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Christine Corinne Mattheus
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Veldhoven, NL
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Patents Grants
last 30 patents
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Patent Grant
Lithographic focus and dose measurement using a 2-D target
Patent number
9,436,099
Issue date
Sep 6, 2016
ASML Netherlands B.V.
Christian Marinus Leewis
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
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Patent Grant
Lithographic focus and dose measurement using a 2-D target
Patent number
8,891,061
Issue date
Nov 18, 2014
ASML Netherlands B.V.
Christian Marinus Leewis
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
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last 30 patents
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Patent Application
Lithographic Focus and Dose Measurement Using A 2-D Target
Publication number
20140247434
Publication date
Sep 4, 2014
ASML NETHERLANDS B.V.
Christian Marinus LEEWIS
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
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Patent Application
Method and System for Determining a Lithographic Process Parameter
Publication number
20110295555
Publication date
Dec 1, 2011
ASML NETHERLANDS B.V.
Hieronymus Johannus Christiaan Meessen
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
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Patent Application
Lithographic Focus and Dose Measurement Using A 2-D Target
Publication number
20110249244
Publication date
Oct 13, 2011
ASML NETHERLANDS B.V.
Christian Marinus Leewis
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY