Christoph NOTTBOHM

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Ulm, DE

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Patents Grantslast 30 patents

Information Patent Grant
Method for repairing reflective optical elements for EUV lithography
- Patent number 11,099,484
- Issue date Aug 24, 2021
- Carl Zeiss SMT GmbH
- Robert Meier
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Reflective optical element and optical system for EUV lithography h...
- Patent number 11,073,766
- Issue date Jul 27, 2021
- Carl Zeiss SMT GmbH
- Christoph Nottbohm
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Mirror element, in particular for a microlithographic projection ex...
- Patent number 10,598,921
- Issue date Mar 24, 2020
- Carl Zeiss SMT GmbH
- Hartmut Enkisch
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
OPTICAL ELEMENT FOR A EUV PROJECTION EXPOSURE SYSTEM
- Publication number 20230126018
- Publication date Apr 27, 2023
- Carl Zeiss SMT GMBH
- Hartmut ENKISCH
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Application
OPTICAL ELEMENT AND EUV LITHOGRAPHIC SYSTEM
- Publication number 20220179329
- Publication date Jun 9, 2022
- Carl Zeiss SMT GMBH
- Anastasia Gonchar
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Application
METHOD FOR REPAIRING REFLECTIVE OTPICAL ELEMENTS FOR EUV LITHOGRAPHY
- Publication number 20190302628
- Publication date Oct 3, 2019
- Carl Zeiss SMT GMBH
- Robert MEIER
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
REFLECTIVE OPTICAL ELEMENT AND OPTICAL SYSTEM FOR EUV LITHOGRAPHY
- Publication number 20180329308
- Publication date Nov 15, 2018
- Carl Zeiss SMT GMBH
- Christoph Nottbohm
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MIRROR ELEMENT, IN PARTICULAR FOR A MICROLITHOGRAPHIC PROJECTION EX...
- Publication number 20180101002
- Publication date Apr 12, 2018
- Carl Zeiss SMT GMBH
- Hartmut ENKISCH
- G02 - OPTICS
Information Patent Application
MIRROR ELEMENT, IN PARTICULAR FOR A MICROLITHOGRAPHIC PROJECTION EX...
- Publication number 20170176741
- Publication date Jun 22, 2017
- Carl Zeiss SMT GMBH
- Hartmut ENKISCH
- G02 - OPTICS