Christof Bodendorf

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Muenchen, DE

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Patents Grantslast 30 patents

Information Patent Grant
Method for optimizing and method for producing a layout for a mask,...
- Patent number 6,745,380
- Issue date Jun 1, 2004
- Infineon Technologies AG
- Christof Tilmann Bodendorf
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
Method of Correcting Etch and Lithographic Processes
- Publication number 20090300572
- Publication date Dec 3, 2009
- Martin Keck
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method of Performing Proximity Correction
- Publication number 20090204936
- Publication date Aug 13, 2009
- Werner Jacobs
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method for producing a mask layout avoiding imaging errors for a mask
- Publication number 20060177744
- Publication date Aug 10, 2006
- Christof Bodendorf
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method for producing for a mask a mask layout which avoids aberrations
- Publication number 20050120326
- Publication date Jun 2, 2005
- Infineon Technolgies AG
- Armin Semmler
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method for optimizing and method for producing a layout for a mask,...
- Publication number 20030046654
- Publication date Mar 6, 2003
- Christof Tilmann Bodendorf
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY