Chris C. Yu

Person

Shanghai, CN

People

Patents Grantslast 30 patents

Information Patent Grant
Composition for removing photoresist layer and method for using it
- Patent number 8,038,749
- Issue date Oct 18, 2011
- Anji Microelectronics (Shanghai) Co., Ltd.
- Shumin Wang
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Chemical mechanical polishing slurries, their applications and meth...
- Patent number 7,776,231
- Issue date Aug 17, 2010
- Anji Microelectronics (Shanghai) Co., Ltd.
- Chris Chang Yu
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Method and structure for landing polysilicon contact
- Patent number 7,670,902
- Issue date Mar 2, 2010
- Semiconductor Manufacturing International (Shanghai) Corporation
- Chris C. Yu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and structure for aluminum chemical mechanical polishing
- Patent number 7,645,703
- Issue date Jan 12, 2010
- Semiconductor Manufacturing International (Shanghai) Corporation
- Chris C. Yu
- G02 - OPTICS
Information Patent Grant
Etch back with aluminum CMP for LCOS devices
- Patent number 7,557,031
- Issue date Jul 7, 2009
- Semiconductor Manufacturing International (Shanghai) Corporation
- Chris C. Yu
- G02 - OPTICS
Information Patent Grant
Method and structure for aluminum chemical mechanical polishing and...
- Patent number 7,241,692
- Issue date Jul 10, 2007
- Semiconductor Manufacturing International (Shanghai) Corporation
- Chris C. Yu
- G02 - OPTICS
Information Patent Grant
Systems and slurries for chemical mechanical polishing
- Patent number 7,052,373
- Issue date May 30, 2006
- ANJI Microelectronics Co., Ltd.
- Andy Chunxiao Yang
- B24 - GRINDING POLISHING

Patents Applicationslast 30 patents

Information Patent Application
Composition for removing photoresist layer and method for using it
- Publication number 20090100764
- Publication date Apr 23, 2009
- Shumin Wang
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Composition for Removing Photresist Layer and Method for Using it
- Publication number 20090095320
- Publication date Apr 16, 2009
- ANJI MICROELECTRONICS (SHANGHAI) CO., LTD.
- Shumin Wang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Chemical Mechanical Polishing Slurries, Their Applications and Meth...
- Publication number 20080190894
- Publication date Aug 14, 2008
- Chris Chang Yu
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Method and structure for aluminum chemical mechanical polishing and...
- Publication number 20070026679
- Publication date Feb 1, 2007
- Semiconductor Manufacturing International (Shanghai) Corporation
- Chris C. Yu
- G02 - OPTICS
Information Patent Application
Method and structure for aluminum chemical mechanical polishing
- Publication number 20070026557
- Publication date Feb 1, 2007
- Semiconductor Manufacturing International (Shanghai) Corporation
- Chris C. Yu
- G02 - OPTICS
Information Patent Application
Etch back with aluminum CMP for LCOS devices
- Publication number 20070026634
- Publication date Feb 1, 2007
- Semiconductor Manufacturing International (Shanghai) Corporation
- Chris C. Yu
- G02 - OPTICS
Information Patent Application
Method and structure for landing polysilicon contact
- Publication number 20070026656
- Publication date Feb 1, 2007
- Semiconductor Manufacturing International (Shanghi) Corporation
- Chris C. Yu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Slurry composition and methods for chemical mechanical polishing
- Publication number 20060118760
- Publication date Jun 8, 2006
- Andy Chunxiao Yang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Systems, methods and slurries for chemical mechanical polishing
- Publication number 20060084271
- Publication date Apr 20, 2006
- Andy Chunxiao Yang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Chris C. Yu

Person

Patents Grantslast 30 patents

Composition for removing photoresist layer and method for using it

Chemical mechanical polishing slurries, their applications and meth...

Method and structure for landing polysilicon contact

Method and structure for aluminum chemical mechanical polishing

Etch back with aluminum CMP for LCOS devices

Method and structure for aluminum chemical mechanical polishing and...

Systems and slurries for chemical mechanical polishing

Patents Applicationslast 30 patents

Composition for removing photoresist layer and method for using it

Composition for Removing Photresist Layer and Method for Using it

Chemical Mechanical Polishing Slurries, Their Applications and Meth...

Method and structure for aluminum chemical mechanical polishing and...

Method and structure for aluminum chemical mechanical polishing

Etch back with aluminum CMP for LCOS devices

Method and structure for landing polysilicon contact

Slurry composition and methods for chemical mechanical polishing

Systems, methods and slurries for chemical mechanical polishing