Choong-Ryul Ryou

Person

Suwon-si, KR

People

Patents Grantslast 30 patents

Information Patent Grant
Method of forming a pattern in a semiconductor device and method of...
- Patent number 9,111,880
- Issue date Aug 18, 2015
- Samsung Electronics Co., Ltd.
- Choong-Ryul Ryou
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of forming a pattern in a semiconductor device and method of...
- Patent number 8,846,304
- Issue date Sep 30, 2014
- Samsung Electronics Co., Ltd.
- Choong-Ryul Ryou
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of forming a pattern in a semiconductor device and method of...
- Patent number 8,409,787
- Issue date Apr 2, 2013
- Samsung Electronics Co., Ltd.
- Choong-Ryul Ryou
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of forming a pattern in a semiconductor device and method of...
- Patent number 7,914,973
- Issue date Mar 29, 2011
- Samsung Electronics Co., Ltd.
- Choong-Ryul Ryou
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of fabricating MOS transistor having fully silicided gate
- Patent number 7,179,714
- Issue date Feb 20, 2007
- Samsung Electronics Co., Ltd.
- You-Jean Chang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacturing a semiconductor device
- Patent number 7,045,429
- Issue date May 16, 2006
- Samsung Electronics, Co., Ltd.
- Jin-Hua Liu
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
METHOD OF FORMING A PATTERN IN A SEMICONDUCTOR DEVICE AND METHOD OF...
- Publication number 20160005624
- Publication date Jan 7, 2016
- Samsung Electronics Co., Ltd.
- Choong-Ryul Ryou
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF FORMING A PATTERN IN A SEMICONDUCTOR DEVICE AND METHOD OF...
- Publication number 20150017804
- Publication date Jan 15, 2015
- Samsung Electronics Co., Ltd.
- Choong-Ryul Ryou
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF FORMING A PATTERN IN A SEMICONDUCTOR DEVICE AND METHOD OF...
- Publication number 20130230979
- Publication date Sep 5, 2013
- Samsung Electronics Co., Ltd.
- Choong-Ryul Ryou
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF FORMING A PATTERN IN A SEMICONDUCTOR DEVICE AND METHOD O...
- Publication number 20110159443
- Publication date Jun 30, 2011
- Choong-Ryul Ryou
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF FORMING A PATTERN IN A SEMICONDUCTOR DEVICE AND METHOD OF...
- Publication number 20080261156
- Publication date Oct 23, 2008
- Samsung Electronics Co., Ltd.
- Choong-Ryul Ryou
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Trench isolation methods of semiconductor device
- Publication number 20080032483
- Publication date Feb 7, 2008
- Samsung Electronics Co., Ltd.
- Hyuk-Ju Ryu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Trench isolation methods of semiconductor device
- Publication number 20060240636
- Publication date Oct 26, 2006
- Hyuk-Ju Ryu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor device including resistor and method of fabricating t...
- Publication number 20060194436
- Publication date Aug 31, 2006
- SAMSUNG ELECTRONICS CO., LTD.
- Myoung-Hwan Oh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of fabricating MOS transistor having fully silicided gate
- Publication number 20050191833
- Publication date Sep 1, 2005
- SAMSUNG ELECTRONICS CO., LTD.
- You-Jean Chang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of manufacturing a semiconductor device
- Publication number 20050176207
- Publication date Aug 11, 2005
- SAMSUNG ELECTRONICS CO., LTD.
- Jin-Hua Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of forming a pattern in a semiconductor device and method of...
- Publication number 20050142497
- Publication date Jun 30, 2005
- SAMSUNG ELECTRONICS CO., LTD.
- Choong-Ryul Ryou
- H01 - BASIC ELECTRIC ELEMENTS

Choong-Ryul Ryou

Person

Patents Grantslast 30 patents

Method of forming a pattern in a semiconductor device and method of...

Method of forming a pattern in a semiconductor device and method of...

Method of forming a pattern in a semiconductor device and method of...

Method of forming a pattern in a semiconductor device and method of...

Method of fabricating MOS transistor having fully silicided gate

Method of manufacturing a semiconductor device

Patents Applicationslast 30 patents

METHOD OF FORMING A PATTERN IN A SEMICONDUCTOR DEVICE AND METHOD OF...

METHOD OF FORMING A PATTERN IN A SEMICONDUCTOR DEVICE AND METHOD OF...

METHOD OF FORMING A PATTERN IN A SEMICONDUCTOR DEVICE AND METHOD OF...

METHOD OF FORMING A PATTERN IN A SEMICONDUCTOR DEVICE AND METHOD O...

METHOD OF FORMING A PATTERN IN A SEMICONDUCTOR DEVICE AND METHOD OF...

Trench isolation methods of semiconductor device

Trench isolation methods of semiconductor device

Semiconductor device including resistor and method of fabricating t...

Method of fabricating MOS transistor having fully silicided gate

Method of manufacturing a semiconductor device

Method of forming a pattern in a semiconductor device and method of...