Christoph Hohle

Person

Bubenreuth, DE

People

Patents Grantslast 30 patents

Information Patent Grant
Electromechanical component, electromechanical component arrangemen...
- Patent number 11,079,411
- Issue date Aug 3, 2021
- Fraunhofer-Gesellschaft zur Forderung der Angewandten Forschung E.V.
- Linus Elsäber
- G01 - MEASURING TESTING
Information Patent Grant
Method for multiple irradiation of a resist
- Patent number 8,227,177
- Issue date Jul 24, 2012
- Infineon Technologies AG
- Kang-Hoon Choi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Polymers based on cinnamic acid as a bottom antireflective coating...
- Patent number 7,405,028
- Issue date Jul 29, 2008
- Infineon Technologies, AG
- Christoph Hohle
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photoresist suitable for use in 157 nm photolithography and includi...
- Patent number 7,169,531
- Issue date Jan 30, 2007
- Infineon Technologies, AG
- Christoph Hohle
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Silicon-containing resist for photolithography
- Patent number 7,052,820
- Issue date May 30, 2006
- Infineon Technologies AG
- Jörg Rottstegge
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Process for silylating photoresists in the UV range
- Patent number 7,045,273
- Issue date May 16, 2006
- Infineon Technologies AG
- Jens Ferbitz
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photoresist based on polycondensates and having an increased resolu...
- Patent number 7,041,426
- Issue date May 9, 2006
- Infineon Technologies AG
- Christian Eschbaumer
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Photoresists with reaction anchors for chemical consolidation of re...
- Patent number 7,033,740
- Issue date Apr 25, 2006
- Infineon Technologies AG
- Jörg Rottstegge
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Silicon resist for photolithography at short exposure wavelengths a...
- Patent number 6,974,655
- Issue date Dec 13, 2005
- Infineon Technologies AG
- Jörg Rottstegge
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Process for sidewall amplification of resist structures and for the...
- Patent number 6,893,972
- Issue date May 17, 2005
- Infineon Technologies AG
- Jörg Rottstegge
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
CHEMICALLY AMPLIFIED PHOTORESIST AND PROCESS FOR STRUCTURING SUBSTI...
- Patent number 6,806,027
- Issue date Oct 19, 2004
- Infineon Technologies AG
- Christoph Hohle
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Negative resist process with simultaneous development and silylation
- Patent number 6,770,423
- Issue date Aug 3, 2004
- Infineon Technologies AG
- Jörg Rottstegge
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Amplification of resist structures of fluorinated resist polymers b...
- Patent number 6,759,184
- Issue date Jul 6, 2004
- Infineon Technologies AG
- Jörg Rottstegge
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC

Patents Applicationslast 30 patents

Information Patent Application
Electromechanical component, electromechanical component arrangemen...
- Publication number 20190086446
- Publication date Mar 21, 2019
- Fraunhofer-Gesellschaft aur Fõrderung der angewandten Forschung e.V.
- Linus ELSÄßER
- G01 - MEASURING TESTING
Information Patent Application
Lithography Apparatus, Masks for Non-Telecentric Exposure and Metho...
- Publication number 20090097004
- Publication date Apr 16, 2009
- QIMONDA AG
- Sven Trogisch
- B82 - NANO-TECHNOLOGY
Information Patent Application
Process and a device for creating a pattern in a photoresist layer
- Publication number 20080003521
- Publication date Jan 3, 2008
- Klaus Elian
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method for Multiple Irradiation of a Resist
- Publication number 20070264595
- Publication date Nov 15, 2007
- Kang-Hoon Choi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method for forming a lithography mask
- Publication number 20060105274
- Publication date May 18, 2006
- Karl Kragler
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Photoresist suitable for use in 157 nm photolithography and includi...
- Publication number 20050170279
- Publication date Aug 4, 2005
- Christoph Hohle
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Polymers based on cinnamic acid as a bottom antireflective coating...
- Publication number 20050170283
- Publication date Aug 4, 2005
- Christoph Hohle
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Silicon resist for photolithography at short exposure wavelengths a...
- Publication number 20030148219
- Publication date Aug 7, 2003
- Jorg Rottstegge
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Process for silylating photoresists in the UV range
- Publication number 20030124468
- Publication date Jul 3, 2003
- Jens Ferbitz
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Silicon-containing resist for photolithography
- Publication number 20030108812
- Publication date Jun 12, 2003
- Jorg Rottstegge
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Silylating process for photoresists in the UV region
- Publication number 20030096194
- Publication date May 22, 2003
- Jorg Rottstegge
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Chemically amplified photoresist and process for structuring substi...
- Publication number 20030096190
- Publication date May 22, 2003
- Christoph Hohle
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Process for sidewall amplification of resist structures and for the...
- Publication number 20030091936
- Publication date May 15, 2003
- Jorg Rottstegge
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Photoresists with reaction anchos for chemical consolidation of res...
- Publication number 20030087182
- Publication date May 8, 2003
- Jorg Rottstegge
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Chemically amplified photoresist and process for structuring substr...
- Publication number 20030082483
- Publication date May 1, 2003
- Christoph Hohle
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Negative resist process with simultaneous development and silylation
- Publication number 20030082488
- Publication date May 1, 2003
- Jorg Rottstegge
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Photoresist based on polycondensates and having an increased resolu...
- Publication number 20030082480
- Publication date May 1, 2003
- Christian Eschbaumer
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Amplification of resist structures of fluorinated resist polymers b...
- Publication number 20030073043
- Publication date Apr 17, 2003
- Jorg Rottstegge
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Christoph Hohle

Person

Patents Grantslast 30 patents

Electromechanical component, electromechanical component arrangemen...

Method for multiple irradiation of a resist

Polymers based on cinnamic acid as a bottom antireflective coating...

Photoresist suitable for use in 157 nm photolithography and includi...

Silicon-containing resist for photolithography

Process for silylating photoresists in the UV range

Photoresist based on polycondensates and having an increased resolu...

Photoresists with reaction anchors for chemical consolidation of re...

Silicon resist for photolithography at short exposure wavelengths a...

Process for sidewall amplification of resist structures and for the...

CHEMICALLY AMPLIFIED PHOTORESIST AND PROCESS FOR STRUCTURING SUBSTI...

Negative resist process with simultaneous development and silylation

Amplification of resist structures of fluorinated resist polymers b...

Patents Applicationslast 30 patents

Electromechanical component, electromechanical component arrangemen...

Lithography Apparatus, Masks for Non-Telecentric Exposure and Metho...

Process and a device for creating a pattern in a photoresist layer

Method for Multiple Irradiation of a Resist

Method for forming a lithography mask

Photoresist suitable for use in 157 nm photolithography and includi...

Polymers based on cinnamic acid as a bottom antireflective coating...

Silicon resist for photolithography at short exposure wavelengths a...

Process for silylating photoresists in the UV range

Silicon-containing resist for photolithography

Silylating process for photoresists in the UV region

Chemically amplified photoresist and process for structuring substi...

Process for sidewall amplification of resist structures and for the...

Photoresists with reaction anchos for chemical consolidation of res...

Chemically amplified photoresist and process for structuring substr...

Negative resist process with simultaneous development and silylation

Photoresist based on polycondensates and having an increased resolu...

Amplification of resist structures of fluorinated resist polymers b...