Chin Teong LIM

Person

Clifton Park, NY, US

People

Patents Grantslast 30 patents

Information Patent Grant
Method for selective re-routing of selected areas in a target layer...
- Patent number 10,002,827
- Issue date Jun 19, 2018
- GLOBALFOUNDRIES Inc.
- Guoxiang Ning
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Hard mask etch and dielectric etch aware overlap for via and metal...
- Patent number 9,817,927
- Issue date Nov 14, 2017
- GLOBALFOUNDRIES Inc.
- Guo Xiang Ning
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method wherein test cells and dummy cells are included into a layou...
- Patent number 9,817,940
- Issue date Nov 14, 2017
- GLOBALFOUNDRIES Inc.
- Guido Ueberreiter
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method wherein test cells and dummy cells are included into a layou...
- Patent number 9,672,312
- Issue date Jun 6, 2017
- GLOBALFOUNDRIES Inc.
- Guido Ueberreiter
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method for selective re-routing of selected areas in a target layer...
- Patent number 9,672,313
- Issue date Jun 6, 2017
- GLOBALFOUNDRIES Inc.
- Guoxiang Ning
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Multiple threshold convergent OPC model
- Patent number 9,645,486
- Issue date May 9, 2017
- GLOBALFOUNDRIES Inc.
- Chin Teong Lim
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Alternating space decomposition in circuit structure fabrication
- Patent number 9,606,432
- Issue date Mar 28, 2017
- GLOBALFOUNDRIES, INC.
- Guoxiang Ning
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Reticle, system comprising a plurality of reticles and method for t...
- Patent number 9,535,319
- Issue date Jan 3, 2017
- GLOBALFOUNDRIES Inc.
- Guido Ueberreiter
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pattern classification based proximity corrections for reticle fabr...
- Patent number 9,500,945
- Issue date Nov 22, 2016
- GLOBALFOUNDRIES Singapore Pte. Ltd.
- Guoxiang Ning
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mask error compensation by optical modeling calibration
- Patent number 9,384,318
- Issue date Jul 5, 2016
- GLOBALFOUNDRIES Inc.
- Guoxiang Ning
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Achieving a critical dimension target based on resist characteristics
- Patent number 9,329,471
- Issue date May 3, 2016
- GLOBALFOUNDRIES Inc.
- Guoxiang Ning
- G06 - COMPUTING CALCULATING COUNTING

Patents Applicationslast 30 patents

Information Patent Application
METHOD WHEREIN TEST CELLS AND DUMMY CELLS ARE INCLUDED INTO A LAYOU...
- Publication number 20170235866
- Publication date Aug 17, 2017
- GLOBALFOUNDRIES INC.
- Guido Ueberreiter
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHOD FOR SELECTIVE RE-ROUTING OF SELECTED AREAS IN A TARGET LAYER...
- Publication number 20170186687
- Publication date Jun 29, 2017
- GLOBALFOUNDRIES INC.
- Guoxiang NING
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
HARD MASK ETCH AND DIELECTRIC ETCH AWARE OVERLAP FOR VIA AND METAL...
- Publication number 20170061044
- Publication date Mar 2, 2017
- GLOBALFOUNDRIES INC.
- Guo Xiang NING
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
PATTERN CLASSIFICATION BASED PROXIMITY CORRECTIONS FOR RETICLE FABR...
- Publication number 20160363853
- Publication date Dec 15, 2016
- Guoxiang NING
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHOD FOR SELECTIVE RE-ROUTING OF SELECTED AREAS IN A TARGET LAYER...
- Publication number 20160328511
- Publication date Nov 10, 2016
- GLOBALFOUNDRIES INC.
- Guoxiang NING
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHOD WHEREIN TEST CELLS AND DUMMY CELLS ARE INCLUDED INTO A LAYOU...
- Publication number 20160328510
- Publication date Nov 10, 2016
- GLOBALFOUNDRIES INC.
- Guido Ueberreiter
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
RETICLE, SYSTEM COMPRISING A PLURALITY OF RETICLES AND METHOD FOR T...
- Publication number 20160291457
- Publication date Oct 6, 2016
- GLOBALFOUNDRIES INC.
- Guido Ueberreiter
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTIPLE THRESHOLD CONVERGENT OPC MODEL
- Publication number 20160161840
- Publication date Jun 9, 2016
- GLOBALFOUNDRIES INC.
- Chin Teong LIM
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ACHIEVING A CRITICAL DIMENSION TARGET BASED ON RESIST CHARACTERISTICS
- Publication number 20160125121
- Publication date May 5, 2016
- Guoxiang NING
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
ALTERNATING SPACE DECOMPOSITION IN CIRCUIT STRUCTURE FABRICATION
- Publication number 20160124308
- Publication date May 5, 2016
- GLOBALFOUNDRIES, Inc.
- Guoxiang NING
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MASK ERROR COMPENSATION BY OPTICAL MODELING CALIBRATION
- Publication number 20150310157
- Publication date Oct 29, 2015
- Guoxiang NING
- G06 - COMPUTING CALCULATING COUNTING

Chin Teong LIM

Person

Patents Grantslast 30 patents

Method for selective re-routing of selected areas in a target layer...

Hard mask etch and dielectric etch aware overlap for via and metal...

Method wherein test cells and dummy cells are included into a layou...

Method wherein test cells and dummy cells are included into a layou...

Method for selective re-routing of selected areas in a target layer...

Multiple threshold convergent OPC model

Alternating space decomposition in circuit structure fabrication

Reticle, system comprising a plurality of reticles and method for t...

Pattern classification based proximity corrections for reticle fabr...

Mask error compensation by optical modeling calibration

Achieving a critical dimension target based on resist characteristics

Patents Applicationslast 30 patents

METHOD WHEREIN TEST CELLS AND DUMMY CELLS ARE INCLUDED INTO A LAYOU...

METHOD FOR SELECTIVE RE-ROUTING OF SELECTED AREAS IN A TARGET LAYER...

HARD MASK ETCH AND DIELECTRIC ETCH AWARE OVERLAP FOR VIA AND METAL...

PATTERN CLASSIFICATION BASED PROXIMITY CORRECTIONS FOR RETICLE FABR...

METHOD FOR SELECTIVE RE-ROUTING OF SELECTED AREAS IN A TARGET LAYER...

METHOD WHEREIN TEST CELLS AND DUMMY CELLS ARE INCLUDED INTO A LAYOU...

RETICLE, SYSTEM COMPRISING A PLURALITY OF RETICLES AND METHOD FOR T...

MULTIPLE THRESHOLD CONVERGENT OPC MODEL

ACHIEVING A CRITICAL DIMENSION TARGET BASED ON RESIST CHARACTERISTICS

ALTERNATING SPACE DECOMPOSITION IN CIRCUIT STRUCTURE FABRICATION

MASK ERROR COMPENSATION BY OPTICAL MODELING CALIBRATION