Christian Marinus Leewis

Person

Maastricht, NL

People

Patents Grantslast 30 patents

Information Patent Grant
Method of determining focus, inspection apparatus, patterning devic...
- Patent number 9,939,735
- Issue date Apr 10, 2018
- ASML Netherlands B.V.
- Paul Christiaan Hinnen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of determining focus, inspection apparatus, patterning devic...
- Patent number 9,594,299
- Issue date Mar 14, 2017
- ASML Netherlands B.V.
- Paul Christiaan Hinnen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic focus and dose measurement using a 2-D target
- Patent number 9,436,099
- Issue date Sep 6, 2016
- ASML Netherlands B.V.
- Christian Marinus Leewis
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus for overlay measurement
- Patent number 8,982,328
- Issue date Mar 17, 2015
- ASML Netherlands B.V.
- Henricus Johannes Lambertus Megens
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic focus and dose measurement using a 2-D target
- Patent number 8,891,061
- Issue date Nov 18, 2014
- ASML Netherlands B.V.
- Christian Marinus Leewis
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Inspection method and apparatus, lithographic apparatus, lithograph...
- Patent number 8,848,195
- Issue date Sep 30, 2014
- ASML Netherlands B.V.
- Christian Marinus Leewis
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of measuring a characteristic
- Patent number 8,685,626
- Issue date Apr 1, 2014
- ASML Netherlands B.V.
- Johannes Anna Quaedackers
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of determining a characteristic
- Patent number 8,502,955
- Issue date Aug 6, 2013
- ASML Netherlands B.V.
- Henricus Johannes Lambertus Megens
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
Method of Determining Focus, Inspection Apparatus, Patterning Devic...
- Publication number 20170153554
- Publication date Jun 1, 2017
- ASML NETHERLANDS B.V.
- Paul Christiaan HINNEN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method of Determining Focus, Inspection Apparatus, Patterning Devic...
- Publication number 20150338749
- Publication date Nov 26, 2015
- ASML NETHERLANDS B.V.
- Paul Christiaan HINNEN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Lithographic Focus and Dose Measurement Using A 2-D Target
- Publication number 20140247434
- Publication date Sep 4, 2014
- ASML NETHERLANDS B.V.
- Christian Marinus LEEWIS
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method of Measuring a Characteristic
- Publication number 20140199634
- Publication date Jul 17, 2014
- ASML NETHERLANDS B.V.
- Johannes Anna QUAEDACKERS
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Inspection Method and Apparatus, Lithographic Apparatus, Lithograph...
- Publication number 20120033223
- Publication date Feb 9, 2012
- ASML NETHERLANDS B.V.
- Christian Marinus Leewis
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method and System for Determining a Lithographic Process Parameter
- Publication number 20110295555
- Publication date Dec 1, 2011
- ASML NETHERLANDS B.V.
- Hieronymus Johannus Christiaan Meessen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Lithographic Focus and Dose Measurement Using A 2-D Target
- Publication number 20110249244
- Publication date Oct 13, 2011
- ASML NETHERLANDS B.V.
- Christian Marinus Leewis
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method and Apparatus for Overlay Measurement
- Publication number 20110141450
- Publication date Jun 16, 2011
- ASML NETHERLANDS B.V.
- Henricus Johannes Lambertus Megens
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Producing a Marker Pattern and Measurement of an Exposure-Related P...
- Publication number 20100328636
- Publication date Dec 30, 2010
- ASML NETHERLANDS B.V.
- Johannes Anna Quaedackers
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method of Measuring a Characteristic
- Publication number 20100227280
- Publication date Sep 9, 2010
- ASML NETHERLANDS B.V.
- Johannes Anna Quaedackers
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method of Determining a Characteristic
- Publication number 20100165312
- Publication date Jul 1, 2010
- ASML NETHERLANDS B.V.
- Henricus Johannes Lambertus Megens
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Christian Marinus Leewis

Person

Patents Grantslast 30 patents

Method of determining focus, inspection apparatus, patterning devic...

Method of determining focus, inspection apparatus, patterning devic...

Lithographic focus and dose measurement using a 2-D target

Method and apparatus for overlay measurement

Lithographic focus and dose measurement using a 2-D target

Inspection method and apparatus, lithographic apparatus, lithograph...

Method of measuring a characteristic

Method of determining a characteristic

Patents Applicationslast 30 patents

Method of Determining Focus, Inspection Apparatus, Patterning Devic...

Method of Determining Focus, Inspection Apparatus, Patterning Devic...

Lithographic Focus and Dose Measurement Using A 2-D Target

Method of Measuring a Characteristic

Inspection Method and Apparatus, Lithographic Apparatus, Lithograph...

Method and System for Determining a Lithographic Process Parameter

Lithographic Focus and Dose Measurement Using A 2-D Target

Method and Apparatus for Overlay Measurement

Producing a Marker Pattern and Measurement of an Exposure-Related P...

Method of Measuring a Characteristic

Method of Determining a Characteristic