Christof JALICS

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Heidenheim, DE

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Patents Grantslast 30 patents

Information Patent Grant
Method for repairing reflective optical elements for EUV lithography
- Patent number 11,099,484
- Issue date Aug 24, 2021
- Carl Zeiss SMT GmbH
- Robert Meier
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Reflective optical element for EUV lithography
- Patent number 10,649,340
- Issue date May 12, 2020
- Carl Zeiss SMT GmbH
- Dirk Heinrich Ehm
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING

Patents Applicationslast 30 patents

Information Patent Application
METHOD FOR REPAIRING REFLECTIVE OTPICAL ELEMENTS FOR EUV LITHOGRAPHY
- Publication number 20190302628
- Publication date Oct 3, 2019
- Carl Zeiss SMT GMBH
- Robert MEIER
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
REFLECTIVE OPTICAL ELEMENT FOR EUV LITHOGRAPHY
- Publication number 20190171108
- Publication date Jun 6, 2019
- Carl Zeiss SMT GMBH
- Dirk Heinrich EHM
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY