Christian Wagner

Person

Duizel, NL

People

Patents Grantslast 30 patents

Information Patent Grant
Radiation source
- Patent number 9,516,732
- Issue date Dec 6, 2016
- ASML Netherlands B.V.
- Christian Wagner
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Illumination system, lithographic apparatus and method of forming a...
- Patent number 9,134,629
- Issue date Sep 15, 2015
- ASML Netherlands B.V.
- Erik Roelof Loopstra
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Radiation source
- Patent number 9,119,280
- Issue date Aug 25, 2015
- ASML Netherlands B.V.
- Antonius Theodorus Wilhelmus Kempen
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Immersion lithographic apparatus and device manufacturing method wi...
- Patent number 8,953,141
- Issue date Feb 10, 2015
- ASML Netherlands B.V.
- Martinus Hendrikus Antonius Leenders
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of detecting a particle and a lithographic apparatus
- Patent number 8,405,825
- Issue date Mar 26, 2013
- ASML Netherlands B.V.
- Luigi Scaccabarozzi
- G01 - MEASURING TESTING
Information Patent Grant
Polarized radiation in lithographic apparatus and device manufactur...
- Patent number 7,929,116
- Issue date Apr 19, 2011
- ASML Netherlands B.V.
- Christian Wagner
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus and device manufacturing method
- Patent number 7,859,647
- Issue date Dec 28, 2010
- ASML Holding N.V.
- Arno Jan Bleeker
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus, device manufacturing method, calibration me...
- Patent number 7,663,741
- Issue date Feb 16, 2010
- ASML Netherlands B.V.
- Hans Van Der Laan
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optical system and method for improving imaging properties thereof
- Patent number 7,605,914
- Issue date Oct 20, 2009
- Carl Zeiss SMT AG
- Thomas Stammler
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Objective with fluoride crystal lenses
- Patent number 7,382,536
- Issue date Jun 3, 2008
- Carl Zeiss SMT AG
- Daniel Krähmer
- G02 - OPTICS
Information Patent Grant
Polarized radiation in lithographic apparatus and device manufactur...
- Patent number 7,345,740
- Issue date Mar 18, 2008
- ASML Netherlands B.V.
- Christian Wagner
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Different polarization in cross-section of a radiation beam in a li...
- Patent number 7,317,512
- Issue date Jan 8, 2008
- ASML Netherlands B.V.
- Wilhelmus Petrus De Boeij
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Polarized radiation in lithographic apparatus and device manufactur...
- Patent number 7,312,852
- Issue date Dec 25, 2007
- ASML Netherlands B.V.
- Christian Wagner
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus and device manufacturing method
- Patent number 7,221,430
- Issue date May 22, 2007
- ASML Netherlands B.V.
- Hendrikus Alphonsus Ludovicus Van Dijck
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus and device manufacturing method
- Patent number 7,209,213
- Issue date Apr 24, 2007
- ASML Netherlands B.V.
- Christian Wagner
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Objective with fluoride crystal lenses
- Patent number 7,180,667
- Issue date Feb 20, 2007
- Carl Zeiss SMT AG
- Daniel Krähmer
- G02 - OPTICS
Information Patent Grant
Projection lens and microlithographic projection exposure apparatus
- Patent number 7,170,585
- Issue date Jan 30, 2007
- Carl Zeiss SMT AG
- Martin Brunotte
- G02 - OPTICS
Information Patent Grant
Objective with fluoride crystal lenses
- Patent number 7,145,720
- Issue date Dec 5, 2006
- Carl Zeiss SMT AG
- Daniel Krähmer
- G02 - OPTICS
Information Patent Grant
Objective with fluoride crystal lenses
- Patent number 7,126,765
- Issue date Oct 24, 2006
- Carl Zeiss SMT AG
- Daniel Krähmer
- G02 - OPTICS
Information Patent Grant
Method of and preventing focal plane anomalies in the focal plane o...
- Patent number 7,068,349
- Issue date Jun 27, 2006
- ASML Netherlands B.V.
- Ingrid Minnaert-Janssen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Projection lens and microlithographic projection exposure apparatus
- Patent number 6,879,379
- Issue date Apr 12, 2005
- Carl Zeiss SMT AG
- Martin Brunotte
- G02 - OPTICS
Information Patent Grant
Projection exposure apparatus for microlithography
- Patent number 6,788,471
- Issue date Sep 7, 2004
- Carl Zeiss Semiconductor Manufacturing Technologies AG
- Christian Wagner
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
Radiation Source
- Publication number 20140211184
- Publication date Jul 31, 2014
- ASML NETHERLANDS B.V.
- Christian Wagner
- G02 - OPTICS
Information Patent Application
RADIATION SOURCE
- Publication number 20140160453
- Publication date Jun 12, 2014
- ASML NETHERLANDS B.V.
- Antonius Theodorus Wilhelmus Kempen
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
ILLUMINATION SYSTEM, LITHOGRAPHIC APPARATUS AND METHOD OF FORMING A...
- Publication number 20120013882
- Publication date Jan 19, 2012
- ASML NETHERLANDS B.V.
- Erik Roelof Loopstra
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method of Detecting a Particle and a Lithographic Apparatus
- Publication number 20110149276
- Publication date Jun 23, 2011
- ASML NETHERLANDS B.V.
- Luigi SCACCABAROZZI
- G01 - MEASURING TESTING
Information Patent Application
OPTICAL SYSTEM AND METHOD FOR IMPROVING IMAGING PROPERTIES THEREOF
- Publication number 20090225308
- Publication date Sep 10, 2009
- Carl Zeiss SMT AG
- Thomas Stammler
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
IMMERSION LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
- Publication number 20090161089
- Publication date Jun 25, 2009
- ASML NETHERLANDS B.V.
- Martinus Hendrikus Antonius LEENDERS
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OPTICAL ARRANGEMENT AND PROJECTION EXPOSURE SYSTEM FOR MICROLITHOGR...
- Publication number 20080212052
- Publication date Sep 4, 2008
- Carl Zeiss SMT AG
- Christian Wagner
- G02 - OPTICS
Information Patent Application
Polarized radiation in lithographic apparatus and device manufactur...
- Publication number 20080143992
- Publication date Jun 19, 2008
- ASML NETHERLANDS B.V.
- Christian Wagner
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Lithographic Apparatus and Device Manufacturing Method
- Publication number 20080137053
- Publication date Jun 12, 2008
- ASML NETHERLANDS B.V.
- Arno Jan BLEEKER
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CATADIOPTRIC PROJECTION OBJECTIVE WITH ADAPTIVE MIRROR AND PROJECTI...
- Publication number 20080055740
- Publication date Mar 6, 2008
- Carl Zeiss SMT AG
- Christian Wagner
- G02 - OPTICS
Information Patent Application
Polarized radiation in lithographic apparatus and device manufactur...
- Publication number 20070008511
- Publication date Jan 11, 2007
- ASML NETHERLANDS B.V.
- Wilhelmus Petrus De Boeij
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Objective with fluoride crystal lenses
- Publication number 20060171020
- Publication date Aug 3, 2006
- Carl Zeiss SMT AG
- Daniel Krahmer
- G02 - OPTICS
Information Patent Application
Polarized radiation in lithographic apparatus and device manufactur...
- Publication number 20060139611
- Publication date Jun 29, 2006
- ASML NETHERLANDS B.V.
- Christian Wagner
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Polarized radiation in lithographic apparatus and device manufactur...
- Publication number 20060139612
- Publication date Jun 29, 2006
- ASML NETHERLANDS B.V.
- Christian Wagner
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Lithographic apparatus and device manufacturing method
- Publication number 20060138349
- Publication date Jun 29, 2006
- ASML NETHERLANDS B.V.
- Arno Jan Bleeker
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Lithographic apparatus and device manufacturing method
- Publication number 20060077369
- Publication date Apr 13, 2006
- ASML NETHERLANDS B.V.
- Christian Wagner
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Lithographic apparatus, device manufacturing method, calibration me...
- Publication number 20060046165
- Publication date Mar 2, 2006
- ASML NETHERLANDS B.V.
- Hans Van Der Laan
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Projection lens and microlithographic projection exposure apparatus
- Publication number 20050264786
- Publication date Dec 1, 2005
- Martin Brunotte
- G02 - OPTICS
Information Patent Application
Optical imaging system, in particular catadioptric reduction objective
- Publication number 20050254120
- Publication date Nov 17, 2005
- Carl Zeiss SMT AG
- Christoph Zaczek
- G02 - OPTICS
Information Patent Application
Lithographic apparatus and device manufacturing method
- Publication number 20050254024
- Publication date Nov 17, 2005
- ASML NETHERLANDS B.V.
- Hendrikus Robertus Marie Van Greevenbroek
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PROJECTION LENS AND MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS
- Publication number 20050134967
- Publication date Jun 23, 2005
- Carl Zeiss SMT AG
- Martin Brunotte
- G02 - OPTICS
Information Patent Application
Objective with fluoride crystal lenses
- Publication number 20050122594
- Publication date Jun 9, 2005
- Carl Zeiss SMT AG, a Germany corporation
- Daniel Krahmer
- G02 - OPTICS
Information Patent Application
Method of and preventing focal plane anomalies in the focal plane o...
- Publication number 20040263811
- Publication date Dec 30, 2004
- ASML NETHERLANDS B.V.
- Ingrid Minnaert-Janssen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Objective with fluoride crystal lenses
- Publication number 20040190151
- Publication date Sep 30, 2004
- Daniel Krahmer
- G02 - OPTICS
Information Patent Application
Projection lens and microlithographic projection exposure apparatus
- Publication number 20040150806
- Publication date Aug 5, 2004
- Martin Brunotte
- G02 - OPTICS
Information Patent Application
Objective with fluoride crystal lenses
- Publication number 20040105170
- Publication date Jun 3, 2004
- Carl Zeiss SMT AG
- Daniel Krahmer
- G02 - OPTICS
Information Patent Application
Projection exposure apparatus for microlithography
- Publication number 20030086183
- Publication date May 8, 2003
- Christian Wagner
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Christian Wagner

Person

Patents Grantslast 30 patents

Radiation source

Illumination system, lithographic apparatus and method of forming a...

Radiation source

Immersion lithographic apparatus and device manufacturing method wi...

Method of detecting a particle and a lithographic apparatus

Polarized radiation in lithographic apparatus and device manufactur...

Lithographic apparatus and device manufacturing method

Lithographic apparatus, device manufacturing method, calibration me...

Optical system and method for improving imaging properties thereof

Objective with fluoride crystal lenses

Polarized radiation in lithographic apparatus and device manufactur...

Different polarization in cross-section of a radiation beam in a li...

Polarized radiation in lithographic apparatus and device manufactur...

Lithographic apparatus and device manufacturing method

Lithographic apparatus and device manufacturing method

Objective with fluoride crystal lenses

Projection lens and microlithographic projection exposure apparatus

Objective with fluoride crystal lenses

Objective with fluoride crystal lenses

Method of and preventing focal plane anomalies in the focal plane o...

Projection lens and microlithographic projection exposure apparatus

Projection exposure apparatus for microlithography

Patents Applicationslast 30 patents

Radiation Source

RADIATION SOURCE

ILLUMINATION SYSTEM, LITHOGRAPHIC APPARATUS AND METHOD OF FORMING A...

Method of Detecting a Particle and a Lithographic Apparatus

OPTICAL SYSTEM AND METHOD FOR IMPROVING IMAGING PROPERTIES THEREOF

IMMERSION LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD

OPTICAL ARRANGEMENT AND PROJECTION EXPOSURE SYSTEM FOR MICROLITHOGR...

Polarized radiation in lithographic apparatus and device manufactur...

Lithographic Apparatus and Device Manufacturing Method

CATADIOPTRIC PROJECTION OBJECTIVE WITH ADAPTIVE MIRROR AND PROJECTI...

Polarized radiation in lithographic apparatus and device manufactur...

Objective with fluoride crystal lenses

Polarized radiation in lithographic apparatus and device manufactur...

Polarized radiation in lithographic apparatus and device manufactur...

Lithographic apparatus and device manufacturing method

Lithographic apparatus and device manufacturing method

Lithographic apparatus, device manufacturing method, calibration me...

Projection lens and microlithographic projection exposure apparatus

Optical imaging system, in particular catadioptric reduction objective

Lithographic apparatus and device manufacturing method

PROJECTION LENS AND MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS

Objective with fluoride crystal lenses

Method of and preventing focal plane anomalies in the focal plane o...

Objective with fluoride crystal lenses

Projection lens and microlithographic projection exposure apparatus

Objective with fluoride crystal lenses

Projection exposure apparatus for microlithography