Christopher F. Robinson

Person

Hyde Park, NY, US

People

Patents Grantslast 30 patents

Information Patent Grant
Using E0 exposures for track/cluster monitoring
- Patent number 11,561,481
- Issue date Jan 24, 2023
- International Business Machines Corporation
- Cody J. Murray
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Personnel-tolerant carbon dioxide beamline variation reduction
- Patent number 11,402,361
- Issue date Aug 2, 2022
- International Business Machines Corporation
- Shane D. Bryant
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Lithography process delay characterization and effective dose compe...
- Patent number 11,194,254
- Issue date Dec 7, 2021
- International Business Machines Corporation
- Christopher Robinson
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic dose characterization
- Patent number 10,921,716
- Issue date Feb 16, 2021
- International Business Machines Corporation
- Christopher Robinson
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Baseline overlay control with residual noise reduction
- Patent number 10,642,161
- Issue date May 5, 2020
- International Business Machines Corporation
- Daniel A. Corliss
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Determination of lithography effective dose uniformity
- Patent number 10,281,826
- Issue date May 7, 2019
- International Business Machines Corporation
- Daniel A. Corliss
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Determination of lithography effective dose uniformity
- Patent number 10,274,836
- Issue date Apr 30, 2019
- International Business Machines Corporation
- Daniel A. Corliss
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Microelectronic substrate having removable edge extension element
- Patent number 8,946,866
- Issue date Feb 3, 2015
- International Business Machines Corporation
- Charles W. Koburger
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Microelectronic substrate having removable edge extension element
- Patent number 8,202,460
- Issue date Jun 19, 2012
- International Business Machines Corporation
- Charles W. Koburger, III
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithography tool image quality evaluating and correcting
- Patent number 7,391,023
- Issue date Jun 24, 2008
- International Business Machines Corporation
- William A. Enichen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Lithography tool test patterns and method
- Patent number 7,057,715
- Issue date Jun 6, 2006
- International Business Machines Corporation
- Christopher F. Robinson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Lithography tool image quality evaluating and correcting
- Patent number 6,931,337
- Issue date Aug 16, 2005
- International Business Machines Corporation
- William A. Enichen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electron scatter in a thin membrane to eliminate detector saturation
- Patent number 6,639,219
- Issue date Oct 28, 2003
- International Business Machines Corporation
- Rodney A. Kendall
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for aligning electron beam projection lithography tool
- Patent number 6,573,514
- Issue date Jun 3, 2003
- Nikon Corporation
- Michael S. Gordon
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Stencil reticle incorporating scattering features for electron beam...
- Patent number 6,541,783
- Issue date Apr 1, 2003
- Nikon Corporation
- Christopher F. Robinson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of adjusting a lithography system to enhance image quality
- Patent number 6,476,400
- Issue date Nov 5, 2002
- International Business Machines Corporation
- Christopher F. Robinson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Developer/rinse formulation to prevent image collapse in resist
- Patent number 6,451,510
- Issue date Sep 17, 2002
- International Business Machines Corporation
- Scott A. Messick
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
E-beam shape aperature incorporating lithographically defined heate...
- Patent number 6,326,634
- Issue date Dec 4, 2001
- International Business Machines Corporation
- Christopher F. Robinson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Curvilinear axis set-up for charged particle lithography
- Patent number 6,262,425
- Issue date Jul 17, 2001
- International Business Machines Corporation
- Michael S. Gordon
- B82 - NANO-TECHNOLOGY
Information Patent Grant
On-line dynamic corrections adjustment method
- Patent number 6,218,671
- Issue date Apr 17, 2001
- Nikon Corporation
- Michael Gordon
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Feedback method for increasing stability of electron beams
- Patent number 6,188,071
- Issue date Feb 13, 2001
- Nikon Corporation
- Michael Gordon
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam performance measurement system and method the...
- Patent number 5,936,252
- Issue date Aug 10, 1999
- International Business Machines Corporation
- Werner Stickel
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Proximity correction dose modulation for E-beam projection lithography
- Patent number 5,866,913
- Issue date Feb 2, 1999
- International Business Machines Corporation
- Christopher Frederick Robinson
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Calibration patterns and techniques for charged particle projection...
- Patent number 5,763,894
- Issue date Jun 9, 1998
- International Business Machines Corporation
- William A. Enichen
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Projection reticle transmission control for coulomb interaction ana...
- Patent number 5,751,004
- Issue date May 12, 1998
- International Business Machines Corporation
- Christopher Frederick Robinson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electron beam performance measurement system and method thereof
- Patent number 5,712,488
- Issue date Jan 27, 1998
- International Business Machines Corporation
- Werner Stickel
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
Using E0 Exposures for Track/Cluster Monitoring
- Publication number 20220019139
- Publication date Jan 20, 2022
- International Business Machines Corporation
- Cody J. Murray
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Lithography Process Delay Characterization and Effective Dose Compe...
- Publication number 20210132502
- Publication date May 6, 2021
- International Business Machines Corporation
- Christopher Robinson
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PERSONNEL-TOLERANT CARBON DIOXIDE BEAMLINE VARIATION REDUCTION
- Publication number 20200386729
- Publication date Dec 10, 2020
- International Business Machines Corporation
- Shane D. Bryant
- G01 - MEASURING TESTING
Information Patent Application
BASELINE OVERLAY CONTROL WITH RESIDUAL NOISE REDUCTION
- Publication number 20200117100
- Publication date Apr 16, 2020
- International Business Machines Corporation
- Daniel A. Corliss
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
DETERMINATION OF LITHOGRAPHY EFFECTIVE DOSE UNIFORMITY
- Publication number 20180373164
- Publication date Dec 27, 2018
- International Business Machines Corporation
- DANIEL A. CORLISS
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
DETERMINATION OF LITHOGRAPHY EFFECTIVE DOSE UNIFORMITY
- Publication number 20180373165
- Publication date Dec 27, 2018
- International Business Machines Corporation
- DANIEL A. CORLISS
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MICROELECTRONIC SUBSTRATE HAVING REMOVABLE EDGE EXTENSION ELEMENT
- Publication number 20120241913
- Publication date Sep 27, 2012
- International Business Machines Corporation
- Charles W. Koburger, III
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MICROELECTRONIC SUBSTRATE HAVING REMOVABLE EDGE EXTENSION ELEMENT
- Publication number 20070063392
- Publication date Mar 22, 2007
- International Business Machines Corporation
- Charles W. Koburger III
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Lithography tool image quality evaluating and correcting
- Publication number 20050236567
- Publication date Oct 27, 2005
- William A. Enichen
- B82 - NANO-TECHNOLOGY
Information Patent Application
LITHOGRAPHY TOOL TEST PATTERNS AND METHOD
- Publication number 20040265711
- Publication date Dec 30, 2004
- International Business Machines Corporation
- Christopher F. Robinson
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHY TOOL IMAGE QUALITY EVALUATING AND CORRECTING
- Publication number 20040267471
- Publication date Dec 30, 2004
- International Business Machines Corporation, Armonk, NY
- William A. Enichen
- B82 - NANO-TECHNOLOGY
Information Patent Application
Electron scatter in a thin membrane to eliminate detector saturation
- Publication number 20030089853
- Publication date May 15, 2003
- International Business Machines Corporation
- Rodney A. Kendall
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for aligning electron beam projection lithography tool
- Publication number 20020175295
- Publication date Nov 28, 2002
- Michael S. Gordon
- B82 - NANO-TECHNOLOGY
Information Patent Application
Developer/rinse formulation to prevent image collapse in resist
- Publication number 20020115022
- Publication date Aug 22, 2002
- International Business Machines Corporation
- Scott A. Messick
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Christopher F. Robinson

Person

Patents Grantslast 30 patents

Using E0 exposures for track/cluster monitoring

Personnel-tolerant carbon dioxide beamline variation reduction

Lithography process delay characterization and effective dose compe...

Lithographic dose characterization

Baseline overlay control with residual noise reduction

Determination of lithography effective dose uniformity

Determination of lithography effective dose uniformity

Microelectronic substrate having removable edge extension element

Microelectronic substrate having removable edge extension element

Lithography tool image quality evaluating and correcting

Lithography tool test patterns and method

Lithography tool image quality evaluating and correcting

Electron scatter in a thin membrane to eliminate detector saturation

Method for aligning electron beam projection lithography tool

Stencil reticle incorporating scattering features for electron beam...

Method of adjusting a lithography system to enhance image quality

Developer/rinse formulation to prevent image collapse in resist

E-beam shape aperature incorporating lithographically defined heate...

Curvilinear axis set-up for charged particle lithography

On-line dynamic corrections adjustment method

Feedback method for increasing stability of electron beams

Charged particle beam performance measurement system and method the...

Proximity correction dose modulation for E-beam projection lithography

Calibration patterns and techniques for charged particle projection...

Projection reticle transmission control for coulomb interaction ana...

Electron beam performance measurement system and method thereof

Patents Applicationslast 30 patents

Using E0 Exposures for Track/Cluster Monitoring

Lithography Process Delay Characterization and Effective Dose Compe...

PERSONNEL-TOLERANT CARBON DIOXIDE BEAMLINE VARIATION REDUCTION

BASELINE OVERLAY CONTROL WITH RESIDUAL NOISE REDUCTION

DETERMINATION OF LITHOGRAPHY EFFECTIVE DOSE UNIFORMITY

DETERMINATION OF LITHOGRAPHY EFFECTIVE DOSE UNIFORMITY

MICROELECTRONIC SUBSTRATE HAVING REMOVABLE EDGE EXTENSION ELEMENT

MICROELECTRONIC SUBSTRATE HAVING REMOVABLE EDGE EXTENSION ELEMENT

Lithography tool image quality evaluating and correcting

LITHOGRAPHY TOOL TEST PATTERNS AND METHOD

LITHOGRAPHY TOOL IMAGE QUALITY EVALUATING AND CORRECTING

Electron scatter in a thin membrane to eliminate detector saturation

Method for aligning electron beam projection lithography tool

Developer/rinse formulation to prevent image collapse in resist