Chih Chung

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San Jose, CA, US

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Patents Grantslast 30 patents

Information Patent Grant
Temperature-based assymetry correction during CMP and nozzle for me...
- Patent number 11,697,187
- Issue date Jul 11, 2023
- Applied Materials, Inc.
- Haosheng Wu
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
TEMPERATURE-BASED IN-SITU EDGE ASSYMETRY CORRECTION DURING CMP
- Publication number 20200331114
- Publication date Oct 22, 2020
- Applied Materials, Inc.
- Haosheng Wu
- B24 - GRINDING POLISHING
Information Patent Application
TEMPERATURE-BASED ASSYMETRY CORRECTION DURING CMP AND NOZZLE FOR ME...
- Publication number 20200331117
- Publication date Oct 22, 2020
- Applied Materials, Inc.
- Haosheng Wu
- H01 - BASIC ELECTRIC ELEMENTS