Choong Han RYU

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Seoul, KR

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Patents Grantslast 30 patents

Information Patent Grant
Method of fabricating reflective photomask
- Patent number 9,726,970
- Issue date Aug 8, 2017
- SK Hynix Inc.
- Choong Han Ryu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Reflection-type photomasks and methods of fabricating the same
- Patent number 8,795,931
- Issue date Aug 5, 2014
- SK Hynix Inc.
- Choong Han Ryu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for correcting critical dimension of phase shift mask and me...
- Patent number 8,455,159
- Issue date Jun 4, 2013
- SK Hynix Inc.
- Choong Han Ryu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
METHODS OF FABRICATING PHASE SHIFT PHOTOMASKS
- Publication number 20220121106
- Publication date Apr 21, 2022
- SK HYNIX INC.
- Choong Han RYU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
BLANK PHASE SHIFT PHOTOMASKS, PHASE SHIFT PHOTOMASKS FABRICATED USI...
- Publication number 20190354004
- Publication date Nov 21, 2019
- SK HYNIX INC.
- Choong Han RYU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF FABRICATING REFLECTIVE PHOTOMASK
- Publication number 20170123304
- Publication date May 4, 2017
- SK HYNIX INC.
- Choong Han RYU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
REFLECTION-TYPE PHOTOMASKS AND METHODS OF FABRICATING THE SAME
- Publication number 20130196256
- Publication date Aug 1, 2013
- SK HYNIX INC.
- Choong Han RYU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR CORRECTING CRITICAL DIMENSION OF PHASE SHIFT MASK AND ME...
- Publication number 20120061349
- Publication date Mar 15, 2012
- Hynix Semiconductor Inc.
- Choong Han RYU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY