Christian Krueger

Person

Dresden, DE

People

Patents Grantslast 30 patents

Information Patent Grant
Method of manufacturing a semiconductor device by using ion beam te...
- Patent number 11,043,384
- Issue date Jun 22, 2021
- Infineon Technologies AG
- Moriz Jelinek
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Reduction of defect rates in PFET transistors comprising a Si/Ge se...
- Patent number 8,939,765
- Issue date Jan 27, 2015
- GLOBALFOUNDRIES Inc.
- Stephan Kronholz
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Technique for removing resist material after high dose implantation...
- Patent number 7,816,273
- Issue date Oct 19, 2010
- Advanced Micro Devices, Inc.
- Christian Krueger
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of implanting ion species into microstructure products by co...
- Patent number 7,816,656
- Issue date Oct 19, 2010
- Advanced Micro Devices, Inc.
- Christian Krueger
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods of determining characteristics of doped regions on device w...
- Patent number 7,504,838
- Issue date Mar 17, 2009
- Advanced Micro Devices, Inc.
- Zhiyong Zhao
- G01 - MEASURING TESTING
Information Patent Grant
Methods of determining characteristics of doped regions on device w...
- Patent number 7,063,991
- Issue date Jun 20, 2006
- Advanced Micro Devices, Inc.
- Zhiyong Zhao
- G01 - MEASURING TESTING
Information Patent Grant
Advanced ion beam detector for ion implantation tools
- Patent number 7,026,628
- Issue date Apr 11, 2006
- Advanced Micro Devices, Inc.
- Christian Krueger
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of reducing contamination-induced process variations during...
- Patent number 6,949,399
- Issue date Sep 27, 2005
- Advanced Micro Devices, Inc.
- Christian Krueger
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods of forming a transistor having a recessed gate electrode st...
- Patent number 6,897,114
- Issue date May 24, 2005
- Advanced Micro Devices, Inc.
- Christian Krueger
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Advanced ion beam measurement tool for an ion implantation apparatus
- Patent number 6,852,984
- Issue date Feb 8, 2005
- Advanced Micro Devices, Inc.
- Christian Krueger
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
SOI field effect transistor element having a recombination region a...
- Patent number 6,812,074
- Issue date Nov 2, 2004
- Advanced Micro Devices, Inc.
- Karsten Wieczorek
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device having an improved strained surface layer and...
- Patent number 6,808,970
- Issue date Oct 26, 2004
- Advanced Micro Devices, Inc.
- Thomas Feudel
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Implant monitoring using multiple implanting and annealing steps
- Patent number 6,754,553
- Issue date Jun 22, 2004
- Advanced Micro Devices, Inc.
- Karsten Wieczorek
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
SEMICONDUCTOR DEVICE INCLUDING A FIELD STOP REGION
- Publication number 20220406600
- Publication date Dec 22, 2022
- Moriz Jelinek
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor Device and Method of Manufacturing a Semiconductor De...
- Publication number 20190385852
- Publication date Dec 19, 2019
- Moriz Jelinek
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Methods and Systems for Forming Implanted Doped Regions for a Semic...
- Publication number 20130065373
- Publication date Mar 14, 2013
- GLOBALFOUNDRIES INC.
- Stefan Flachowsky
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Reduction of Defect Rates in PFET Transistors Comprising a Si/Ge Se...
- Publication number 20110291163
- Publication date Dec 1, 2011
- GLOBALFOUNDRIES INC.
- Stephan Kronholz
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF IMPLANTING ION SPECIES INTO MICROSTRUCTURE PRODUCTS BY CO...
- Publication number 20090221136
- Publication date Sep 3, 2009
- Christian Krueger
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TECHNIQUE FOR REMOVING RESIST MATERIAL AFTER HIGH DOSE IMPLANTATION...
- Publication number 20080160729
- Publication date Jul 3, 2008
- Christian Krueger
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
System and method for supplying precursor gases to an implantation...
- Publication number 20060093754
- Publication date May 4, 2006
- Christian Krueger
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Technique for adjusting a penetration depth during the implantation...
- Publication number 20050048679
- Publication date Mar 3, 2005
- Christian Krueger
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SOI field effect transistor element having a recombination region a...
- Publication number 20050037548
- Publication date Feb 17, 2005
- Advanced Micro Devices, Inc.
- Karsten Wieczorek
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ADVANCED ION BEAM MEASUREMENT TOOL FOR AN ION IMPLANTATION APPARATUS
- Publication number 20040262532
- Publication date Dec 30, 2004
- Christian Krueger
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Advanced ion beam detector for ion implantation tools
- Publication number 20040262533
- Publication date Dec 30, 2004
- Christian Krueger
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of reducing contamination-induced process variations during...
- Publication number 20040161915
- Publication date Aug 19, 2004
- Christian Krueger
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor device having an improved strained surface layer and...
- Publication number 20040126998
- Publication date Jul 1, 2004
- Thomas Feudel
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Advanced recessed gate transistor and a method of forming the same
- Publication number 20040126965
- Publication date Jul 1, 2004
- Christian Krueger
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SOI field effect transistor element having a recombination region a...
- Publication number 20040000691
- Publication date Jan 1, 2004
- Karsten Wieczorek
- H01 - BASIC ELECTRIC ELEMENTS

Christian Krueger

Person

Patents Grantslast 30 patents

Method of manufacturing a semiconductor device by using ion beam te...

Reduction of defect rates in PFET transistors comprising a Si/Ge se...

Technique for removing resist material after high dose implantation...

Method of implanting ion species into microstructure products by co...

Methods of determining characteristics of doped regions on device w...

Methods of determining characteristics of doped regions on device w...

Advanced ion beam detector for ion implantation tools

Method of reducing contamination-induced process variations during...

Methods of forming a transistor having a recessed gate electrode st...

Advanced ion beam measurement tool for an ion implantation apparatus

SOI field effect transistor element having a recombination region a...

Semiconductor device having an improved strained surface layer and...

Implant monitoring using multiple implanting and annealing steps

Patents Applicationslast 30 patents

SEMICONDUCTOR DEVICE INCLUDING A FIELD STOP REGION

Semiconductor Device and Method of Manufacturing a Semiconductor De...

Methods and Systems for Forming Implanted Doped Regions for a Semic...

Reduction of Defect Rates in PFET Transistors Comprising a Si/Ge Se...

METHOD OF IMPLANTING ION SPECIES INTO MICROSTRUCTURE PRODUCTS BY CO...

TECHNIQUE FOR REMOVING RESIST MATERIAL AFTER HIGH DOSE IMPLANTATION...

System and method for supplying precursor gases to an implantation...

Technique for adjusting a penetration depth during the implantation...

SOI field effect transistor element having a recombination region a...

ADVANCED ION BEAM MEASUREMENT TOOL FOR AN ION IMPLANTATION APPARATUS

Advanced ion beam detector for ion implantation tools

Method of reducing contamination-induced process variations during...

Semiconductor device having an improved strained surface layer and...

Advanced recessed gate transistor and a method of forming the same

SOI field effect transistor element having a recombination region a...