Chiyan KUAN

Person

Danville, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
System for inspecting and grounding a mask in a charged particle sy...
- Patent number 12,142,451
- Issue date Nov 12, 2024
- ASML Netherlands B.V.
- Tianming Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and system for inspecting an EUV mask
- Patent number 11,662,323
- Issue date May 30, 2023
- ASML Netherlands B.V.
- Guochong Weng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam inspection of ungrounded samples
- Patent number 11,448,607
- Issue date Sep 20, 2022
- ASML Netherlands B.V.
- Chiyan Kuan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Micro LED display panel
- Patent number 11,366,153
- Issue date Jun 21, 2022
- KKT HOLDINGS SYNDICATE
- Tzu-Yi Kuo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and system for inspecting an EUV mask
- Patent number 10,775,325
- Issue date Sep 15, 2020
- ASML Netherlands B.V.
- Guochong Weng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and system for inspecting an EUV mask
- Patent number 10,088,438
- Issue date Oct 2, 2018
- Hermes-Microvision, Inc.
- Guochong Weng
- G01 - MEASURING TESTING
Information Patent Grant
Structure electron beam inspection system for inspecting extreme ul...
- Patent number 10,054,556
- Issue date Aug 21, 2018
- Hermes Microvision Inc.
- You-Jin Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and system for inspecting and grounding an EUV mask
- Patent number 9,859,089
- Issue date Jan 2, 2018
- Hermes Microvision Inc.
- Guochong Weng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Structure electron beam inspection system for inspecting extreme ul...
- Patent number 9,572,237
- Issue date Feb 14, 2017
- Hermes Microvision Inc.
- You-Jin Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and system for inspecting an EUV mask
- Patent number 9,485,846
- Issue date Nov 1, 2016
- Hermes Microvision Inc.
- Guochong Weng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and system for enhancing image quality
- Patent number 9,436,985
- Issue date Sep 6, 2016
- Hermes Microvision Inc.
- Chiyan Kuan
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Charged particle beam apparatus
- Patent number 9,177,758
- Issue date Nov 3, 2015
- Hermes Microvision Inc.
- Zhongwei Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Reticle operation system
- Patent number 9,164,399
- Issue date Oct 20, 2015
- Hermes-Microvision, Inc.
- Youjin Wang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Structure electron beam inspection system for inspecting extreme ul...
- Patent number 9,113,538
- Issue date Aug 18, 2015
- Hermes-Microvision, Inc.
- You-Jin Wang
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Method and system for enhancing image quality
- Patent number 9,002,097
- Issue date Apr 7, 2015
- Hermes Microvision Inc.
- Chiyan Kuan
- G01 - MEASURING TESTING
Information Patent Grant
Method for inspecting EUV reticle and apparatus thereof
- Patent number 8,692,193
- Issue date Apr 8, 2014
- Hermes-Microvision, Inc.
- Chiyan Kuan
- G01 - MEASURING TESTING
Information Patent Grant
Structure for discharging extreme ultraviolet mask
- Patent number 8,575,573
- Issue date Nov 5, 2013
- Hermes-Microvision, Inc.
- You-Jin Wang
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Charged particle system for reticle/wafer defects inspection and re...
- Patent number 8,519,333
- Issue date Aug 27, 2013
- Hermes Microvision Inc.
- Chiyan Kuan
- G01 - MEASURING TESTING
Information Patent Grant
Substrate and die defect inspection method
- Patent number 8,295,580
- Issue date Oct 23, 2012
- Hermes Microvision Inc.
- Chiyan Kuan
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method for inspecting EUV reticle and apparatus thereof
- Patent number 8,217,349
- Issue date Jul 10, 2012
- Hermes-Microvision, Inc.
- Chiyan Kuan
- G01 - MEASURING TESTING
Information Patent Grant
Site stepping for electron beam micro analysis
- Patent number 7,115,866
- Issue date Oct 3, 2006
- KLA-Tencor Technologies, Inc.
- Roger Kroeze
- G01 - MEASURING TESTING

Patents Applicationslast 30 patents

Information Patent Application
SYSTEM FOR INSPECTING AND GROUNDING A MASK IN A CHARGED PARTICLE SY...
- Publication number 20230005698
- Publication date Jan 5, 2023
- ASML NETHERLANDS B.V.
- Tianming CHEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND SYSTEM FOR INSPECTING AN EUV MASK
- Publication number 20210172891
- Publication date Jun 10, 2021
- ASML NETHERLANDS B.V.
- Guochong Weng
- G01 - MEASURING TESTING
Information Patent Application
DYNAMIC DETERMINATION OF A SAMPLE INSPECTION RECIPE OF CHARGED PART...
- Publication number 20200286710
- Publication date Sep 10, 2020
- ASML NETHERLANDS B.V.
- Zhong-wei CHEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Micro LED Display Panel
- Publication number 20200225277
- Publication date Jul 16, 2020
- Tzu-Yi Kuo
- G01 - MEASURING TESTING
Information Patent Application
CHARGED PARTICLE BEAM INSPECTION OF UNGROUNDED SAMPLES
- Publication number 20200088657
- Publication date Mar 19, 2020
- ASML Netherlands B.V.
- Chiyan KUAN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND SYSTEM FOR INSPECTING AN EUV MASK
- Publication number 20190170671
- Publication date Jun 6, 2019
- HERMES MICROVISION, INC.
- Guochong Weng
- G01 - MEASURING TESTING
Information Patent Application
METHOD AND SYSTEM FOR INSPECTING AN EUV MASK
- Publication number 20170052129
- Publication date Feb 23, 2017
- HERMES MICROVISION, INC.
- Guochong Weng
- G01 - MEASURING TESTING
Information Patent Application
STRUCTURE ELECTRON BEAM INSPECTION SYSTEM FOR INSPECTING EXTREME UL...
- Publication number 20170053774
- Publication date Feb 23, 2017
- HERMES MICROVISION INC.
- You-Jin WANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method and System for Inspecting an EUV Mask
- Publication number 20150325402
- Publication date Nov 12, 2015
- HERMES MICROVISION INC.
- Guochong Weng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
STRUCTURE ELECTRON BEAM INSPECTION SYSTEM FOR INSPECTING EXTREME UL...
- Publication number 20150305131
- Publication date Oct 22, 2015
- HERMES MICROVISION INC.
- You-Jin WANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Charged Particle Beam Apparatus
- Publication number 20150144788
- Publication date May 28, 2015
- HERMES MICROVISION INC.
- Zhongwei Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND SYSTEM FOR INSPECTING AN EUV MASK
- Publication number 20150102220
- Publication date Apr 16, 2015
- HERMES MICROVISION INC.
- Guoching Weng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
STRUCTURE FOR DISCHARGING EXTREME ULTRAVIOLET MASK
- Publication number 20140027634
- Publication date Jan 30, 2014
- HERMES MICROVISION, INC.
- You-Jin WANG
- G01 - MEASURING TESTING
Information Patent Application
Reticle Operation System
- Publication number 20130176549
- Publication date Jul 11, 2013
- Youjin Wang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
STRUCTURE FOR DISCHARGING EXTREME ULTRAVIOLET MASK
- Publication number 20120292509
- Publication date Nov 22, 2012
- You-Jin WANG
- G01 - MEASURING TESTING
Information Patent Application
CHARGED PARTICLE SYSTEM FOR RETICLE / WAFER DEFECTS INSPECTION AND...
- Publication number 20120280125
- Publication date Nov 8, 2012
- HERMES MICROVISION INC.
- CHIYAN KUAN
- G01 - MEASURING TESTING
Information Patent Application
METHOD FOR INSPECTING EUV RETICLE AND APPARATUS THEREOF
- Publication number 20120228494
- Publication date Sep 13, 2012
- Hermes-Microvision, Inc.
- CHIYAN KUAN
- G01 - MEASURING TESTING
Information Patent Application
METHOD FOR INSPECTING EUV RETICLE AND APPARATUS THEREOF
- Publication number 20120032076
- Publication date Feb 9, 2012
- Hermes-Microvision, Inc.
- CHIYAN KUAN
- G01 - MEASURING TESTING
Information Patent Application
SUBSTRATE INSPECTION METHOD
- Publication number 20110052040
- Publication date Mar 3, 2011
- Hermes Microvision, Inc.
- CHIYAN KUAN
- G06 - COMPUTING CALCULATING COUNTING

Chiyan KUAN

Person

Patents Grantslast 30 patents

System for inspecting and grounding a mask in a charged particle sy...

Method and system for inspecting an EUV mask

Charged particle beam inspection of ungrounded samples

Micro LED display panel

Method and system for inspecting an EUV mask

Method and system for inspecting an EUV mask

Structure electron beam inspection system for inspecting extreme ul...

Method and system for inspecting and grounding an EUV mask

Structure electron beam inspection system for inspecting extreme ul...

Method and system for inspecting an EUV mask

Method and system for enhancing image quality

Charged particle beam apparatus

Reticle operation system

Structure electron beam inspection system for inspecting extreme ul...

Method and system for enhancing image quality

Method for inspecting EUV reticle and apparatus thereof

Structure for discharging extreme ultraviolet mask

Charged particle system for reticle/wafer defects inspection and re...

Substrate and die defect inspection method

Method for inspecting EUV reticle and apparatus thereof

Site stepping for electron beam micro analysis

Patents Applicationslast 30 patents

SYSTEM FOR INSPECTING AND GROUNDING A MASK IN A CHARGED PARTICLE SY...

METHOD AND SYSTEM FOR INSPECTING AN EUV MASK

DYNAMIC DETERMINATION OF A SAMPLE INSPECTION RECIPE OF CHARGED PART...

Micro LED Display Panel

CHARGED PARTICLE BEAM INSPECTION OF UNGROUNDED SAMPLES

METHOD AND SYSTEM FOR INSPECTING AN EUV MASK

METHOD AND SYSTEM FOR INSPECTING AN EUV MASK

STRUCTURE ELECTRON BEAM INSPECTION SYSTEM FOR INSPECTING EXTREME UL...

Method and System for Inspecting an EUV Mask

STRUCTURE ELECTRON BEAM INSPECTION SYSTEM FOR INSPECTING EXTREME UL...

Charged Particle Beam Apparatus

METHOD AND SYSTEM FOR INSPECTING AN EUV MASK

STRUCTURE FOR DISCHARGING EXTREME ULTRAVIOLET MASK

Reticle Operation System

STRUCTURE FOR DISCHARGING EXTREME ULTRAVIOLET MASK

CHARGED PARTICLE SYSTEM FOR RETICLE / WAFER DEFECTS INSPECTION AND...

METHOD FOR INSPECTING EUV RETICLE AND APPARATUS THEREOF

METHOD FOR INSPECTING EUV RETICLE AND APPARATUS THEREOF

SUBSTRATE INSPECTION METHOD