Chris Raymond

Person

Bend, OR, US

People

Patents Grantslast 30 patents

Information Patent Grant
Silicon filter for photoluminescence metrology
- Patent number 8,330,946
- Issue date Dec 11, 2012
- Nanometrics Incorporated
- Andrzej Buczkowski
- G01 - MEASURING TESTING
Information Patent Grant
Method for evaluating microstructures on a workpiece based on the o...
- Patent number 8,027,037
- Issue date Sep 27, 2011
- Nanometrics Incorporated
- Mike Littau
- G01 - MEASURING TESTING
Information Patent Grant
Method for evaluating microstructures on a workpiece based on the o...
- Patent number 7,656,542
- Issue date Feb 2, 2010
- Nanometrics Incorporated
- Mike Littau
- G01 - MEASURING TESTING
Information Patent Grant
Line profile asymmetry measurement
- Patent number 7,639,371
- Issue date Dec 29, 2009
- Nanometrics Incorporated
- Christopher Raymond
- G01 - MEASURING TESTING
Information Patent Grant
Apparatus and method for enhanced critical dimension scatterometry
- Patent number 7,615,752
- Issue date Nov 10, 2009
- Nanometrics Incorporated
- Chris Raymond
- G01 - MEASURING TESTING
Information Patent Grant
Line profile asymmetry measurement
- Patent number 7,515,279
- Issue date Apr 7, 2009
- Nanometrics Incorporated
- Christopher Raymond
- G01 - MEASURING TESTING
Information Patent Grant
Scatterometer having a computer system that reads data from selecte...
- Patent number 7,511,293
- Issue date Mar 31, 2009
- Nanometrics Incorporated
- Chris Raymond
- G01 - MEASURING TESTING
Information Patent Grant
Apparatus and method for enhanced critical dimension scatterometry
- Patent number 7,502,101
- Issue date Mar 10, 2009
- Nanometrics Incorporated
- Chris Raymond
- G01 - MEASURING TESTING
Information Patent Grant
Determination of center of focus by parameter variability analysis
- Patent number 7,119,893
- Issue date Oct 10, 2006
- Accent Optical Technologies, Inc.
- Michael E. Littau
- G01 - MEASURING TESTING
Information Patent Grant
Determination of center of focus by cross-section analysis
- Patent number 7,110,099
- Issue date Sep 19, 2006
- Accent Optical Technologies, Inc.
- Michael E. Littau
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Line profile asymmetry measurement using scatterometry
- Patent number 6,856,408
- Issue date Feb 15, 2005
- Accent Optical Technologies, Inc.
- Christopher J. Raymond
- G01 - MEASURING TESTING
Information Patent Grant
Structure identification using scattering signatures
- Patent number 6,728,663
- Issue date Apr 27, 2004
- Accent Optical Technologies, Inc.
- Richard H. Krukar
- G01 - MEASURING TESTING
Information Patent Grant
Determination of center of focus by diffraction signature analysis
- Patent number 6,606,152
- Issue date Aug 12, 2003
- Accent Optical Technologies, Inc.
- Michael E. Littau
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Determination of center of focus by diffraction signature analysis
- Patent number 6,429,930
- Issue date Aug 6, 2002
- Accent Optical Technologies, Inc.
- Michael E. Littau
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
Silicon Filter for Photoluminescence Metrology
- Publication number 20110141460
- Publication date Jun 16, 2011
- Nanometrics Incorporated
- Andrzej Buczkowski
- G01 - MEASURING TESTING
Information Patent Application
Method for Evaluating Microstructures on a Workpiece Based on the O...
- Publication number 20100135571
- Publication date Jun 3, 2010
- Nanometrics Incorporated
- Mike Littau
- G01 - MEASURING TESTING
Information Patent Application
Line Profile Asymmetry Measurement
- Publication number 20090190138
- Publication date Jul 30, 2009
- Nanometrics Incorporated
- Christopher Raymond
- G01 - MEASURING TESTING
Information Patent Application
Method for evaluating microstructures on a workpiece based on the o...
- Publication number 20070211261
- Publication date Sep 13, 2007
- Mike Littau
- G01 - MEASURING TESTING
Information Patent Application
Line Profile Asymmetry Measurement
- Publication number 20070201043
- Publication date Aug 30, 2007
- Accent Optical Technologies, Inc.
- Christopher Raymond
- G01 - MEASURING TESTING
Information Patent Application
Apparatus and method for enhanced critical dimension scatterometry
- Publication number 20060289788
- Publication date Dec 28, 2006
- Accent Optical Technologies, Inc.
- Chris Raymond
- G01 - MEASURING TESTING
Information Patent Application
Apparatus and method for enhanced critical dimension scatterometry
- Publication number 20060289789
- Publication date Dec 28, 2006
- Accent Optical Technologies, Inc.
- Chris Raymond
- G01 - MEASURING TESTING
Information Patent Application
Apparatus and method for enhanced critical dimension scatterometry
- Publication number 20060289790
- Publication date Dec 28, 2006
- Accent Optical Technologies, Inc.
- Chris Raymond
- G01 - MEASURING TESTING
Information Patent Application
Apparatuses and methods for enhanced critical dimension scatterometry
- Publication number 20060285111
- Publication date Dec 21, 2006
- Accent Optical Technologies, Inc.
- Chris Raymond
- G01 - MEASURING TESTING
Information Patent Application
Apparatus and method for enhanced critical dimension scatterometry
- Publication number 20060285110
- Publication date Dec 21, 2006
- Accent Optical Technologies, Inc.
- Chris Raymond
- G01 - MEASURING TESTING
Information Patent Application
Apparatus and method for enhanced critical dimension scatterometry
- Publication number 20060278834
- Publication date Dec 14, 2006
- Accent Optical Technologies, Inc.
- Chris Raymond
- G01 - MEASURING TESTING
Information Patent Application
Apparatus and method for enhanced critical dimension scatterometry
- Publication number 20060273263
- Publication date Dec 7, 2006
- Accent Optical Technologies, Inc.
- Chris Raymond
- G01 - MEASURING TESTING
Information Patent Application
Apparatus and method for enhanced critical dimension scatterometry
- Publication number 20060243912
- Publication date Nov 2, 2006
- Accent Optical Technologies, Inc.
- Chris Raymond
- G01 - MEASURING TESTING
Information Patent Application
APPARATUS AND METHODS FOR SCATTEROMETRY OF OPTICAL DEVICES
- Publication number 20060244969
- Publication date Nov 2, 2006
- Tom W. Ryan
- G01 - MEASURING TESTING
Information Patent Application
Determination of center of focus by parameter variability analysis
- Publication number 20040233445
- Publication date Nov 25, 2004
- Accent Optical Technologies, Inc.
- Michael E. Littau
- G01 - MEASURING TESTING
Information Patent Application
Determination of center of focus by cross-section analysis
- Publication number 20040223137
- Publication date Nov 11, 2004
- Michael E. Littau
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Scatterometric measurement of undercut multi-layer diffracting sign...
- Publication number 20030197872
- Publication date Oct 23, 2003
- Michael E. Littau
- G01 - MEASURING TESTING
Information Patent Application
Determination of center of focus by diffraction signature analysis
- Publication number 20030002031
- Publication date Jan 2, 2003
- Michael E. Littau
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Line profile asymmetry measurment using scatterometry
- Publication number 20020149782
- Publication date Oct 17, 2002
- Christopher J. Raymond
- G01 - MEASURING TESTING
Information Patent Application
Structure identification using scattering signatures
- Publication number 20020046008
- Publication date Apr 18, 2002
- Richard H. Krukar
- G01 - MEASURING TESTING
Information Patent Application
DETERMINATION OF CENTER OF FOCUS BY DIFFRACTION SIGNATURE ANALYSIS
- Publication number 20020041373
- Publication date Apr 11, 2002
- Michael Eugene Littau
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Chris Raymond

Person

Patents Grantslast 30 patents

Silicon filter for photoluminescence metrology

Method for evaluating microstructures on a workpiece based on the o...

Method for evaluating microstructures on a workpiece based on the o...

Line profile asymmetry measurement

Apparatus and method for enhanced critical dimension scatterometry

Line profile asymmetry measurement

Scatterometer having a computer system that reads data from selecte...

Apparatus and method for enhanced critical dimension scatterometry

Determination of center of focus by parameter variability analysis

Determination of center of focus by cross-section analysis

Line profile asymmetry measurement using scatterometry

Structure identification using scattering signatures

Determination of center of focus by diffraction signature analysis

Determination of center of focus by diffraction signature analysis

Patents Applicationslast 30 patents

Silicon Filter for Photoluminescence Metrology

Method for Evaluating Microstructures on a Workpiece Based on the O...

Line Profile Asymmetry Measurement

Method for evaluating microstructures on a workpiece based on the o...

Line Profile Asymmetry Measurement

Apparatus and method for enhanced critical dimension scatterometry

Apparatus and method for enhanced critical dimension scatterometry

Apparatus and method for enhanced critical dimension scatterometry

Apparatuses and methods for enhanced critical dimension scatterometry

Apparatus and method for enhanced critical dimension scatterometry

Apparatus and method for enhanced critical dimension scatterometry

Apparatus and method for enhanced critical dimension scatterometry

Apparatus and method for enhanced critical dimension scatterometry

APPARATUS AND METHODS FOR SCATTEROMETRY OF OPTICAL DEVICES

Determination of center of focus by parameter variability analysis

Determination of center of focus by cross-section analysis

Scatterometric measurement of undercut multi-layer diffracting sign...

Determination of center of focus by diffraction signature analysis

Line profile asymmetry measurment using scatterometry

Structure identification using scattering signatures

DETERMINATION OF CENTER OF FOCUS BY DIFFRACTION SIGNATURE ANALYSIS