 20160372324
- Publication date Dec 22, 2016
- Applied Materials, Inc.
- Chien-Teh Kao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Dual-Direction Chemical Delivery System For ALD/CVD Chambers
- Publication number 20160273108
- Publication date Sep 22, 2016
- Applied Materials, Inc.
- Zhenbin Ge
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
IN-SITU CORROSION RESISTANT SUBSTRATE SUPPORT COATING
- Publication number 20150345017
- Publication date Dec 3, 2015
- Mei Chang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Dual-Direction Chemical Delivery System for ALD/CVD Chambers
- Publication number 20150176126
- Publication date Jun 25, 2015
- Applied Materials, Inc.
- Zhenbin Ge
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHODS AND APPARATUS FOR IN-SITU CLEANING OF A PROCESS CHAMBER
- Publication number 20150155142
- Publication date Jun 4, 2015
- Applied Materials, Inc.
- JOEL M. HUSTON
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
High Temperature Process Chamber Lid
- Publication number 20140252015
- Publication date Sep 11, 2014
- Ilker Durukan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Apparatus And Methods For Symmetrical Gas Distribution With High Pu...
- Publication number 20140174362
- Publication date Jun 26, 2014
- Chien-Teh Kao
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
APPARATUS FOR PROVIDING PLASMA TO A PROCESS CHAMBER
- Publication number 20140165911
- Publication date Jun 19, 2014
- Applied Materials, Inc.
- CHIEN-TEH KAO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS FOR PROVIDING PLASMA TO A PROCESS CHAMBER
- Publication number 20140165912
- Publication date Jun 19, 2014
- Applied Materials, Inc.
- CHIEN-TEH KAO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
MODULAR CHEMICAL DELIVERY SYSTEM
- Publication number 20140137961
- Publication date May 22, 2014
- Applied Materials, Inc.
- CHIEN-TEH KAO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI CHAMBER PROCESSING SYSTEM
- Publication number 20140076234
- Publication date Mar 20, 2014
- Applied Materials, Inc.
- Chien-Teh KAO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Apparatus and Method for Providing Uniform Flow of Gas
- Publication number 20130098477
- Publication date Apr 25, 2013
- Joseph Yudovsky
- F17 - STORING OF DISTRIBUTING GASES OR LIQUIDS
Information Patent Application
SUPPORT ASSEMBLY
- Publication number 20120267346
- Publication date Oct 25, 2012
- Chien-Teh Kao
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD FOR REMOVING OXIDES
- Publication number 20120244704
- Publication date Sep 27, 2012
- CHIEN-TEH KAO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD AND APPARATUS FOR TRENCH AND VIA PROFILE MODIFICATION
- Publication number 20110294258
- Publication date Dec 1, 2011
- Applied Materials, Inc.
- Mei Chang
- H01 - BASIC ELECTRIC ELEMENTS

Chien-Teh Kao

Person

Patents Grantslast 30 patents

Film stress control for plasma enhanced chemical vapor deposition

ALD process and hardware with improved purge efficiency

Methods and apparatus for ALD processes

Apparatus and method for providing uniform flow of gas

Film stress control for plasma enhanced chemical vapor deposition

ALD process and hardware with improved purge efficiency

High temperature process chamber lid

Remote plasma source cleaning nozzle for cleaning a gas distributio...

Gas flow guide design for uniform flow distribution and efficient p...

Support assembly

Dual-direction chemical delivery system for ALD/CVD chambers

Apparatus and method for providing uniform flow of gas

CVD thin film stress control method for display application

Apparatus for providing plasma to a process chamber

Deposition methods for uniform and conformal hybrid titanium oxide...

High temperature process chamber lid

Dual-direction chemical delivery system for ALD/CVD chambers

Methods and apparatus for in-situ cleaning of a process chamber

In-situ corrosion resistant substrate support coating

Dual-direction chemical delivery system for ALD/CVD chambers

Contact clean by remote plasma and repair of silicide surface

Apparatus and method for providing uniform flow of gas

Process chamber lid design with built-in plasma source for short li...

Method for removing oxides

Plasma treatment method for preventing defects in doped silicon oxi...

Method and apparatus for trench and via profile modification

Selective etching of silicon nitride

Integration sequences with top surface profile modification

Method and apparatus for trench and via profile modification

Thermal annealing method for preventing defects in doped silicon ox...

Patents Applicationslast 30 patents

FILM STRESS CONTROL FOR PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION

MULTI-ANTENNA UNIT FOR LARGE AREA INDUCTIVELY COUPLED PLASMA PROCES...

FILM STRESS CONTROL FOR PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION

SUPPORT ASSEMBLY

ALD PROCESS AND HARDWARE WITH IMPROVED PURGE EFFICIENCY

ALD PROCESS AND HARDWARE WITH IMPROVED PURGE EFFICIENCY

FILM STRESS CONTROL FOR PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION

REMOTE PLASMA SOURCE CLEANING NOZZLE FOR PLASMA ENHANCED CVD CHAMBERS

METHODS AND APPARATUS FOR ALD PROCESSES

GAS FLOW GUIDE DESIGN FOR UNIFORM FLOW DISTRIBUTION AND EFFICIENT P...

SUPPORT ASSEMBLY

CVD THIN FILM STRESS CONTROL METHOD FOR DISPLAY APPLICATION

High Temperature Process Chamber Lid

Dual-Direction Chemical Delivery System For ALD/CVD Chambers

High Temperature Thermal ALD Silicon Nitride Films

Deposition Methods For Uniform And Conformal Hybrid Titanium Oxide...

Dual-Direction Chemical Delivery System For ALD/CVD Chambers

IN-SITU CORROSION RESISTANT SUBSTRATE SUPPORT COATING

Dual-Direction Chemical Delivery System for ALD/CVD Chambers

METHODS AND APPARATUS FOR IN-SITU CLEANING OF A PROCESS CHAMBER

High Temperature Process Chamber Lid

Apparatus And Methods For Symmetrical Gas Distribution With High Pu...

APPARATUS FOR PROVIDING PLASMA TO A PROCESS CHAMBER

APPARATUS FOR PROVIDING PLASMA TO A PROCESS CHAMBER

MODULAR CHEMICAL DELIVERY SYSTEM

MULTI CHAMBER PROCESSING SYSTEM

Apparatus and Method for Providing Uniform Flow of Gas

SUPPORT ASSEMBLY

METHOD FOR REMOVING OXIDES

METHOD AND APPARATUS FOR TRENCH AND VIA PROFILE MODIFICATION