Christianus Wilhelmus Johannes BERENDSEN

Person

Roermond, NL

People

Patents Grantslast 30 patents

Information Patent Grant
Guiding device and associated system
- Patent number 11,822,252
- Issue date Nov 21, 2023
- ASML Netherlands B.V.
- Dzmitry Labetski
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Process tool and an inspection method
- Patent number 11,720,032
- Issue date Aug 8, 2023
- ASML Netherlands B.V.
- Raphael Nico Johan Stegen
- G01 - MEASURING TESTING
Information Patent Grant
Lithographic apparatus and an object positioning system
- Patent number RE49142
- Issue date Jul 19, 2022
- ASML Netherlands B.V.
- Adrianus Hendrik Koevoets
Information Patent Grant
Guiding device and associated system
- Patent number 10,955,749
- Issue date Mar 23, 2021
- ASML Netherlands B.V.
- Dzmitry Labetski
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for removing photosensitive material on a substrate
- Patent number 10,948,825
- Issue date Mar 16, 2021
- ASML Netherlands B.V.
- Christianus Wilhelmus Johannes Berendsen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of controlling debris in an EUV light source
- Patent number 10,490,313
- Issue date Nov 26, 2019
- ASML Netherlands B.V.
- Alexander I. Ershov
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Immersion lithographic apparatus
- Patent number 10,216,095
- Issue date Feb 26, 2019
- ASML Netherlands B.V.
- Michel Riepen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Apparatus for and method of controlling debris in an EUV light source
- Patent number 10,128,017
- Issue date Nov 13, 2018
- ASML Netherlands B.V.
- Alexander I. Ershov
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Lithographic apparatus and method of manufacturing a lithographic a...
- Patent number 10,018,926
- Issue date Jul 10, 2018
- ASML Netherlands, B.V.
- Rogier Hendrikus Magdalena Cortie
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for compensating for an exposure error, a device manufacturi...
- Patent number 9,983,489
- Issue date May 29, 2018
- ASML Netherlands B.V.
- Christianus Wilhelmus Johannes Berendsen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus and an object positioning system
- Patent number 9,939,738
- Issue date Apr 10, 2018
- ASML Netherlands B.V.
- Adrianus Hendrik Koevoets
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
GUIDING DEVICE AND ASSOCIATED SYSTEM
- Publication number 20240085796
- Publication date Mar 14, 2024
- ASML NETHERLANDS B.V.
- Dzmitry LABETSKI
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
A FLUID HANDLING SYSTEM, METHOD AND LITHOGRAPHIC APPARATUS
- Publication number 20230333480
- Publication date Oct 19, 2023
- ASML NETHERLANDS B.V.
- Christianus Wilhelmus Johannes BERENDSEN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
A FLUID HANDLING SYSTEM, METHOD AND LITHOGRAPHIC APPARATUS
- Publication number 20230259037
- Publication date Aug 17, 2023
- ASML NETHERLANDS B.V.
- Cornelius Maria ROPS
- B06 - GENERATING OR TRANSMITTING MECHANICAL VIBRATIONS IN GENERAL
Information Patent Application
A PROCESS TOOL AND AN INSPECTION METHOD
- Publication number 20210349397
- Publication date Nov 11, 2021
- ASML NETHERLANDS B.V.
- Raphael Nico Johan STEGEN
- G01 - MEASURING TESTING
Information Patent Application
GUIDING DEVICE AND ASSOCIATED SYSTEM
- Publication number 20210141311
- Publication date May 13, 2021
- ASML NETHERLANDS B.V.
- Dzmitry LABETSKI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR REMOVING PHOTOSENSITIVE MATERIAL ON A SUBSTRATE
- Publication number 20200166845
- Publication date May 28, 2020
- ASML NETHERLANDS B.V.
- Christianus Wilhelmus Johannes BERENDSEN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
GUIDING DEVICE AND ASSOCIATED SYSTEM
- Publication number 20200089124
- Publication date Mar 19, 2020
- ASML NETHERLANDS B.V.
- Dzmitry LABETSKI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF CONTROLLING DEBRIS IN AN EUV LIGHT SOURCE
- Publication number 20190080811
- Publication date Mar 14, 2019
- ASML NETHERLANDS B.V.
- Alexander I. Ershov
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Application
APPARATUS FOR AND METHOD OF CONTROLLING DEBRIS IN AN EUV LIGHT SOURCE
- Publication number 20180330841
- Publication date Nov 15, 2018
- ASML NETHERLANDS B.V.
- Alexander I. Ershov
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
LITHOGRAPHIC APPARATUS AND METHOD OF MANUFACTURING A LITHOGRAPHIC A...
- Publication number 20180067398
- Publication date Mar 8, 2018
- Rogier Hendrikus Magdalena CORTIE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
A LITHOGRAPHIC APPARATUS AND AN OBJECT POSITIONING SYSTEM
- Publication number 20170212429
- Publication date Jul 27, 2017
- ASML NETHERLANDS B.V.
- Adrianus Hendrik KOEVOETS
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method For Compensating for an Exposure Error, a Device Manufacturi...
- Publication number 20170115578
- Publication date Apr 27, 2017
- ASML NETHERLANDS B.V.
- Christianus Wilhelmus Johannes BERENDSEN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
IMMERSION LITHOGRAPHIC APPARATUS
- Publication number 20160195821
- Publication date Jul 7, 2016
- ASML NETHERLANDS B.V.
- Michel RIEPEN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Christianus Wilhelmus Johannes BERENDSEN

Person

Patents Grantslast 30 patents

Guiding device and associated system

Process tool and an inspection method

Lithographic apparatus and an object positioning system

Guiding device and associated system

Method for removing photosensitive material on a substrate

Method of controlling debris in an EUV light source

Immersion lithographic apparatus

Apparatus for and method of controlling debris in an EUV light source

Lithographic apparatus and method of manufacturing a lithographic a...

Method for compensating for an exposure error, a device manufacturi...

Lithographic apparatus and an object positioning system

Patents Applicationslast 30 patents

GUIDING DEVICE AND ASSOCIATED SYSTEM

A FLUID HANDLING SYSTEM, METHOD AND LITHOGRAPHIC APPARATUS

A FLUID HANDLING SYSTEM, METHOD AND LITHOGRAPHIC APPARATUS

A PROCESS TOOL AND AN INSPECTION METHOD

GUIDING DEVICE AND ASSOCIATED SYSTEM

METHOD FOR REMOVING PHOTOSENSITIVE MATERIAL ON A SUBSTRATE

GUIDING DEVICE AND ASSOCIATED SYSTEM

METHOD OF CONTROLLING DEBRIS IN AN EUV LIGHT SOURCE

APPARATUS FOR AND METHOD OF CONTROLLING DEBRIS IN AN EUV LIGHT SOURCE

LITHOGRAPHIC APPARATUS AND METHOD OF MANUFACTURING A LITHOGRAPHIC A...

A LITHOGRAPHIC APPARATUS AND AN OBJECT POSITIONING SYSTEM

Method For Compensating for an Exposure Error, a Device Manufacturi...

IMMERSION LITHOGRAPHIC APPARATUS