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CHISHIO KOSHIMIZU
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NIRASAKI-SHI, JP
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Patents Grants
last 30 patents
Information
Patent Grant
Plasma processing apparatus
Patent number
11,955,314
Issue date
Apr 9, 2024
Tokyo Electron Limited
Chishio Koshimizu
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Substrate processing method
Patent number
11,935,727
Issue date
Mar 19, 2024
Tokyo Electron Limited
Jun Yamawaku
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Grant
Plasma processing apparatus and measurement method
Patent number
11,908,665
Issue date
Feb 20, 2024
Tokyo Electron Limited
Chishio Koshimizu
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Plasma processing apparatus and plasma processing method
Patent number
11,875,977
Issue date
Jan 16, 2024
Tokyo Electron Limited
Chishio Koshimizu
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Plasma processing method and plasma processing apparatus
Patent number
11,871,503
Issue date
Jan 9, 2024
Tokyo Electron Limited
Takashi Dokan
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Plasma processing apparatus and control method
Patent number
11,830,704
Issue date
Nov 28, 2023
Tokyo Electron Limited
Chishio Koshimizu
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Cleaning method and plasma processing apparatus
Patent number
11,804,368
Issue date
Oct 31, 2023
Tokyo Electron Limited
Chishio Koshimizu
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Processing apparatus and processing method, and gas cluster generat...
Patent number
11,772,138
Issue date
Oct 3, 2023
Tokyo Electron Limited
Kazuya Dobashi
B08 - CLEANING
Information
Patent Grant
Plasma processing method and plasma processing apparatus
Patent number
11,764,034
Issue date
Sep 19, 2023
Tokyo Electron Limited
Chishio Koshimizu
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Control method and plasma processing apparatus
Patent number
11,764,082
Issue date
Sep 19, 2023
Tokyo Electron Limited
Chishio Koshimizu
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Control method and plasma processing apparatus
Patent number
11,742,181
Issue date
Aug 29, 2023
Tokyo Electron Limited
Chishio Koshimizu
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Control method and plasma processing apparatus
Patent number
11,742,182
Issue date
Aug 29, 2023
Tokyo Electron Limited
Chishio Koshimizu
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Plasma processing apparatus and control method
Patent number
11,742,183
Issue date
Aug 29, 2023
Tokyo Electron Limited
Ryuji Hisatomi
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Plasma processing method and plasma processing apparatus
Patent number
11,742,180
Issue date
Aug 29, 2023
Tokyo Electron Limited
Chishio Koshimizu
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Plasma processing apparatus and plasma processing method
Patent number
11,742,184
Issue date
Aug 29, 2023
Tokyo Electron Limited
Chishio Koshimizu
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Detecting method and plasma processing apparatus
Patent number
11,664,196
Issue date
May 30, 2023
Tokyo Electron Limited
Chishio Koshimizu
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Plasma processing apparatus and processing method
Patent number
11,581,170
Issue date
Feb 14, 2023
Tokyo Electron Limited
Shinji Kubota
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Plasma processing apparatus and control method
Patent number
11,574,798
Issue date
Feb 7, 2023
Tokyo Electron Limited
Chishio Koshimizu
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Plasma processing apparatus and etching method
Patent number
11,562,887
Issue date
Jan 24, 2023
Tokyo Electron Limited
Chishio Koshimizu
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Inspection method, inspection apparatus, and plasma processing appa...
Patent number
11,532,456
Issue date
Dec 20, 2022
Tokyo Electron Limited
Chishio Koshimizu
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Control method and plasma processing apparatus
Patent number
11,476,089
Issue date
Oct 18, 2022
Tokyo Electron Limited
Chishio Koshimizu
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Processing apparatus and processing method, and gas cluster generat...
Patent number
11,446,714
Issue date
Sep 20, 2022
Tokyo Electron Limited
Kazuya Dobashi
B08 - CLEANING
Information
Patent Grant
Plasma processing apparatus
Patent number
11,443,920
Issue date
Sep 13, 2022
Tokyo Electron Limited
Jun Yamawaku
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Upper electrode and plasma processing apparatus
Patent number
11,443,924
Issue date
Sep 13, 2022
Tokyo Electron Limited
Gen Tamamushi
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Plasma processing system and substrate processing method
Patent number
11,417,502
Issue date
Aug 16, 2022
Tokyo Electron Limited
Chishio Koshimizu
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Apparatus for plasma processing and method of etching
Patent number
11,361,947
Issue date
Jun 14, 2022
Tokyo Electron Limited
Chishio Koshimizu
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Plasma processing method and plasma processing apparatus
Patent number
11,337,297
Issue date
May 17, 2022
Tokyo Electron Limited
Takashi Dokan
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Plasma processing apparatus and plasma processing method
Patent number
11,315,765
Issue date
Apr 26, 2022
Tokyo Electron Limited
Jun Yamawaku
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Plasma processing apparatus and control method
Patent number
11,201,034
Issue date
Dec 14, 2021
Tokyo Electron Limited
Ryuji Hisatomi
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Plasma processing apparatus, impedance matching method, and plasma...
Patent number
11,017,985
Issue date
May 25, 2021
Tokyo Electron Limited
Chishio Koshimizu
H01 - BASIC ELECTRIC ELEMENTS
Patents Applications
last 30 patents
Information
Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
Publication number
20240170257
Publication date
May 23, 2024
TOKYO ELECTRON LIMITED
Chishio Koshimizu
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
Publication number
20240120176
Publication date
Apr 11, 2024
TOKYO ELECTRON LIMITED
Chishio Koshimizu
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
Publication number
20240112895
Publication date
Apr 4, 2024
TOKYO ELECTRON LIMITED
Chishio Koshimizu
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
PLASMA PROCESSING APPARATUS AND SUBSTRATE SUPPORT
Publication number
20240087857
Publication date
Mar 14, 2024
TOKYO ELECTRON LIMITED
Chishio KOSHIMIZU
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
PLASMA PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
Publication number
20240062991
Publication date
Feb 22, 2024
TOKYO ELECTRON LIMITED
Chishio Koshimizu
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS
Publication number
20240006154
Publication date
Jan 4, 2024
TOKYO ELECTRON LIMITED
Chishio KOSHIMIZU
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
CLEANING METHOD AND PLASMA PROCESSING APPARATUS
Publication number
20230402269
Publication date
Dec 14, 2023
TOKYO ELECTRON LIMITED
Chishio Koshimizu
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
PLASMA PROCESSING APPARATUS, PLASMA PROCESSING METHOD, PRESSURE VAL...
Publication number
20230395360
Publication date
Dec 7, 2023
TOKYO ELECTRON LIMITED
Kota SHIHOMMATSU
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
CONTROL METHOD AND PLASMA PROCESSING APPARATUS
Publication number
20230377843
Publication date
Nov 23, 2023
TOKYO ELECTRON LIMITED
Chishio KOSHIMIZU
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
PLASMA PROCESSING APPARATUS AND METHOD FOR CONTROLLING SOURCE FREQU...
Publication number
20230369019
Publication date
Nov 16, 2023
TOKYO ELECTRON LIMITED
Gen TAMAMUSHI
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
PLASMA PROCESSING APPARATUS AND METHOD FOR CONTROLLING SOURCE FREQU...
Publication number
20230369020
Publication date
Nov 16, 2023
TOKYO ELECTRON LIMITED
Chishio Koshimizu
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS
Publication number
20230360882
Publication date
Nov 9, 2023
TOKYO ELECTRON LIMITED
Chishio KOSHIMIZU
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
PLASMA PROCESSING APPARATUS AND ELECTROSTATIC CHUCK MANUFACTURING M...
Publication number
20230207285
Publication date
Jun 29, 2023
TOKYO ELECTRON LIMITED
Chishio Koshimizu
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
PLASMA PROCESSING APPARATUS AND CONTROL METHOD
Publication number
20230162946
Publication date
May 25, 2023
TOKYO ELECTRON LIMITED
Chishio KOSHIMIZU
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
PLASMA PROCESSING APPARATUS AND PROCESSING METHOD
Publication number
20230094655
Publication date
Mar 30, 2023
TOKYO ELECTRON LIMITED
Chishio KOSHIMIZU
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
Publication number
20230078135
Publication date
Mar 16, 2023
TOKYO ELECTRON LIMITED
Natsumi TORII
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
PLASMA PROCESSING APPARATUS
Publication number
20230077143
Publication date
Mar 9, 2023
TOKYO ELECTRON LIMITED
Chishio KOSHIMIZU
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
Publication number
20230050506
Publication date
Feb 16, 2023
TOKYO ELECTRON LIMITED
Chishio Koshimizu
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
Publication number
20220406566
Publication date
Dec 22, 2022
TOKYO ELECTRON LIMITED
Chishio Koshimizu
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
PROCESSING APPARATUS AND PROCESSING METHOD, AND GAS CLUSTER GENERAT...
Publication number
20220384152
Publication date
Dec 1, 2022
TOKYO ELECTRON LIMITED
Kazuya Dobashi
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
PLASMA PROCESSING APPARATUS
Publication number
20220384150
Publication date
Dec 1, 2022
TOKYO ELECTRON LIMITED
Chishio Koshimizu
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
SUBSTRATE SUPPORT, PLASMA PROCESSING APPARATUS, AND PLASMA PROCESSI...
Publication number
20220375731
Publication date
Nov 24, 2022
TOKYO ELECTRON LIMITED
Chishio KOSHIMIZU
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
APPARATUS FOR PLASMA PROCESSING AND METHOD OF ETCHING
Publication number
20220238313
Publication date
Jul 28, 2022
TOKYO ELECTRON LIMITED
Chishio KOSHIMIZU
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
CONTROL METHOD AND PLASMA PROCESSING APPARATUS
Publication number
20220216036
Publication date
Jul 7, 2022
TOKYO ELECTRON LIMITED
Chishio KOSHIMIZU
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS
Publication number
20220159820
Publication date
May 19, 2022
TOKYO ELECTRON LIMITED
Takashi Dokan
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
PLASMA PROCESSING APPARATUS
Publication number
20220130646
Publication date
Apr 28, 2022
TOKYO ELECTRON LIMITED
Chishio Koshimizu
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
Publication number
20220108878
Publication date
Apr 7, 2022
TOKYO ELECTRON LIMITED
Chishio KOSHIMIZU
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
Publication number
20220084787
Publication date
Mar 17, 2022
TOKYO ELECTRON LIMITED
Chishio KOSHIMIZU
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
PLASMA PROCESSING APPARATUS AND CONTROL METHOD
Publication number
20220076921
Publication date
Mar 10, 2022
TOKYO ELECTRON LIMITED
Ryuji HISATOMI
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
Publication number
20220037129
Publication date
Feb 3, 2022
TOKYO ELECTRON LIMITED
Chishio KOSHIMIZU
H01 - BASIC ELECTRIC ELEMENTS