Ching-Ling Meng

Person

Sunnyvale, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Normal-incidence in-situ process monitor sensor
- Patent number 12,261,030
- Issue date Mar 25, 2025
- Tokyo Electron Limited
- Ching Ling Meng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Normal-incidence in-situ process monitor sensor
- Patent number 11,961,721
- Issue date Apr 16, 2024
- Tokyo Electron Limited
- Ching Ling Meng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and method for monitoring and measuring properties of pol...
- Patent number 11,385,154
- Issue date Jul 12, 2022
- Tokyo Electron Limited
- Ivan Maleev
- G01 - MEASURING TESTING
Information Patent Grant
Normal-incident in-situ process monitor sensor
- Patent number 10,978,278
- Issue date Apr 13, 2021
- Tokyo Electron Limited
- Ching Ling Meng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Optical sensor for phase determination
- Patent number 10,837,902
- Issue date Nov 17, 2020
- Tokyo Electron Limited
- Ivan Maleev
- G01 - MEASURING TESTING
Information Patent Grant
Advanced optical sensor and method for detecting an optical event i...
- Patent number 10,692,705
- Issue date Jun 23, 2020
- Tokyo Electron Limited
- Mihail Mihaylov
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Spatially resolved optical emission spectroscopy (OES) in plasma pr...
- Patent number 10,473,525
- Issue date Nov 12, 2019
- Tokyo Electron Limited
- Ching-Ling Meng
- G01 - MEASURING TESTING
Information Patent Grant
Dark field wafer nano-defect inspection system with a singular beam
- Patent number 10,345,246
- Issue date Jul 9, 2019
- Tokyo Electron Limited
- Xinkang Tian
- G01 - MEASURING TESTING
Information Patent Grant
Spatially resolved optical emission spectroscopy (OES) in plasma pr...
- Patent number 9,970,818
- Issue date May 15, 2018
- Tokyo Electron Limited
- Junwei Bao
- G01 - MEASURING TESTING
Information Patent Grant
Differential acoustic time of flight measurement of temperature of...
- Patent number 9,846,088
- Issue date Dec 19, 2017
- Tokyo Electron Limited
- Jun Pei
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System for in-situ film stack measurement during etching and etch c...
- Patent number 9,059,038
- Issue date Jun 16, 2015
- Tokyo Electron Limited
- Shifang Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and systems for monitoring a parameter of a measurement dev...
- Patent number 8,831,767
- Issue date Sep 9, 2014
- KLA-Tencor Technologies Corp.
- Kurt Lehman
- B24 - GRINDING POLISHING
Information Patent Grant
Methods and systems for monitoring a parameter of a measurement dev...
- Patent number 8,010,222
- Issue date Aug 30, 2011
- KLA-Tencor Technologies Corp.
- Kurt Lehman
- B24 - GRINDING POLISHING
Information Patent Grant
Method and system for lamp temperature control in optical metrology
- Patent number 7,789,541
- Issue date Sep 7, 2010
- Tokyo Electron Limited
- Ching-Ling Meng
- F21 - LIGHTING
Information Patent Grant
Automated process control using an optical metrology system optimiz...
- Patent number 7,761,178
- Issue date Jul 20, 2010
- Tokyo Electron Limited
- Xinkang Tian
- G01 - MEASURING TESTING
Information Patent Grant
Optical metrology system optimized with design goals
- Patent number 7,761,250
- Issue date Jul 20, 2010
- Tokyo Electron Limited
- Xinkang Tian
- G01 - MEASURING TESTING
Information Patent Grant
Designing an optical metrology system optimized with signal criteria
- Patent number 7,742,889
- Issue date Jun 22, 2010
- Tokyo Electron Limited
- Xinkang Tian
- G01 - MEASURING TESTING
Information Patent Grant
Apparatus for designing an optical metrology system optimized with...
- Patent number 7,734,437
- Issue date Jun 8, 2010
- Tokyo Electron Limited
- Xinkang Tian
- G01 - MEASURING TESTING
Information Patent Grant
Optical metrology system optimized with a plurality of design goals
- Patent number 7,595,869
- Issue date Sep 29, 2009
- Tokyo Electron Limited
- Xinkang Tian
- G01 - MEASURING TESTING
Information Patent Grant
Process control using an optical metrology system optimized with si...
- Patent number 7,589,845
- Issue date Sep 15, 2009
- Tokyo Electron Limited
- Xinkang Tian
- G01 - MEASURING TESTING
Information Patent Grant
Gas purge system and methods
- Patent number 7,420,681
- Issue date Sep 2, 2008
- KLA-Tencor Technologies Corporation
- Ning-Yi Wang
- G01 - MEASURING TESTING
Information Patent Grant
Methods and systems for monitoring a parameter of a measurement dev...
- Patent number 7,332,438
- Issue date Feb 19, 2008
- KLA-Tencor Technologies Corp.
- Kurt Lehman
- B24 - GRINDING POLISHING
Information Patent Grant
Optical device latching mechanism
- Patent number 7,281,862
- Issue date Oct 16, 2007
- Intel Corporation
- Joshua T. Oen
- G02 - OPTICS
Information Patent Grant
Methods and systems for determining a characteristic of polishing w...
- Patent number 7,175,503
- Issue date Feb 13, 2007
- KLA-Tencor Technologies Corp.
- Kurt Lehman
- B24 - GRINDING POLISHING
Information Patent Grant
Methods and systems for detecting a presence of blobs on a specimen...
- Patent number 7,052,369
- Issue date May 30, 2006
- KLA-Tencor Technologies Corp.
- Kurt Lehman
- B24 - GRINDING POLISHING
Information Patent Grant
Methods and systems for monitoring a parameter of a measurement dev...
- Patent number 7,030,018
- Issue date Apr 18, 2006
- KLA-Tencor Technologies Corp.
- Kurt Lehman
- B24 - GRINDING POLISHING
Information Patent Grant
Methods and systems for generating a two-dimensional map of a chara...
- Patent number 6,935,922
- Issue date Aug 30, 2005
- KLA-Tencor Technologies Corp.
- Kurt Lehman
- B24 - GRINDING POLISHING
Information Patent Grant
Systems and methods for characterizing a polishing process
- Patent number 6,884,146
- Issue date Apr 26, 2005
- KLA-Tencor Technologies Corp.
- Kurt Lehman
- B24 - GRINDING POLISHING
Information Patent Grant
Windows configurable to be coupled to a process tool or to be dispo...
- Patent number 6,866,559
- Issue date Mar 15, 2005
- KLA Tencor Technologies
- Kurt Lehman
- B24 - GRINDING POLISHING
Information Patent Grant
Chemical mechanical planarization system
- Patent number 6,679,755
- Issue date Jan 20, 2004
- Applied Materials Inc.
- Phillip R. Sommer
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR

Patents Applicationslast 30 patents

Information Patent Application
OPTICAL METROLOGY
- Publication number 20250164410
- Publication date May 22, 2025
- TOKYO ELECTRON LIMITED
- Holger Tuitje
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
OPTICAL SENSOR FOR FILM THICKNESS MEASUREMENT
- Publication number 20240418501
- Publication date Dec 19, 2024
- TOKYO ELECTRON LIMITED
- Ivan MALEEV
- G01 - MEASURING TESTING
Information Patent Application
LASER SOURCE WITH MULTIPLE SEEDS FOR LIDAR
- Publication number 20240230898
- Publication date Jul 11, 2024
- Innovusion, Inc.
- Yufeng Li
- G01 - MEASURING TESTING
Information Patent Application
SYSTEMS AND METHODS FOR POLYGON MIRROR ANGLES ADJUSTMENT
- Publication number 20240168206
- Publication date May 23, 2024
- Innovusion, Inc.
- Ching-Ling Meng
- G02 - OPTICS
Information Patent Application
LASER SOURCE WITH MULTIPLE SEEDS FOR LIDAR
- Publication number 20240134044
- Publication date Apr 25, 2024
- Innovusion, Inc.
- Yufeng Li
- G01 - MEASURING TESTING
Information Patent Application
STRAY LIGHT FILTER STRUCTURES FOR LIDAR DETECTOR ARRAY
- Publication number 20240103138
- Publication date Mar 28, 2024
- Innovusion, Inc.
- Yufeng Li
- G01 - MEASURING TESTING
Information Patent Application
COMPACT LIDAR SYSTEMS FOR DETECTING OBJECTS IN BLIND-SPOT AREAS
- Publication number 20230138819
- Publication date May 4, 2023
- Innovusion, Inc.
- Yufeng Li
- G01 - MEASURING TESTING
Information Patent Application
COMPACT LIDAR SYSTEMS FOR DETECTING OBJECTS IN BLIND-SPOT AREAS
- Publication number 20230136272
- Publication date May 4, 2023
- Innovusion, Inc.
- Yufeng Li
- G01 - MEASURING TESTING
Information Patent Application
OPTICAL SENSORS FOR MEASURING PROPERTIES OF CONSUMABLE PARTS IN A S...
- Publication number 20230057763
- Publication date Feb 23, 2023
- TOKYO ELECTRON LIMITED
- Ivan MALEEV
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
OPTICAL SENSORS FOR MEASURING PROPERTIES OF CONSUMABLE PARTS IN A S...
- Publication number 20230055839
- Publication date Feb 23, 2023
- TOKYO ELECTRON LIMITED
- Ivan MALEEV
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Optical Sensor for Inspecting Pattern Collapse Defects
- Publication number 20220139743
- Publication date May 5, 2022
- TOKYO ELECTRON LIMITED
- Ivan MALEEV
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS AND METHOD FOR MONITORING AND MEASURING PROPERTIES OF POL...
- Publication number 20220099545
- Publication date Mar 31, 2022
- TOKYO ELECTRON LIMITED
- Ivan MALEEV
- G01 - MEASURING TESTING
Information Patent Application
NORMAL-INCIDENCE IN-SITU PROCESS MONITOR SENSOR
- Publication number 20210193444
- Publication date Jun 24, 2021
- TOKYO ELECTRON LIMITED
- Ching Ling Meng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
NORMAL-INCIDENT IN-SITU PROCESS MONITOR SENSOR
- Publication number 20200043710
- Publication date Feb 6, 2020
- TOKYO ELECTRON LIMITED
- Ching Ling Meng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
OPTICAL SENSOR FOR PHASE DETERMINATION
- Publication number 20190056320
- Publication date Feb 21, 2019
- TOKYO ELECTRON LIMITED
- Ivan MALEEV
- G01 - MEASURING TESTING
Information Patent Application
ADVANCED OPTICAL SENSOR, SYSTEM, AND METHODOLOGIES FOR ETCH PROCESS...
- Publication number 20180286643
- Publication date Oct 4, 2018
- TOKYO ELECTRON LIMITED
- Holger TUITJE
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
DARK FIELD WAFER NANO-DEFECT INSPECTION SYSTEM WITH A SINGULAR BEAM
- Publication number 20170350826
- Publication date Dec 7, 2017
- TOKYO ELECTRON LIMITED
- Xinkang TIAN
- G01 - MEASURING TESTING
Information Patent Application
SPATIALLY RESOLVED OPTICAL EMISSION SPECTROSCOPY (OES) IN PLASMA PR...
- Publication number 20170314991
- Publication date Nov 2, 2017
- TOKYO ELECTRON LIMITED
- Ching-Ling MENG
- G01 - MEASURING TESTING
Information Patent Application
ADVANCED OPTICAL SENSOR AND METHOD FOR PLASMA CHAMBER
- Publication number 20170140905
- Publication date May 18, 2017
- TOKYO ELECTRON LIMITED
- Mihail Mihaylov
- G01 - MEASURING TESTING
Information Patent Application
SPATIALLY RESOLVED OPTICAL EMISSION SPECTROSCOPY (OES) IN PLASMA PR...
- Publication number 20150124250
- Publication date May 7, 2015
- TOKYO ELECTRON LIMITED
- Junwei BAO
- G01 - MEASURING TESTING
Information Patent Application
DIFFERENTIAL ACOUSTIC TIME OF FLIGHT MEASUREMENT OF TEMPERATURE OF...
- Publication number 20150078416
- Publication date Mar 19, 2015
- TOKYO ELECTRON LIMITED
- Jun PEI
- G01 - MEASURING TESTING
Information Patent Application
SYSTEM FOR IN-SITU FILM STACK MEASUREMENT DURING ETCHING AND ETCH C...
- Publication number 20140024143
- Publication date Jan 23, 2014
- TOKYO ELECTRON LIMITED
- Shifang LI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS AND SYSTEMS FOR MONITORING A PARAMETER OF A MEASUREMENT DEV...
- Publication number 20110313558
- Publication date Dec 22, 2011
- KLA-Tencor Technologies Corporation
- Kurt Lehman
- B24 - GRINDING POLISHING
Information Patent Application
AUTOMATED PROCESS CONTROL USING AN OPTICAL METROLOGY SYSTEM OPTIMIZ...
- Publication number 20090319075
- Publication date Dec 24, 2009
- TOKYO ELECTRON LIMITED
- XINKANG TIAN
- G01 - MEASURING TESTING
Information Patent Application
OPTICAL METROLOGY SYSTEM OPTIMIZED WITH DESIGN GOALS
- Publication number 20090319214
- Publication date Dec 24, 2009
- TOKYO ELECTRON LIMITED
- XINKANG TIAN
- G01 - MEASURING TESTING
Information Patent Application
DESIGNING AN OPTICAL METROLOGY SYSTEM OPTIMIZED WITH SIGNAL CRITERIA
- Publication number 20090248339
- Publication date Oct 1, 2009
- TOKYO ELECTRON LIMITED
- XINKANG TIAN
- G01 - MEASURING TESTING
Information Patent Application
METHOD AND SYSTEM FOR LAMP TEMPERATURE CONTROL IN OPTICAL METROLOGY
- Publication number 20090244910
- Publication date Oct 1, 2009
- TOKYO ELECTRON LIMITED
- Ching-Ling MENG
- F21 - LIGHTING
Information Patent Application
APPARATUS FOR DESIGNING AN OPTICAL METROLOGY SYSTEM OPTIMIZED WITH...
- Publication number 20090248340
- Publication date Oct 1, 2009
- TOKYO ELECTRON LIMITED
- XINKANG TIAN
- G01 - MEASURING TESTING
Information Patent Application
PROCESS CONTROL USING AN OPTICAL METROLOGY SYSTEM OPTIMIZED WITH SI...
- Publication number 20090248341
- Publication date Oct 1, 2009
- TOKYO ELECTRON LIMITED
- XINKANG TIAN
- G01 - MEASURING TESTING
Information Patent Application
APPARATUS FOR DESIGNING AN OPTICAL METROLOGY SYSTEM OPTIMIZED FOR O...
- Publication number 20090240537
- Publication date Sep 24, 2009
- TOKYO ELECTRON LIMITED
- XINKANG TIAN
- G06 - COMPUTING CALCULATING COUNTING

Ching-Ling Meng

Person

Patents Grantslast 30 patents

Normal-incidence in-situ process monitor sensor

Normal-incidence in-situ process monitor sensor

Apparatus and method for monitoring and measuring properties of pol...

Normal-incident in-situ process monitor sensor

Optical sensor for phase determination

Advanced optical sensor and method for detecting an optical event i...

Spatially resolved optical emission spectroscopy (OES) in plasma pr...

Dark field wafer nano-defect inspection system with a singular beam

Spatially resolved optical emission spectroscopy (OES) in plasma pr...

Differential acoustic time of flight measurement of temperature of...

System for in-situ film stack measurement during etching and etch c...

Methods and systems for monitoring a parameter of a measurement dev...

Methods and systems for monitoring a parameter of a measurement dev...

Method and system for lamp temperature control in optical metrology

Automated process control using an optical metrology system optimiz...

Optical metrology system optimized with design goals

Designing an optical metrology system optimized with signal criteria

Apparatus for designing an optical metrology system optimized with...

Optical metrology system optimized with a plurality of design goals

Process control using an optical metrology system optimized with si...

Gas purge system and methods

Methods and systems for monitoring a parameter of a measurement dev...

Optical device latching mechanism

Methods and systems for determining a characteristic of polishing w...

Methods and systems for detecting a presence of blobs on a specimen...

Methods and systems for monitoring a parameter of a measurement dev...

Methods and systems for generating a two-dimensional map of a chara...

Systems and methods for characterizing a polishing process

Windows configurable to be coupled to a process tool or to be dispo...

Chemical mechanical planarization system

Patents Applicationslast 30 patents

OPTICAL METROLOGY

OPTICAL SENSOR FOR FILM THICKNESS MEASUREMENT

LASER SOURCE WITH MULTIPLE SEEDS FOR LIDAR

SYSTEMS AND METHODS FOR POLYGON MIRROR ANGLES ADJUSTMENT

LASER SOURCE WITH MULTIPLE SEEDS FOR LIDAR

STRAY LIGHT FILTER STRUCTURES FOR LIDAR DETECTOR ARRAY

COMPACT LIDAR SYSTEMS FOR DETECTING OBJECTS IN BLIND-SPOT AREAS

COMPACT LIDAR SYSTEMS FOR DETECTING OBJECTS IN BLIND-SPOT AREAS

OPTICAL SENSORS FOR MEASURING PROPERTIES OF CONSUMABLE PARTS IN A S...

OPTICAL SENSORS FOR MEASURING PROPERTIES OF CONSUMABLE PARTS IN A S...

Optical Sensor for Inspecting Pattern Collapse Defects

APPARATUS AND METHOD FOR MONITORING AND MEASURING PROPERTIES OF POL...

NORMAL-INCIDENCE IN-SITU PROCESS MONITOR SENSOR

NORMAL-INCIDENT IN-SITU PROCESS MONITOR SENSOR

OPTICAL SENSOR FOR PHASE DETERMINATION

ADVANCED OPTICAL SENSOR, SYSTEM, AND METHODOLOGIES FOR ETCH PROCESS...

DARK FIELD WAFER NANO-DEFECT INSPECTION SYSTEM WITH A SINGULAR BEAM

SPATIALLY RESOLVED OPTICAL EMISSION SPECTROSCOPY (OES) IN PLASMA PR...

ADVANCED OPTICAL SENSOR AND METHOD FOR PLASMA CHAMBER

SPATIALLY RESOLVED OPTICAL EMISSION SPECTROSCOPY (OES) IN PLASMA PR...

DIFFERENTIAL ACOUSTIC TIME OF FLIGHT MEASUREMENT OF TEMPERATURE OF...

SYSTEM FOR IN-SITU FILM STACK MEASUREMENT DURING ETCHING AND ETCH C...

METHODS AND SYSTEMS FOR MONITORING A PARAMETER OF A MEASUREMENT DEV...

AUTOMATED PROCESS CONTROL USING AN OPTICAL METROLOGY SYSTEM OPTIMIZ...

OPTICAL METROLOGY SYSTEM OPTIMIZED WITH DESIGN GOALS

DESIGNING AN OPTICAL METROLOGY SYSTEM OPTIMIZED WITH SIGNAL CRITERIA

METHOD AND SYSTEM FOR LAMP TEMPERATURE CONTROL IN OPTICAL METROLOGY

APPARATUS FOR DESIGNING AN OPTICAL METROLOGY SYSTEM OPTIMIZED WITH...

PROCESS CONTROL USING AN OPTICAL METROLOGY SYSTEM OPTIMIZED WITH SI...

APPARATUS FOR DESIGNING AN OPTICAL METROLOGY SYSTEM OPTIMIZED FOR O...