Christoph Nolscher

Person

Nurnberg, DE

People

Patents Grantslast 30 patents

Information Patent Grant
Method for producing a structure on the surface of a substrate
- Patent number 8,003,538
- Issue date Aug 23, 2011
- Qimonda AG
- Christoph Nölscher
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods of manufacturing semiconductor structures
- Patent number 7,867,912
- Issue date Jan 11, 2011
- Qimonda AG
- Dirk Caspary
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Masks for lithographic imagings and methods for fabricating the same
- Patent number 7,491,474
- Issue date Feb 17, 2009
- Infineon Technologies AG
- Christoph Nölscher
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for exposing a semiconductor wafer by applying periodic move...
- Patent number 7,443,484
- Issue date Oct 28, 2008
- Infineon Technologies AG
- Christoph Nölscher
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for producing a structure on the surface of a substrate
- Patent number 7,368,385
- Issue date May 6, 2008
- Infineon Technologies AG
- Christoph Nölscher
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Phase shift mask
- Patent number 7,361,434
- Issue date Apr 22, 2008
- Infineon Technologies AG
- Christoph Nölscher
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for forming a structure element on a wafer by means of a mas...
- Patent number 7,297,468
- Issue date Nov 20, 2007
- Infineon Technologies AG
- Christoph Nölscher
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Exposing a semiconductor wafer using two different spectral wavelen...
- Patent number 7,286,207
- Issue date Oct 23, 2007
- Infineon Technologies, AG
- Christoph Nölscher
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for improving a simulation model of photolithographic projec...
- Patent number 7,207,030
- Issue date Apr 17, 2007
- Infineon Technologies AG
- Bernd Küchler
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photolithographic mask
- Patent number 7,070,887
- Issue date Jul 4, 2006
- Infineon Technologies AG
- Christoph Nölscher
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photomask and method of structuring a photoresist by double exposur...
- Patent number 7,011,936
- Issue date Mar 14, 2006
- Infineon Technologies AG
- Christoph Nölscher
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for determining and removing phase conflicts on alternating...
- Patent number 6,730,463
- Issue date May 4, 2004
- Infineon Technologies AG
- Michael Heissmeier
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Alternating phase mask
- Patent number 6,680,151
- Issue date Jan 20, 2004
- Infineon Technologies AG
- Michael Heissmeier
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for producing an alternating phase mask
- Patent number 6,569,772
- Issue date May 27, 2003
- Infineon Technologies AG
- Josef Mathuni
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and system for utilizing enthalpy contained in exhaust gases...
- Patent number 6,162,554
- Issue date Dec 19, 2000
- Siemens Aktiengesellschaft
- Christoph Nolscher
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for operating a high-temperature fuel cell installation, and...
- Patent number 6,162,556
- Issue date Dec 19, 2000
- Siemens Aktiengesellschaft
- Horst Vollmar
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Fluid-cooled fuel cell with distribution ducts
- Patent number 6,080,502
- Issue date Jun 27, 2000
- Siemens Aktengesellschaft
- Christoph Nolscher
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
PEM fuel cell
- Patent number 6,010,798
- Issue date Jan 4, 2000
- Siemens Aktiengesellschaft
- Albert Hammerschmidt
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Process for operating a fuel cell installation and fuel cell instal...
- Patent number 5,976,722
- Issue date Nov 2, 1999
- Siemens Aktiengesellschatf
- Reinhard Muller
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
METHOD FOR PRODUCING A STRUCTURE ON THE SURFACE OF A SUBSTRATE
- Publication number 20080206681
- Publication date Aug 28, 2008
- Christoph Nolscher
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Exposure system and method for operating an exposure system
- Publication number 20070075276
- Publication date Apr 5, 2007
- Christoph Nolscher
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Photolithographic imaging device and apparatus for generating an il...
- Publication number 20060256313
- Publication date Nov 16, 2006
- Kerstin Renner
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method for exposing a semiconductor wafer
- Publication number 20060256314
- Publication date Nov 16, 2006
- Christoph Nolscher
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method for exposing a semiconductor wafer
- Publication number 20060244937
- Publication date Nov 2, 2006
- Christoph Nolscher
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Lithography mask and methods for producing a lithography mask
- Publication number 20060210887
- Publication date Sep 21, 2006
- Infineon Technologies AG
- Thomas Henkel
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method for optimizing the geometry of structural elements of a circ...
- Publication number 20060190850
- Publication date Aug 24, 2006
- Roderick Kohle
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method of producing a structure on the surface of a substrate
- Publication number 20060024621
- Publication date Feb 2, 2006
- Infineon Technologies AG
- Christoph Nölscher
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for the photolithographic projection of a pattern onto a sem...
- Publication number 20050287446
- Publication date Dec 29, 2005
- Christoph Nolscher
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Masks for lithographic imagings and methods for fabricating the same
- Publication number 20050238966
- Publication date Oct 27, 2005
- Christoph Nolscher
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method for transferring a layout of an integrated circuit level to...
- Publication number 20050196689
- Publication date Sep 8, 2005
- Christoph Nolscher
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method for improving a simulation model of photolithographic projec...
- Publication number 20050114823
- Publication date May 26, 2005
- Bernd Kuchler
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Phase shift mask
- Publication number 20050084771
- Publication date Apr 21, 2005
- Christoph Nolscher
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method for forming a structure element on a wafer by means of a mas...
- Publication number 20040137375
- Publication date Jul 15, 2004
- Christoph Nolscher
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Photomask and method of structuring a photoresist by double exposur...
- Publication number 20030143470
- Publication date Jul 31, 2003
- Christoph Nolscher
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Photolithographic mask
- Publication number 20030022074
- Publication date Jan 30, 2003
- Christoph Nolscher
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Alternating phase mask
- Publication number 20020192574
- Publication date Dec 19, 2002
- Michael Heissmeier
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method for determining and removing phase conflicts on alternating...
- Publication number 20020155362
- Publication date Oct 24, 2002
- Michael Heissmeier
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method for producing an alternating phase mask
- Publication number 20020127480
- Publication date Sep 12, 2002
- Josef Mathuni
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Christoph Nolscher

Person

Patents Grantslast 30 patents

Method for producing a structure on the surface of a substrate

Methods of manufacturing semiconductor structures

Masks for lithographic imagings and methods for fabricating the same

Method for exposing a semiconductor wafer by applying periodic move...

Method for producing a structure on the surface of a substrate

Phase shift mask

Method for forming a structure element on a wafer by means of a mas...

Exposing a semiconductor wafer using two different spectral wavelen...

Method for improving a simulation model of photolithographic projec...

Photolithographic mask

Photomask and method of structuring a photoresist by double exposur...

Method for determining and removing phase conflicts on alternating...

Alternating phase mask

Method for producing an alternating phase mask

Method and system for utilizing enthalpy contained in exhaust gases...

Method for operating a high-temperature fuel cell installation, and...

Fluid-cooled fuel cell with distribution ducts

PEM fuel cell

Process for operating a fuel cell installation and fuel cell instal...

Patents Applicationslast 30 patents

METHOD FOR PRODUCING A STRUCTURE ON THE SURFACE OF A SUBSTRATE

Exposure system and method for operating an exposure system

Photolithographic imaging device and apparatus for generating an il...

Method for exposing a semiconductor wafer

Method for exposing a semiconductor wafer

Lithography mask and methods for producing a lithography mask

Method for optimizing the geometry of structural elements of a circ...

Method of producing a structure on the surface of a substrate

Method for the photolithographic projection of a pattern onto a sem...

Masks for lithographic imagings and methods for fabricating the same

Method for transferring a layout of an integrated circuit level to...

Method for improving a simulation model of photolithographic projec...

Phase shift mask

Method for forming a structure element on a wafer by means of a mas...

Photomask and method of structuring a photoresist by double exposur...

Photolithographic mask

Alternating phase mask

Method for determining and removing phase conflicts on alternating...

Method for producing an alternating phase mask