Christian Wagner

Person

Asten, DE

People

Patents Grantslast 30 patents

Information Patent Grant
Optical arrangement and projection exposure system for microlithogr...
- Patent number 7,274,430
- Issue date Sep 25, 2007
- Carl Zeiss SMT AG
- Christian Wagner
- G02 - OPTICS
Information Patent Grant
Projection exposure system for microlithography and method for gene...
- Patent number 7,113,260
- Issue date Sep 26, 2006
- Carl Zeiss SMT AG
- Karl-Heinz Schuster
- G02 - OPTICS
Information Patent Grant
Projection exposure system for microlithography and method for gene...
- Patent number 6,972,831
- Issue date Dec 6, 2005
- Carl-Zeiss-Stiftung
- Karl-Heinz Schuster
- G02 - OPTICS
Information Patent Grant
Projection exposure system for microlithography and method for gene...
- Patent number 6,950,174
- Issue date Sep 27, 2005
- Carl-Zeiss-Stiftung
- Karl-Heinz Schuster
- G02 - OPTICS
Information Patent Grant
Projection exposure system for microlithography and method for gene...
- Patent number 6,930,758
- Issue date Aug 16, 2005
- Carl Zeiss SMT AG
- Karl-Heinz Schuster
- G02 - OPTICS
Information Patent Grant
Reticle with crystal support material and pellicle
- Patent number 6,825,913
- Issue date Nov 30, 2004
- Carl Zeiss SMT AG
- Karl-Heinz Schuster
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Projection exposure system for microlithography and method for gene...
- Patent number 6,822,729
- Issue date Nov 23, 2004
- Carl-Zeiss-Stiftung
- Karl-Heinz Schuster
- G02 - OPTICS
Information Patent Grant
Optical arrangement
- Patent number 6,781,668
- Issue date Aug 24, 2004
- Carl-Zeiss-Stiftung
- Karl-Heinz Schuster
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Projection exposure system having a reflective reticle
- Patent number 6,590,718
- Issue date Jul 8, 2003
- Carl-Zeiss-Stiftung
- Gerd Fürter
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optical system
- Patent number 6,583,850
- Issue date Jun 24, 2003
- Carl-Zeiss-Stiftung
- Wolfgang Hummel
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optical systems and methods of compensating rotationally non-symmet...
- Patent number 6,522,392
- Issue date Feb 18, 2003
- Carl-Zeiss-Stiftung
- Werner Müller-Rissmann
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optical arrangement having improved temperature distribution within...
- Patent number 6,521,877
- Issue date Feb 18, 2003
- Carl-Zeiss-Stiftung
- Werner Müller-Rissmann
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optical arrangement
- Patent number 6,504,597
- Issue date Jan 7, 2003
- Carl-Zeiss-Stiftung
- Karl-Heinz Schuster
- G02 - OPTICS
Information Patent Grant
Optical arrangement
- Patent number 6,466,382
- Issue date Oct 15, 2002
- Carl-Zeiss-Stiftung
- Werner Müller-Rissmann
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optical system, especially a projection light facility for microlit...
- Patent number 6,388,823
- Issue date May 14, 2002
- Carl-Zeiss-Stiftung trading as Carl Zeiss
- Erwin Gaber
- G02 - OPTICS
Information Patent Grant
Optical system with polarization compensator
- Patent number 6,252,712
- Issue date Jun 26, 2001
- Carl-Zeiss-Stiftung
- Gerhard Fürter
- G02 - OPTICS

Patents Applicationslast 30 patents

Information Patent Application
CATADIOPTRIC PROJECTION OBJECTIVE WITH ADAPTIVE MIRROR AND PROJECTI...
- Publication number 20070012871
- Publication date Jan 18, 2007
- Christian Wagner
- G02 - OPTICS
Information Patent Application
Projection exposure system for microlithography and method for gene...
- Publication number 20060023193
- Publication date Feb 2, 2006
- Karl-Heinz Schuster
- G02 - OPTICS
Information Patent Application
Projection exposure system for microlithography and method for gene...
- Publication number 20050083506
- Publication date Apr 21, 2005
- Carl-Zeiss-Stiftung
- Karl-Heinz Schuster
- G02 - OPTICS
Information Patent Application
Projection exposure system for microlithography and method for gene...
- Publication number 20050083507
- Publication date Apr 21, 2005
- Carl-Zeiss-Stiftung
- Karl-Heinz Schuster
- G02 - OPTICS
Information Patent Application
Optical arrangement and projection exposure system for microlithogr...
- Publication number 20040207825
- Publication date Oct 21, 2004
- Christian Wagner
- G02 - OPTICS
Information Patent Application
OPTICAL ARRANGEMENT
- Publication number 20020126400
- Publication date Sep 12, 2002
- Wemer Muller-Rissmann
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Optical arrangement and projection exposure system for microlithogr...
- Publication number 20020008858
- Publication date Jan 24, 2002
- Christian Wagner
- G02 - OPTICS
Information Patent Application
Projection exposure system having a reflective reticle
- Publication number 20010022691
- Publication date Sep 20, 2001
- Gerd Furter
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Projection exposure system for microlithography and method for gene...
- Publication number 20010019404
- Publication date Sep 6, 2001
- Karl-Heinz Schuster
- G02 - OPTICS
Information Patent Application
Optical arrangement
- Publication number 20010019403
- Publication date Sep 6, 2001
- Karl-Heinz Schuster
- G02 - OPTICS
Information Patent Application
Optical system
- Publication number 20010008440
- Publication date Jul 19, 2001
- Wolfgang Hummel
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Optical arrangement
- Publication number 20010006412
- Publication date Jul 5, 2001
- Schuster Karl-Heinz
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Christian Wagner

Person

Patents Grantslast 30 patents

Optical arrangement and projection exposure system for microlithogr...

Projection exposure system for microlithography and method for gene...

Projection exposure system for microlithography and method for gene...

Projection exposure system for microlithography and method for gene...

Projection exposure system for microlithography and method for gene...

Reticle with crystal support material and pellicle

Projection exposure system for microlithography and method for gene...

Optical arrangement

Projection exposure system having a reflective reticle

Optical system

Optical systems and methods of compensating rotationally non-symmet...

Optical arrangement having improved temperature distribution within...

Optical arrangement

Optical arrangement

Optical system, especially a projection light facility for microlit...

Optical system with polarization compensator

Patents Applicationslast 30 patents

CATADIOPTRIC PROJECTION OBJECTIVE WITH ADAPTIVE MIRROR AND PROJECTI...

Projection exposure system for microlithography and method for gene...

Projection exposure system for microlithography and method for gene...

Projection exposure system for microlithography and method for gene...

Optical arrangement and projection exposure system for microlithogr...

OPTICAL ARRANGEMENT

Optical arrangement and projection exposure system for microlithogr...

Projection exposure system having a reflective reticle

Projection exposure system for microlithography and method for gene...

Optical arrangement

Optical system

Optical arrangement