Christian Eschbaumer

Person

Schwaig, DE

People

Patents Grantslast 30 patents

Information Patent Grant
Silicon-containing resist for photolithography
- Patent number 7,052,820
- Issue date May 30, 2006
- Infineon Technologies AG
- Jörg Rottstegge
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Process for silylating photoresists in the UV range
- Patent number 7,045,273
- Issue date May 16, 2006
- Infineon Technologies AG
- Jens Ferbitz
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photoresist based on polycondensates and having an increased resolu...
- Patent number 7,041,426
- Issue date May 9, 2006
- Infineon Technologies AG
- Christian Eschbaumer
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Photoresists with reaction anchors for chemical consolidation of re...
- Patent number 7,033,740
- Issue date Apr 25, 2006
- Infineon Technologies AG
- Jörg Rottstegge
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Silicon resist for photolithography at short exposure wavelengths a...
- Patent number 6,974,655
- Issue date Dec 13, 2005
- Infineon Technologies AG
- Jörg Rottstegge
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Negative resist process with simultaneous development and aromatiza...
- Patent number 6,946,236
- Issue date Sep 20, 2005
- Infineon Technologies AG
- Jörg Rottstegge
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Process for sidewall amplification of resist structures and for the...
- Patent number 6,893,972
- Issue date May 17, 2005
- Infineon Technologies AG
- Jörg Rottstegge
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
CHEMICALLY AMPLIFIED PHOTORESIST AND PROCESS FOR STRUCTURING SUBSTI...
- Patent number 6,806,027
- Issue date Oct 19, 2004
- Infineon Technologies AG
- Christoph Hohle
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Negative resist process with simultaneous development and silylation
- Patent number 6,770,423
- Issue date Aug 3, 2004
- Infineon Technologies AG
- Jörg Rottstegge
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Amplification of resist structures of fluorinated resist polymers b...
- Patent number 6,759,184
- Issue date Jul 6, 2004
- Infineon Technologies AG
- Jörg Rottstegge
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC

Patents Applicationslast 30 patents

Information Patent Application
Silicon resist for photolithography at short exposure wavelengths a...
- Publication number 20030148219
- Publication date Aug 7, 2003
- Jorg Rottstegge
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Process for silylating photoresists in the UV range
- Publication number 20030124468
- Publication date Jul 3, 2003
- Jens Ferbitz
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Silicon-containing resist for photolithography
- Publication number 20030108812
- Publication date Jun 12, 2003
- Jorg Rottstegge
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Silylating process for photoresists in the UV region
- Publication number 20030096194
- Publication date May 22, 2003
- Jorg Rottstegge
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Chemically amplified photoresist and process for structuring substi...
- Publication number 20030096190
- Publication date May 22, 2003
- Christoph Hohle
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Process for sidewall amplification of resist structures and for the...
- Publication number 20030091936
- Publication date May 15, 2003
- Jorg Rottstegge
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Photoresists with reaction anchos for chemical consolidation of res...
- Publication number 20030087182
- Publication date May 8, 2003
- Jorg Rottstegge
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Chemically amplified photoresist and process for structuring substr...
- Publication number 20030082483
- Publication date May 1, 2003
- Christoph Hohle
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Negative resist process with simultaneous development and silylation
- Publication number 20030082488
- Publication date May 1, 2003
- Jorg Rottstegge
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Photoresist based on polycondensates and having an increased resolu...
- Publication number 20030082480
- Publication date May 1, 2003
- Christian Eschbaumer
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Negative resist process with simultaneous development and aromatiza...
- Publication number 20030073037
- Publication date Apr 17, 2003
- Jorg Rottstegge
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Amplification of resist structures of fluorinated resist polymers b...
- Publication number 20030073043
- Publication date Apr 17, 2003
- Jorg Rottstegge
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Christian Eschbaumer

Person

Patents Grantslast 30 patents

Silicon-containing resist for photolithography

Process for silylating photoresists in the UV range

Photoresist based on polycondensates and having an increased resolu...

Photoresists with reaction anchors for chemical consolidation of re...

Silicon resist for photolithography at short exposure wavelengths a...

Negative resist process with simultaneous development and aromatiza...

Process for sidewall amplification of resist structures and for the...

CHEMICALLY AMPLIFIED PHOTORESIST AND PROCESS FOR STRUCTURING SUBSTI...

Negative resist process with simultaneous development and silylation

Amplification of resist structures of fluorinated resist polymers b...

Patents Applicationslast 30 patents

Silicon resist for photolithography at short exposure wavelengths a...

Process for silylating photoresists in the UV range

Silicon-containing resist for photolithography

Silylating process for photoresists in the UV region

Chemically amplified photoresist and process for structuring substi...

Process for sidewall amplification of resist structures and for the...

Photoresists with reaction anchos for chemical consolidation of res...

Chemically amplified photoresist and process for structuring substr...

Negative resist process with simultaneous development and silylation

Photoresist based on polycondensates and having an increased resolu...

Negative resist process with simultaneous development and aromatiza...

Amplification of resist structures of fluorinated resist polymers b...