Chorng-Ping Chang

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Saratoga, CA, US

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Patents Grantslast 30 patents

Information Patent Grant
Method of fabricating a gate-all-around word line for a vertical ch...
- Patent number 9,023,723
- Issue date May 5, 2015
- Applied Materials, Inc.
- Chorng-Ping Chang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of fabricating a self-aligned buried bit line for a vertical...
- Patent number 8,895,432
- Issue date Nov 25, 2014
- Applied Materials, Inc.
- Chorng-Ping Chang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Metal gate electrodes for replacement gate integration scheme
- Patent number 7,892,911
- Issue date Feb 22, 2011
- Applied Materials, Inc.
- Bingxi Sun Wood
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
LPCVD gate hard mask
- Patent number 7,547,621
- Issue date Jun 16, 2009
- Applied Materials, Inc.
- Rajesh Kanuri
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
FIN FIELD EFFECT TRANSISTOR FABRICATED WITH HOLLOW REPLACEMENT CHANNEL
- Publication number 20140231914
- Publication date Aug 21, 2014
- Applied Materials, Inc.
- Chorng-Ping Chang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of fabricating a gate-all-around word line for a vertical ch...
- Publication number 20130323920
- Publication date Dec 5, 2013
- Chorng-Ping Chang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of fabricating a self-aligned buried bit line for a vertical...
- Publication number 20130320542
- Publication date Dec 5, 2013
- Chorng-Ping Chang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INWARD DIELECTRIC SPACERS FOR REPLACEMENT GATE INTEGRATION SCHEME
- Publication number 20090189201
- Publication date Jul 30, 2009
- Chorng-Ping Chang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METAL GATE ELECTRODES FOR REPLACEMENT GATE INTEGRATION SCHEME
- Publication number 20090179285
- Publication date Jul 16, 2009
- Bingxi Sun Wood
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LPCVD gate hard mask
- Publication number 20080026584
- Publication date Jan 31, 2008
- APPLIED MATERIALS, INC.
- Rajesh Kanuri
- H01 - BASIC ELECTRIC ELEMENTS