Chih-Hsun HSU

Person

Campbell, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Substrate processing system including dual ion filter for downstrea...
- Patent number 12,347,650
- Issue date Jul 1, 2025
- Lam Research Corporation
- Andrew Stratton Bravo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Gas diffuser
- Patent number D1052548
- Issue date Nov 26, 2024
- Applied Materials, Inc.
- Devi Raghavee Veerappan
- D13 - Equipment for production, distribution, or transformation of energy
Information Patent Grant
Substrate processing system including dual ion filter for downstrea...
- Patent number 11,967,486
- Issue date Apr 23, 2024
- Lam Research Corporation
- Andrew Stratton Bravo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electrostatic chuck with variable pixelated magnetic field
- Patent number 10,790,180
- Issue date Sep 29, 2020
- Applied Materials, Inc.
- Chih-Hsun Hsu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electrostatic chuck with variable pixelated magnetic field
- Patent number 10,460,968
- Issue date Oct 29, 2019
- Applied Materials, Inc.
- Chih-Hsun Hsu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Residue free oxide etch
- Patent number 9,595,452
- Issue date Mar 14, 2017
- Lam Research Corporation
- Chih-Hsun Hsu
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
Selective metal Capping with Metal Halide enhancement
- Publication number 20250157824
- Publication date May 15, 2025
- Applied Materials, Inc.
- Shumao ZHANG
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ONE CHAMBER MULTI-STATION SELECTIVE METAL REMOVAL
- Publication number 20250079199
- Publication date Mar 6, 2025
- Applied Materials, Inc.
- Shiyu YUE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF FORMING A MEOL CONTACT STRUCTURE
- Publication number 20240379768
- Publication date Nov 14, 2024
- Applied Materials, Inc.
- Shumao ZHANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING SYSTEM INCLUDING DUAL ION FILTER FOR DOWNSTREA...
- Publication number 20240266147
- Publication date Aug 8, 2024
- LAM RESEARCH CORPORATION
- Andrew Stratton BRAVO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROCESS CHAMBER WITH PRESSURE CHARGING AND PULSING CAPABILITY
- Publication number 20240153790
- Publication date May 9, 2024
- Applied Materials, Inc.
- Borui Xia
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
NITROGEN PLASMA TREATMENT FOR BOTTOM-UP GROWTH
- Publication number 20240014072
- Publication date Jan 11, 2024
- Applied Materials, Inc.
- Tsung-Han YANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TREATMENT OF TUNGSTEN SURFACE FOR TUNGSTEN GAP-FILL
- Publication number 20230420295
- Publication date Dec 28, 2023
- Applied Materials, Inc.
- Tsung-Han YANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF IN-SITU SELECTIVE METAL REMOVAL VIA GRADIENT OXIDATION FO...
- Publication number 20230343644
- Publication date Oct 26, 2023
- Applied Materials, Inc.
- Chih-Hsun HSU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
GRADIENT OXIDATION AND ETCH OF PVD MOLYBDENUM FOR BOTTOM UP GAP FILL
- Publication number 20230343645
- Publication date Oct 26, 2023
- Applied Materials, Inc.
- Meng-Shan WU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
GRADIENT OXIDATION AND ETCH FOR PVD METAL AS BOTTOM LINER IN BOTTOM...
- Publication number 20230343643
- Publication date Oct 26, 2023
- Applied Materials, Inc.
- Chih-Hsun HSU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PULSING REMOTE PLASMA FOR ION DAMAGE REDUCTION AND ETCH UNIFORMITY...
- Publication number 20230223237
- Publication date Jul 13, 2023
- LAM RESEARCH CORPORATION
- Wei Yi LUO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS FOR SEAMLESS GAP FILLING USING GRADIENT OXIDATION
- Publication number 20230113514
- Publication date Apr 13, 2023
- Applied Materials, Inc.
- Shih Chung Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING SYSTEM INCLUDING DUAL ION FILTER FOR DOWNSTREA...
- Publication number 20220076924
- Publication date Mar 10, 2022
- LAM RESEARCH CORPORATION
- Andrew Stratton BRAVO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTROSTATIC CHUCK WITH VARIABLE PIXELATED MAGNETIC FIELD
- Publication number 20200013661
- Publication date Jan 9, 2020
- Applied Materials, Inc.
- Chih-Hsun Hsu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RESIDUE FREE OXIDE ETCH
- Publication number 20160351418
- Publication date Dec 1, 2016
- LAM RESEARCH CORPORATION
- Chih-Hsun HSU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTROSTATIC CHUCK WITH MAGNETIC CATHODE LINER FOR CRITICAL DIMENS...
- Publication number 20150221481
- Publication date Aug 6, 2015
- Michael D. Willwerth
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTROSTATIC CHUCK WITH VARIABLE PIXELATED MAGNETIC FIELD
- Publication number 20150155193
- Publication date Jun 4, 2015
- Chih-Hsun Hsu
- H01 - BASIC ELECTRIC ELEMENTS

Chih-Hsun HSU

Person

Patents Grantslast 30 patents

Substrate processing system including dual ion filter for downstrea...

Gas diffuser

Substrate processing system including dual ion filter for downstrea...

Electrostatic chuck with variable pixelated magnetic field

Electrostatic chuck with variable pixelated magnetic field

Residue free oxide etch

Patents Applicationslast 30 patents

Selective metal Capping with Metal Halide enhancement

ONE CHAMBER MULTI-STATION SELECTIVE METAL REMOVAL

METHOD OF FORMING A MEOL CONTACT STRUCTURE

SUBSTRATE PROCESSING SYSTEM INCLUDING DUAL ION FILTER FOR DOWNSTREA...

PROCESS CHAMBER WITH PRESSURE CHARGING AND PULSING CAPABILITY

NITROGEN PLASMA TREATMENT FOR BOTTOM-UP GROWTH

TREATMENT OF TUNGSTEN SURFACE FOR TUNGSTEN GAP-FILL

METHOD OF IN-SITU SELECTIVE METAL REMOVAL VIA GRADIENT OXIDATION FO...

GRADIENT OXIDATION AND ETCH OF PVD MOLYBDENUM FOR BOTTOM UP GAP FILL

GRADIENT OXIDATION AND ETCH FOR PVD METAL AS BOTTOM LINER IN BOTTOM...

PULSING REMOTE PLASMA FOR ION DAMAGE REDUCTION AND ETCH UNIFORMITY...

METHODS FOR SEAMLESS GAP FILLING USING GRADIENT OXIDATION

SUBSTRATE PROCESSING SYSTEM INCLUDING DUAL ION FILTER FOR DOWNSTREA...

ELECTROSTATIC CHUCK WITH VARIABLE PIXELATED MAGNETIC FIELD

RESIDUE FREE OXIDE ETCH

ELECTROSTATIC CHUCK WITH MAGNETIC CATHODE LINER FOR CRITICAL DIMENS...

ELECTROSTATIC CHUCK WITH VARIABLE PIXELATED MAGNETIC FIELD